IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05
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Extremely-scaled double-gate CMOS with non-self-aligned back gate

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497100 ◽

2005 ◽

Author(s):

Keunwoo Kim ◽

H.I. Hanafi ◽

J. Cai ◽

Ching-Te Chuang

Keyword(s):

Double Gate ◽

Back Gate

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Inversion MOS capacitance extraction for ultra-thin gate oxide using BSIM4

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497081 ◽

2005 ◽

Cited By ~ 1

Author(s):

Wei Lee ◽

Ke-Wei Su ◽

Chung-Shi Chiang ◽

S. Liu ◽

Pin Su

Keyword(s):

Gate Oxide ◽

Capacitance Extraction ◽

Thin Gate Oxide

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Carbon nanotube electronic and optoelectronic devices

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497060 ◽

2005 ◽

Author(s):

P. Avouris

Keyword(s):

Carbon Nanotube ◽

Optoelectronic Devices

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The future prospect of nonvolatile memory

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497091 ◽

2005 ◽

Cited By ~ 16

Author(s):

Kinam Kim ◽

Jung Hyuk Choi ◽

Jungdal Choi ◽

Hong-Sik Jeong

Keyword(s):

Nonvolatile Memory ◽

Future Prospect ◽

The Future

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Compact modeling of finfets featuring independent-gate operation mode

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497105 ◽

2005 ◽

Cited By ~ 7

Author(s):

C.-H. Lin ◽

X. Xi ◽

J. He ◽

L. Chang ◽

R.Q. Williams ◽

...

Keyword(s):

Operation Mode ◽

Compact Modeling ◽

Gate Operation ◽

Independent Gate

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Recent advances in MRAM technology

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497086 ◽

2005 ◽

Cited By ~ 4

Author(s):

W.J. Gallagher ◽

D. Abraham ◽

S. Assefa ◽

S.L. Brown ◽

J. DeBrosse ◽

...

Keyword(s):

Recent Advances

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Design and integration of strained SiGe/Si hetero-structure CMOS transistors

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497066 ◽

2005 ◽

Cited By ~ 1

Author(s):

Chien-Chao Huang ◽

Yee-Chia Yee ◽

Shih-Chang Chen ◽

Fu-Liang Yang ◽

Min-Hwa Chi

Keyword(s):

Hetero Structure ◽

Cmos Transistors ◽

Strained Sige

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Ultra-thin SOI replacement gate CMOS with ALD TaN / high-k gate stack

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497095 ◽

2005 ◽

Author(s):

B. Doris ◽

B. Linder ◽

T.V. Narayanan ◽

S. Callegari ◽

E. Gousev ◽

...

Keyword(s):

Gate Stack ◽

High K

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The excellent scalability of the RCAT(recess-channel-array-transistor) technology for sub-70nm DRAM feature size and beyond

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497071 ◽

2005 ◽

Cited By ~ 5

Author(s):

J.Y. Kim ◽

D.S. Woo ◽

H.J. Oh ◽

H.J. Kim ◽

S.E. Kim ◽

...

Keyword(s):

Feature Size

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High-k technology towards EOT > 1.0 nm

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05 ◽

10.1109/vtsa.2005.1497107 ◽

2005 ◽

Author(s):

T. Arikado

Keyword(s):

High K

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IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

Extremely-scaled double-gate CMOS with non-self-aligned back gate

Inversion MOS capacitance extraction for ultra-thin gate oxide using BSIM4

Carbon nanotube electronic and optoelectronic devices

The future prospect of nonvolatile memory

Compact modeling of finfets featuring independent-gate operation mode

Recent advances in MRAM technology

Design and integration of strained SiGe/Si hetero-structure CMOS transistors

Ultra-thin SOI replacement gate CMOS with ALD TaN / high-k gate stack

The excellent scalability of the RCAT(recess-channel-array-transistor) technology for sub-70nm DRAM feature size and beyond

High-k technology towards EOT > 1.0 nm

IEEE VLSI-TSA International Symposium on VLSI Technology 2005 (VLSI-TSA-Tech) VTSA-05
Latest Publications