Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)
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9781424417377
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Plasma doping (PD) for ultra-shallow junction

2008 ◽  
Author(s):  
B. Mizuno ◽  
K. Okashita ◽  
K. Nakamoto ◽  
C.G. Jin ◽  
Y. Sasaki ◽  
...  
Keyword(s):  
Shallow Junction ◽  
Plasma Doping

Nickel silicidation on sulfur implanted Si(100)

2008 ◽  
Author(s):  
Q.T. Zhao ◽  
S. Mi ◽  
C.L. Jia ◽  
U. Breuer ◽  
S. Lenk ◽  
...  

A Pd/Oxide/AlGaAs (MOS) junction resistor-type hydrogen sensor

2008 ◽  
Author(s):  
Ching-Wen Hung ◽  
Huey-Ing Chen ◽  
Kun-Wei Lin ◽  
Tsung-Han Tsai ◽  
Tzu-Pin Chen ◽  
...  
Keyword(s):  
Hydrogen Sensor

Plasma doping on 68nm CMOS device source/drain formations

2008 ◽  
Author(s):  
Shu Qin ◽  
Allen McTeer ◽  
Jeff Hu ◽  
Jennifer Liu ◽  
Durga Panda ◽  
...  
Keyword(s):  
Plasma Doping

The challenges and progress of USJ formation & process integration for 32nm technology and beyond

2008 ◽  
Author(s):  
Hsing-Huang Tseng ◽  
Pankaj Kalra ◽  
Jungwoo Oh ◽  
Prashant Majhi ◽  
Tsu-Jae King Liu ◽  
...  
Keyword(s):  
Process Integration
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