Thin Films - Modeling of Film Deposition for Microelectronic Applications
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Published By Elsevier

9780125330220

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Feature scale transport and reaction during low-pressure deposition processes

Thin Films - Modeling of Film Deposition for Microelectronic Applications ◽

10.1016/s1079-4050(96)80006-8 ◽

1996 ◽

pp. 175-276 ◽

Cited By ~ 24

Author(s):

Timothy S. Cale ◽

Vadali Mahadev

Keyword(s):

Low Pressure ◽

Deposition Processes ◽

Feature Scale

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Thin film microstructure and process simulation using SIMBAD

Thin Films - Modeling of Film Deposition for Microelectronic Applications ◽

10.1016/s1079-4050(96)80003-2 ◽

1996 ◽

pp. 1-79 ◽

Cited By ~ 1

Author(s):

Michael J. Brett ◽

Steven K. Dew ◽

Tom J. Smy

Keyword(s):

Thin Film ◽

Process Simulation ◽

Film Microstructure

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Author index

Thin Films - Modeling of Film Deposition for Microelectronic Applications ◽

10.1016/s1079-4050(96)80007-x ◽

1996 ◽

pp. 277-283

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Subject index

Thin Films - Modeling of Film Deposition for Microelectronic Applications ◽

10.1016/s1079-4050(96)80008-1 ◽

1996 ◽

pp. 285-290

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Contributors

Thin Films - Modeling of Film Deposition for Microelectronic Applications ◽

10.1016/s1079-4050(96)80001-9 ◽

1996 ◽

pp. ix

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Mathematical methods for thin film deposition simulations

Thin Films - Modeling of Film Deposition for Microelectronic Applications ◽

10.1016/s1079-4050(96)80004-4 ◽

1996 ◽

pp. 81-115 ◽

Cited By ~ 2

Author(s):

S. Hamaguchi

Keyword(s):

Thin Film ◽

Thin Film Deposition ◽

Film Deposition ◽

Mathematical Methods

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A process model for sputter deposition of thin films using molecular dynamics

Thin Films - Modeling of Film Deposition for Microelectronic Applications ◽

10.1016/s1079-4050(96)80005-6 ◽

1996 ◽

pp. 117-IN3 ◽

Cited By ~ 2

Author(s):

C.-C. Fang ◽

V. Prasad ◽

R.V. Joshi ◽

F. Jones ◽

J.J. Hsieh

Keyword(s):

Thin Films ◽

Molecular Dynamics ◽

Process Model ◽

Sputter Deposition

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Preface

Thin Films - Modeling of Film Deposition for Microelectronic Applications ◽

10.1016/s1079-4050(96)80002-0 ◽

1996 ◽

pp. xi-xiv

Author(s):

Stephen Rossnagel

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Thin Films - Modeling of Film Deposition for Microelectronic ApplicationsLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Elsevier

Feature scale transport and reaction during low-pressure deposition processes

Thin film microstructure and process simulation using SIMBAD

Author index

Subject index

Contributors

Mathematical methods for thin film deposition simulations

A process model for sputter deposition of thin films using molecular dynamics

Preface

Thin Films - Modeling of Film Deposition for Microelectronic Applications
Latest Publications