2011 IEEE International Interconnect Technology Conference
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9781457705038
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Future of PECVD and spin-on ultra low-k materials

2011 ◽  
Author(s):  
W. Volksen ◽  
T. Frot ◽  
T. Magbitang ◽  
S. Gates ◽  
Mark Oliver ◽  
...  
Keyword(s):  
Low K

In-situ study and modeling of the decreasing reaction rate at the end of CoSi2 formation

2011 ◽  
Author(s):  
R. Delattre ◽  
R. Simola ◽  
C. Rivero ◽  
V. Serradeil ◽  
C. Perrin-Pellegrino ◽  
...  
Keyword(s):  
Reaction Rate ◽  
In Situ Study

Integrated NiSi defect reductions in 45nm node and beyond

2011 ◽  
Author(s):  
Jerander Lai ◽  
Yi-Wei Chen ◽  
Nien-Ting Ho ◽  
J. F. Lin ◽  
C.C. Huang ◽  
...  

Investigation of electrical programmable metal fuse in 28nm and beyond CMOS technology

2011 ◽  
Author(s):  
Kuei-Sheng Wu ◽  
Ching-Hsiang Tseng ◽  
Chang-Chien Wong ◽  
Sinclair Chi ◽  
Titan Su ◽  
...  
Keyword(s):  
Cmos Technology ◽  
Beyond Cmos
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