Simulation of the Residual Stress of the Y2O3/Al2O3 Composite Deuterium Permeation Barrier under Thermal Shock

A deuterium permeation barrier is an essential part in the core component of nuclear reactors. It can protect the structure made of steel from being penetrated by deuterium in a fusion reactor. However, residual stress induced in the operation would dramatically influence the mechanical endurance of the coating, threatening the safety of the facilities. In this paper, finite element analysis was conducted to investigate the residual stress in nanoscale Al2O3 and Y2O3 coatings and their composites under thermal shock, from 700°C to 25°C. The max principal stress is assumed as the cause of crack initiation in the coating, because ceramics are brittle and fragile under tensile stress. Max shear stress and max Mises stress in the systems are also analyzed, and the effect of thickness in the range 100 nm to 1000 nm was investigated. The max principal stress in Al2O3 coating reaches its maximum value, 1.33 GPa, when the thickness of coating reaches 450 nm. And the max principal stress decreases at a very low rate as the thickness increases exceeding 450 nm. The max principal stress in Y2O3 coating increases rapidly as the thickness increases when the thickness of the coating is below 250 nm, and the max principal stress is at about 0.9 GPa when the thickness exceeds 500 nm. The max principal stress in the Y2O3/Al2O3 (150 nm) composite coating occurs in the Al2O3 layer and shows no difference from the single layer of 150 nm thick Al2O3 coating. The max principal stress site of all three kinds of coating is located at the edge of the coating 25 nm away from the interface. The result shows that residual thermal stress in the coating increases as the thickness increases when the thickness of the coating is below 200 nm due to the stress singularity of the interface. And as the thickness exceeds 500 nm, the increase in thickness has little impact on the residual thermal stress in the coating. Coating an Y2O3 top layer will not introduce any more residual thermal stress under the thermal shock condition. The Y2O3 coating causes much less residual stress under thermal shock compared with Al2O3 owing to its much lower Young’s modulus. The max principal stress in the 300 nm thick Y2O3 coating is 0.85 GPa while that of the Al2O3 coating is 1.16 GPa. The max residual stress of the composite Y2O3/Al2O3 (150 nm) coating is determined by the Al2O3 layer.

Characterisation of biocompatible layers of ZrO28%Y2O used in combination with other ceramics to modify the surface of implants

The aim of this study was to deposit multi-functional ZrO28%Y2O3 coating layers using the plasma spray technology and then to characterise such layers. In combination with other biomedical ceramics, this coating is intended for the application in implant surface modification. The examination was focused on the mechanical properties and microstructure layers . Using the atmospheric plasma spraying, duplex ZrO28%Y2O3/Ni22Cr10Al1Y coating system was deposited on the X15Cr13 stainless steel, with two different thicknesses of the bond and ceramic coatings. The microstructure was analysed using an optical microscope, including the assessment of the content of micropores. The morphology of powder particles and ceramic coating surfaces were examined on a scanning electron microscope (SEM). The quality of the ZrO28%Y2O3 layers makes them suitable for the application and combination with other materials to create a system of biomedical or multifunctional coatings.

Plasma Etching Behavior of YOF Coating Deposited by Suspension Plasma Spraying in Inductively Coupled CHF3/Ar Plasma

Dense yttrium oxyfluoride (YOF) coating was successfully deposited by suspension plasma spraying (SPS) with coaxial feeding. After deposition for 6 min at a plasma power of 105 kW, the thickness of the YOF coating was 55 ± 3.2 µm with a porosity of 0.15% ± 0.01% and the coating rate was ~9.2 µm/min. The crystalline structure of trigonal YOF was confirmed by X-ray diffractometry (XRD). The etching behavior of the YOF coating was studied using inductively coupled CHF3/Ar plasma in comparison with those of the Al2O3 bulk and Y2O3 coating. Crater-like erosion sites and cavities were formed on the whole surface of the Al2O3 bulk and Y2O3 coating. In contrast, the surface of the YOF coating showed no noticeable difference before and after exposure to the CHF3/Ar plasma. Such high resistance of the YOF coating to fluorocarbon plasma comes from the strongly fluorinated layer on the surface. The fluorination on the surface of materials was confirmed by X-ray photoelectron spectrum analysis (XPS). Depth profiles of the compositions of Al2O3, Y2O3, and YOF samples by XPS revealed that the fluorination layer of the YOF coating was much thicker than those of Al2O3 and Y2O3. These results indicate that if the inner wall of the semiconductor process chamber is coated by YOF using SPS, the generation of contamination particles would be minimized during the fluorocarbon plasma etching process.