Plasma Processing for VLSI - VLSI Electronics Microstructure Science
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Published By Elsevier

9780122341083

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Plasma-Enhanced Chemical Vapor Deposition of Dielectrics

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50009-1 ◽

1984 ◽

pp. 69-88 ◽

Cited By ~ 1

Author(s):

T.B. Gorczyca ◽

B. Gorowitz

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor

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Preface

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50005-4 ◽

1984 ◽

pp. xiii-xiv

Author(s):

DALE M. BROWN

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Copyright page

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50003-0 ◽

1984 ◽

pp. iv

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Front Matter

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50002-9 ◽

1984 ◽

pp. iii

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The History of Plasma Processing

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50006-6 ◽

1984 ◽

pp. 1-24 ◽

Cited By ~ 6

Author(s):

DONALD L. TOLLIVER

Keyword(s):

Plasma Processing ◽

History Of

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Basic Principles of Plasma Etching for Silicon Devices

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50013-3 ◽

1984 ◽

pp. 189-251 ◽

Cited By ~ 10

Author(s):

DANIEL L. FLAMM ◽

VINCENT M. DONNELLY ◽

DALE E. IBBOTSON

Keyword(s):

Plasma Etching ◽

Basic Principles ◽

Silicon Devices

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Trilayer Resist

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50010-8 ◽

1984 ◽

pp. 91-136 ◽

Cited By ~ 2

Author(s):

JAMES B. KRUGER ◽

MICHAEL M. O'TOOLE ◽

PAUL RISSMAN

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Emerging Etching Techniques

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50019-4 ◽

1984 ◽

pp. 447-486 ◽

Cited By ~ 3

Author(s):

Y. HORIIKE

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High-Pressure Etching

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50014-5 ◽

1984 ◽

pp. 253-296 ◽

Cited By ~ 3

Author(s):

DONALD L. SMITH

Keyword(s):

High Pressure

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Reactive Ion Etching

Plasma Processing for VLSI - VLSI Electronics Microstructure Science ◽

10.1016/b978-0-12-234108-3.50015-7 ◽

1984 ◽

pp. 297-339 ◽

Cited By ~ 6

Author(s):

BERNARD GOROWITZ ◽

RICHARD J. SAIA

Keyword(s):

Reactive Ion Etching ◽

Ion Etching

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Plasma Processing for VLSI - VLSI Electronics Microstructure ScienceLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Elsevier

Plasma-Enhanced Chemical Vapor Deposition of Dielectrics

Preface

Copyright page

Front Matter

The History of Plasma Processing

Basic Principles of Plasma Etching for Silicon Devices

Trilayer Resist

Emerging Etching Techniques

High-Pressure Etching

Reactive Ion Etching

Plasma Processing for VLSI - VLSI Electronics Microstructure Science
Latest Publications