1997 2nd International Workshop on Statistical Metrology
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Published By IEEE

0780337379

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Logic product speed evaluation and forecasting during the early phases of process technology development using ring oscillator data

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629404 ◽

2002 ◽

Cited By ~ 7

Author(s):

L. Milor ◽

L. Yu ◽

B. Liu

Keyword(s):

Technology Development ◽

Ring Oscillator ◽

Process Technology ◽

Early Phases

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Data optimization in semiconductor manufacturing

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629428 ◽

2002 ◽

Author(s):

D.A. Acree ◽

K. Matsubara

Keyword(s):

Semiconductor Manufacturing ◽

Data Optimization

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100% defect inspection with neural network integrated system of in-situ particle monitor and surfscan

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629411 ◽

2002 ◽

Author(s):

V.M.C. Chen ◽

A.W. Chow ◽

Yung-Tao Lin ◽

Yeng-Kaung Peng

Keyword(s):

Neural Network ◽

Integrated System ◽

Defect Inspection

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Statistical simulation methodology for multi-level interconnect contact analysis and step coverage evaluation

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629427 ◽

2002 ◽

Author(s):

I. Kamohara

Keyword(s):

Statistical Simulation ◽

Contact Analysis ◽

Simulation Methodology ◽

Step Coverage ◽

Multi Level

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Automatic synthesis of equipment recipes from specified wafer-state transitions

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629414 ◽

2002 ◽

Cited By ~ 1

Author(s):

J.C. Davis ◽

P.K. Mozumder ◽

R. Burch ◽

C. Fernando

Keyword(s):

State Transitions ◽

Automatic Synthesis

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Improvement of RSF for a statistical design of lithographic process

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629417 ◽

2002 ◽

Cited By ~ 1

Author(s):

A. Goda ◽

A. Misaka ◽

H. Umimoto ◽

S. Odanaka

Keyword(s):

Statistical Design

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Excursion detection and source isolation in defect inspection and classification [VLSI manufacture]

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629421 ◽

2002 ◽

Author(s):

W. Shindo ◽

E.H. Wang ◽

R. Akella ◽

A.J. Strojwas

Keyword(s):

Defect Inspection

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Response surface characterization of the deposition of LPCVD SiGe for solid-phase crystallized poly-TFTs

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629422 ◽

2002 ◽

Cited By ~ 1

Author(s):

V. Subramanian ◽

K.C. Saraswat ◽

H. Hovagimian ◽

J. Mehlhaff

Keyword(s):

Response Surface ◽

Surface Characterization ◽

Solid Phase

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A systematic approach to statistical simulation of complex analog integrated circuits

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629420 ◽

2002 ◽

Cited By ~ 6

Author(s):

J.F. Swidzinski ◽

D. Alexander ◽

M. Qu ◽

M.A. Styblinski

Keyword(s):

Integrated Circuits ◽

Systematic Approach ◽

Analog Integrated Circuits ◽

Statistical Simulation ◽

Complex Analog

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Recent trends in yield management system

1997 2nd International Workshop on Statistical Metrology ◽

10.1109/iwstm.1997.629400 ◽

2002 ◽

Author(s):

T. Tsujide

Keyword(s):

Management System ◽

Yield Management ◽

Recent Trends

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1997 2nd International Workshop on Statistical MetrologyLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Logic product speed evaluation and forecasting during the early phases of process technology development using ring oscillator data

Data optimization in semiconductor manufacturing

100% defect inspection with neural network integrated system of in-situ particle monitor and surfscan

Statistical simulation methodology for multi-level interconnect contact analysis and step coverage evaluation

Automatic synthesis of equipment recipes from specified wafer-state transitions

Improvement of RSF for a statistical design of lithographic process

Excursion detection and source isolation in defect inspection and classification [VLSI manufacture]

Response surface characterization of the deposition of LPCVD SiGe for solid-phase crystallized poly-TFTs

A systematic approach to statistical simulation of complex analog integrated circuits

Recent trends in yield management system

1997 2nd International Workshop on Statistical Metrology
Latest Publications