Proceedings of International Symposium on Semiconductor Manufacturing
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Published By IEEE

0780329287

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Through-UHV-Pump Impurity Back Diffusion Under Large Gas Flow and Its Minimization

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524412 ◽

2005 ◽

Author(s):

T. Shihata ◽

K. Ino ◽

N. Konishi ◽

T. Ohmi ◽

C. Urano ◽

...

Keyword(s):

Gas Flow ◽

Back Diffusion

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Applications of queuing theory and simulation to staffing in the semiconductor clean room environment

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524402 ◽

2002 ◽

Cited By ~ 3

Author(s):

A. Raviv

Keyword(s):

Queuing Theory ◽

Clean Room ◽

Clean Room Environment

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In-situ plasma cleaning by rotating transverse magnetic field

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524353 ◽

2002 ◽

Author(s):

T. Kawasima ◽

S. Bannai ◽

T. Chiba ◽

I. Honbori ◽

T. Kisakibaru

Keyword(s):

Magnetic Field ◽

Transverse Magnetic Field ◽

Transverse Magnetic ◽

Plasma Cleaning

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Solvent recycling for reuse in semiconductor manufacturing

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524392 ◽

2002 ◽

Cited By ~ 2

Author(s):

P.E. Dahlgren

Keyword(s):

Semiconductor Manufacturing

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Contamination issues in gas delivery to a gate oxide process

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524378 ◽

2002 ◽

Author(s):

S. Krishnan ◽

O. Laparra ◽

A. Tudhope

Keyword(s):

Gate Oxide

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Simulating AMHS performance for semiconductor wafer fabrication

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524382 ◽

2002 ◽

Cited By ~ 2

Author(s):

N.G. Pierce ◽

R. Stafford

Keyword(s):

Wafer Fabrication ◽

Semiconductor Wafer ◽

Semiconductor Wafer Fabrication

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Trace moisture measurement in HCl gas by near-infrared diode LASER spectroscopy

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524395 ◽

2002 ◽

Author(s):

Y. Ishihara ◽

H. Masusaki ◽

Shang-Qian Wu ◽

K. Matsumoto ◽

T. Kimijima

Keyword(s):

Diode Laser ◽

Laser Spectroscopy ◽

Near Infrared ◽

Moisture Measurement ◽

Diode Laser Spectroscopy ◽

Trace Moisture ◽

Hcl Gas

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Global planning at Harris Semiconductor

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524350 ◽

2002 ◽

Cited By ~ 3

Author(s):

S.V. Murty ◽

J.W. Bienvenu

Keyword(s):

Global Planning

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Evaluation for fab performance using CPO

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524409 ◽

2002 ◽

Author(s):

Y. Ito ◽

H. Ogawa ◽

H. Tani

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Virtual manufacturing system

Proceedings of International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.1995.524346 ◽

2002 ◽

Cited By ~ 3

Author(s):

H. Koriyama ◽

Y. Yazaki ◽

I. Honbori ◽

Y. Kato ◽

T. Kisakibaru

Keyword(s):

Manufacturing System ◽

Virtual Manufacturing

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Proceedings of International Symposium on Semiconductor ManufacturingLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Through-UHV-Pump Impurity Back Diffusion Under Large Gas Flow and Its Minimization

Applications of queuing theory and simulation to staffing in the semiconductor clean room environment

In-situ plasma cleaning by rotating transverse magnetic field

Solvent recycling for reuse in semiconductor manufacturing

Contamination issues in gas delivery to a gate oxide process

Simulating AMHS performance for semiconductor wafer fabrication

Trace moisture measurement in HCl gas by near-infrared diode LASER spectroscopy

Global planning at Harris Semiconductor

Evaluation for fab performance using CPO

Virtual manufacturing system

Proceedings of International Symposium on Semiconductor Manufacturing
Latest Publications