Samarium(II)-Electrocatalyzed Chemoselective Reductive Alkoxylation of Phthalimides

The unprecedented samarium-eletrocatalyzed reductive alkoxylation of phthalimides in a single step is presented. Under mild conditions, using electrogenerated Sm(II) with TMSCl (trimethyl chlorosilane), N-substituted 3-alkoxyl isoindolin-1-ones are isolated in good...

Investigation of Carbohydrate C-Silylation with Chlorosilanes

We studied possibility of silylation of lithiated carbohydrates using chlorosilanes. We observed that after the lithiation, the silylation is concurrent with a protonation reaction. In the case of trimethyl chlorosilane, we achieved 1:1 ratio with 36% isolated yield, while triphenyl chlorosilane gave 1:2 (silylated:reduced) ratio and 4% isolated yield. In the case of benzyl protected carbohydrate, silylation at benzylic position was observed.

Hydrophobic Silica Coating Based on Waterglass on Copper by Electrophoretic Deposition

Hydrophobic silica coating on copper (Cu) has been successfully prepared byelectrophoretic deposition (EPD) of silica sol prepared from waterglass. trimethyl chlorosilane (TMCS) was used as the modifying agent to produce hydrophobic coating by replacing the silanol groups on the silica surface with alkyl groups. The hydrophobicity was indicated by the contact angle of water droplet on the coating surface. It has been shown that TMCS concentration plays an important role in the preparation of hydrophobic coating. However, higher concentration of TMCS made the copper corroded before coated with silica due to the production of Cl-ions when TMCS reacted with water and silanol groups during electrophoretic deposition. In addition, the electricfield intensity, silica concentration and deposition time also influence the hydrophobicity of the coating. Increasing the three parameters produces silica coating with higher hydrophobicity. Thecontact angle of the silica coating can reach 130°. EIS analysis showed that the silica coating is very porous.

Recycle of Trimethyl Chlorosilane from Chlorosilane Waste

An effective method was proposed to recycle trimethyl chlorosilane (Me3SiCl) from chlorosilane waste generated by chlorosilane plants to produce hexamethyldisiloxane (Me3SiOSiMe3) and trimethylethoxysilane (Me3SiOEt) through hydrolysis and alcoholysis with ethanol, respectively. And this method had been used successfully in a chemical plant of Hebei Hongxing in North China. The concentration of Me3SiCl in the waste stream varied between 40 wt%~80 wt% mixed with SiCl4, Me2SiCl2, and a smaller amount of 2-MeC5H11 and 3-MeC5H11. Laboratory experiments were performed using simulated wastes in order to obtain optimal operational parameters and validate the feasibility of the method.