ACS Symposium Series - Microelectronics Technology
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0841233322, 0841215502
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Syntheses and Properties of Allylated Poly(2,6-dimethyl-1,4-phenylene ether)

1995 ◽  
pp. 485-503 ◽  
Author(s):  
Yoshiyuki Ishii ◽  
Hiroji Oda ◽  
Takeshi Arai ◽  
Teruo Katayose

The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists

1995 ◽  
pp. 21-34
Author(s):  
Hiroshi Ito ◽  
Greg Breyta ◽  
Donald C. Hofer ◽  
R. Sooriyakumaran
Keyword(s):  
Chemical Amplification

Photoacid and Photobase Generators: Arylmethyl Sulfones and Benzhydrylammonium Salts

1995 ◽  
pp. 137-148 ◽  
Author(s):  
J. E. Hanson ◽  
K. H. Jensen ◽  
N. Gargiulo ◽  
D. Motta ◽  
D. A. Pingor ◽  
...  
Keyword(s):  
Photobase Generators

Plasma-Developable Photoresist System Based on Polysiloxane Formation at the Irradiated Surface

1995 ◽  
pp. 318-332
Author(s):  
Masamitsu Shirai ◽  
Norihiko Nogi ◽  
Masahiro Tsunooka ◽  
Takahiro Matsuo

NMR Investigation of Miscibility in Novolac—Poly(2-methyl-1-pentene sulfone) Resists

1995 ◽  
pp. 180-193
Author(s):  
Sharon A. Heffner ◽  
David A. Mixon ◽  
Anthony E. Novembre ◽  
Peter A. Mirau

Polyimide Nanofoams Prepared from Styrenic Block Copolymers

1995 ◽  
pp. 425-438 ◽  
Author(s):  
J. L. Hedrick ◽  
T. P. Russell ◽  
C. Hawker ◽  
M. Sanchez ◽  
K. Carter ◽  
...  
Keyword(s):  
Block Copolymers

Structure, Properties, and Intermolecular Charge Transfer of Polyimides

1995 ◽  
pp. 395-412 ◽  
Author(s):  
Masatoshi Hasegawa ◽  
Junichi Ishii ◽  
Takahumi Matano ◽  
Yoichi Shindo ◽  
Tokuko Sugimura ◽  
...  
Keyword(s):  
Charge Transfer ◽  
Intermolecular Charge Transfer ◽  
Structure Properties

Styrylmethylsulfonamides: Versatile Base-Solubilizing Components of Photoresist Resins

1995 ◽  
pp. 194-206 ◽  
Author(s):  
Thomas X. Neenan ◽  
E. A. Chandross ◽  
J. M. Kometani ◽  
O. Nalamasu
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