Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V
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TOTAL DOCUMENTS

149

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H-INDEX

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Published By Springer Berlin Heidelberg

9783642827266, 9783642827242

Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

A New SIMS Instrument: The Cameca IMS 4F

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_37 ◽

1986 ◽

pp. 155-157 ◽

Cited By ~ 23

Author(s):

H. N. Migeon ◽

C. Le Pipec ◽

J. J. Le Goux

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Laser Desorption Mass Spectrometry. A Review

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_125 ◽

1986 ◽

pp. 471-475 ◽

Cited By ~ 9

Author(s):

F. Hillenkamp

Keyword(s):

Mass Spectrometry ◽

Laser Desorption ◽

Laser Desorption Mass Spectrometry ◽

Desorption Mass Spectrometry

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Matrix Effect Quantification for Positive SIMS Depth Profiling of Dopants in InP/InGaAsP/InGaAs Epitaxial Heterostructures

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_98 ◽

1986 ◽

pp. 366-370 ◽

Cited By ~ 1

Author(s):

W. C. Dautremont-Smith

Keyword(s):

Matrix Effect ◽

Depth Profiling ◽

Epitaxial Heterostructures ◽

Sims Depth Profiling

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Depth Profiling of Dopants in Aluminum Gallium Arsenide

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_95 ◽

1986 ◽

pp. 357-359

Author(s):

W. H. Robinson ◽

J. D. Brown

Keyword(s):

Gallium Arsenide ◽

Aluminum Gallium Arsenide ◽

Depth Profiling

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High Purity III–V Compound Analyses by Modified CAMECA IMS 3F

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_94 ◽

1986 ◽

pp. 353-356 ◽

Cited By ~ 3

Author(s):

A. M. Huber ◽

G. Morillot

Keyword(s):

High Purity

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Ion Deposition Effects in and Around Sputter Craters Formed by Cesium Primary Ions

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_92 ◽

1986 ◽

pp. 347-349 ◽

Cited By ~ 2

Author(s):

K. Miethe ◽

W. H. Gries ◽

A. Pöcker

Keyword(s):

Primary Ions ◽

Ion Deposition

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High Dynamic Range SIMS Depth Profiles for Aluminium in Silicon-on-Sapphire

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_90 ◽

1986 ◽

pp. 340-342

Author(s):

M. G. Dowsett ◽

E. H. C. Parker ◽

D. S. McPhail

Keyword(s):

Dynamic Range ◽

High Dynamic Range ◽

Depth Profiles ◽

High Dynamic

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SIMS Depth Profiling with Oblique Primary Beam Incidence

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_84 ◽

1986 ◽

pp. 319-322 ◽

Cited By ~ 1

Author(s):

R. v. Criegern ◽

I. Weitzel

Keyword(s):

Depth Profiling ◽

Primary Beam ◽

Beam Incidence ◽

Sims Depth Profiling

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Improved Spatial Resolution of the CAMECA IMS-3f Ion Microscope

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_65 ◽

1986 ◽

pp. 245-248 ◽

Cited By ~ 1

Author(s):

M. T. Bernius ◽

Yong-Chien Ling ◽

G. H. Morrison

Keyword(s):

Spatial Resolution

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Lateral Elemental Distributions on a Corroded Aluminum Alloy Surface

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V ◽

10.1007/978-3-642-82724-2_64 ◽

1986 ◽

pp. 242-244

Author(s):

R. L. Crouch ◽

D. H. Wayne ◽

R. H. Fleming

Keyword(s):

Aluminum Alloy ◽

Alloy Surface ◽

Aluminum Alloy Surface

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Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS VLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Springer Berlin Heidelberg

A New SIMS Instrument: The Cameca IMS 4F

Laser Desorption Mass Spectrometry. A Review

Matrix Effect Quantification for Positive SIMS Depth Profiling of Dopants in InP/InGaAsP/InGaAs Epitaxial Heterostructures

Depth Profiling of Dopants in Aluminum Gallium Arsenide

High Purity III–V Compound Analyses by Modified CAMECA IMS 3F

Ion Deposition Effects in and Around Sputter Craters Formed by Cesium Primary Ions

High Dynamic Range SIMS Depth Profiles for Aluminium in Silicon-on-Sapphire

SIMS Depth Profiling with Oblique Primary Beam Incidence

Improved Spatial Resolution of the CAMECA IMS-3f Ion Microscope

Lateral Elemental Distributions on a Corroded Aluminum Alloy Surface

Springer Series in Chemical Physics - Secondary Ion Mass Spectrometry SIMS V
Latest Publications