ysz thin film
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2021 ◽  
Vol 4 (9) ◽  
pp. 9046-9056
Author(s):  
Buse Bilbey ◽  
Meltem Sezen ◽  
Cleva W. Ow-Yang ◽  
Busra Tugba Camic ◽  
Aligul Buyukaksoy

2020 ◽  
Vol 8 (5) ◽  
pp. 104141
Author(s):  
Wanchana Lelalertsupakul ◽  
Suttichai Assabumrungrat ◽  
Palang Bumroongsakulsawat

2020 ◽  
Vol 7 (5) ◽  
pp. 056406
Author(s):  
N A Rusli ◽  
R Muhammad ◽  
S K Ghoshal ◽  
H Nur ◽  
N Nayan

2020 ◽  
Vol 28 ◽  
pp. 101220 ◽  
Author(s):  
Eder Lizarraga ◽  
John Read ◽  
Fernando Solorio ◽  
Gerson Torres ◽  
Jorge Vazquez ◽  
...  

2019 ◽  
Vol 6 (10) ◽  
pp. 106414 ◽  
Author(s):  
N A Rusli ◽  
R Muhammad ◽  
S K Ghoshal ◽  
H Nur ◽  
N Nayan ◽  
...  

2018 ◽  
Vol 775 ◽  
pp. 224-228
Author(s):  
Alexis Karla Garcia ◽  
Rinlee Butch M. Cervera

YSZ film was fabricated by a facile electrophoretic deposition process using commercial YSZ powders. YSZ films with average thickness of around 10 µm were deposited on LSM/YSZ substrate at 20 V for 20 minutes and subsequently sintered at 1200 °C, 1300 °C, and 1350°C. XRD patterns of the deposited and sintered films can be attributed to mostly cubic YSZ phase. On the other hand, SEM images revealed that a sintering temperature above 1300 °C was needed to obtain a denser YSZ film. The film morphology also showed that as the sintering temperature increases, the YSZ grain size also increases.


2017 ◽  
Vol 268 ◽  
pp. 352-357
Author(s):  
S.Y. Jaffar ◽  
Yussof Wahab ◽  
Rosnita Muhammad ◽  
Z. Othaman ◽  
Zuhairi Ibrahim ◽  
...  

Yttria-stabilized zirconia (YSZ) thin films were deposited successfully using RF magnetron sputtering. The substrate had been used are sapphire glass. A pure ceramic of Zr-Y is synthesized and processed into a planar magnetron target which is reactively sputtered with an Argon-Oxygen gas mixture to form Zr-Y-O nanostructure. The aim of this research is to study the conductivity and roughness YSZ thin film by using RF magnetron sputtering by varying the temperature deposition parameter. By lowering the YSZ thin film into nanostructure would enable for SOFC to be operate at lower temperature below 400°C. The YSZ nanostructure were controlled by varying the deposition parameters, including the deposition temperature and the substrate used. The crystalline of YSZ structure at 100W and temperature 300°C. The surface morphology of the films proved that at 300°C temperature rate deposition showed optimum growth morphology and density of YSZ thin films. Besides, the high deposition subtrate temperature affected the thickness of YSZ thin film at 80nm by using surface profiler. A higher rate of deposition is achievable when the sputtering mode of the Zr-Y target is metallic as opposed to oxide. YSZ is synthesizing to obtain the optimum thin film for SOFC application.


2017 ◽  
Vol 830 ◽  
pp. 012106
Author(s):  
A A Solovyev ◽  
A V Shipilova ◽  
I V Ionov ◽  
E A Smolyanskiy ◽  
A L Lauk ◽  
...  

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