Plasma Processing of Semiconductors
Latest Publications

TOTAL DOCUMENTS

28

(FIVE YEARS 0)

H-INDEX

4

(FIVE YEARS 0)

Published By Springer Netherlands

9789401064866, 9789401158848

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Cl2 Plasma — Si Surface Interactions in Plasma Etching: X-ray Photoelectron Spectroscopy After Etching, and Optical and Mass Spectrometry Methods During Etching

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_14 ◽

1997 ◽

pp. 243-275

Author(s):

V. M. Donnelly ◽

N. Layadi ◽

J. T. C. Lee ◽

I. P. Herman ◽

K. V. Guinn ◽

...

Keyword(s):

Mass Spectrometry ◽

Plasma Etching ◽

Photoelectron Spectroscopy ◽

Surface Interactions ◽

X Ray

Download Full-text

Plasma Chemistry, Basic Processes, and PECVD

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_2 ◽

1997 ◽

pp. 23-59 ◽

Cited By ~ 4

Author(s):

Daniel L. Flamm

Keyword(s):

Plasma Chemistry

Download Full-text

The Role of Ions in Reactive Ion Etching with Low Density Plasmas

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_3 ◽

1997 ◽

pp. 61-71 ◽

Cited By ~ 2

Author(s):

J. W. Coburn

Keyword(s):

Reactive Ion Etching ◽

Low Density ◽

Ion Etching

Download Full-text

High Density Sources for Plasma Etching

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_8 ◽

1997 ◽

pp. 137-156 ◽

Cited By ~ 1

Author(s):

T. D. Mantei

Keyword(s):

Plasma Etching ◽

High Density

Download Full-text

Topography Evolution During Semiconductor Processing

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_6 ◽

1997 ◽

pp. 109-124 ◽

Cited By ~ 4

Author(s):

T. S. Cale ◽

V. Mahadev ◽

Z. Tang ◽

G. Rajagopalan ◽

L. J. Borucki

Keyword(s):

Semiconductor Processing

Download Full-text

Ellipsometric Analysis of Plasma Deposited and Plasma Etched Materials

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_20 ◽

1997 ◽

pp. 375-395 ◽

Cited By ~ 2

Author(s):

J. A. Woollam

Download Full-text

Physics of Surface-Wave Discharges

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_11 ◽

1997 ◽

pp. 187-210 ◽

Cited By ~ 5

Author(s):

J. Margot ◽

M. Moisan

Keyword(s):

Surface Wave

Download Full-text

Introduction to Plasma Etching

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_1 ◽

1997 ◽

pp. 1-21

Author(s):

T. D. Mantei

Keyword(s):

Plasma Etching

Download Full-text

Fluid and Hybrid Models of Non Equilibrium Discharges

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_16 ◽

1997 ◽

pp. 291-319 ◽

Cited By ~ 4

Author(s):

J.-P. Boeuf ◽

A. Merad

Keyword(s):

Hybrid Models ◽

Non Equilibrium

Download Full-text

The Transition from Capacitive to Inductive to Wave Sustained Discharges

Plasma Processing of Semiconductors ◽

10.1007/978-94-011-5884-8_10 ◽

1997 ◽

pp. 181-186

Author(s):

R. W. Boswell ◽

A. Ellingboe ◽

A. Degeling ◽

M. Lieberman ◽

J. Derouard

Download Full-text