Advances in Chemistry - Microelectronics Processing
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Published By American Chemical Society

0841214751, 084122403x
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Physical Vapor Deposition Reactors

1989 ◽  
pp. 171-198 ◽  
Author(s):  
T. W. Fraser Russell ◽  
Bill N. Baron ◽  
Scott C. Jackson ◽  
Richard E. Rocheleau
Keyword(s):  
Vapor Deposition ◽  
Physical Vapor Deposition

PREFACE

1989 ◽  
pp. xiii-xiv
Author(s):  
DENNIS W. HESS ◽  
KLAVS F. JENSEN

scholarly journals Microelectronics Processing

1989 ◽  
pp. 1-33 ◽  
Author(s):  
Dennis W. Hess ◽  
Klavs F. Jensen

Resists in Microlithography

1989 ◽  
pp. 325-376 ◽  
Author(s):  
Michael J. O'Brien ◽  
David S. Soane
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