reactive capping
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2020 ◽  
pp. 124946
Author(s):  
Francesco Todaro ◽  
George Barjoveanu ◽  
Sabino De Gisi ◽  
Carmen Teodosiu ◽  
Michele Notarnicola

2019 ◽  
Vol 652 ◽  
pp. 549-561 ◽  
Author(s):  
Alana O. Wang ◽  
Carol J. Ptacek ◽  
David W. Blowes ◽  
Blair D. Gibson ◽  
Richard C. Landis ◽  
...  

2013 ◽  
Vol 781-784 ◽  
pp. 2690-2694
Author(s):  
Nan Ping Xie ◽  
Ming Li ◽  
Jing Zhang ◽  
Xin Ping Li ◽  
Heng Quan

A sort of special cationic hydrophilic polyurethane with moderate chemical reactivity is prepared as anti-crocking agent of fabric dyed with reactive dyes. Influences of chemical reactivity and processing parameters such as quaterization and end-group capping conditions of auxiliaries on its application properties are studied. The results imply that moderate reactive capping rate of cationic hydrophilic polyurethane (about 13%), quaterization conditions of 55-60°C ×30-40min and end-group capping conditions of 50°C×40min are optimum. The deep color fabric treated with our auxiliary takes on a higher wet rubbing fastness than the untreated one by 1-1.5 grade and the hydrophility and soft handle of the fabric are better than the fabric treated with traditional color fixing agent.


1998 ◽  
Vol 525 ◽  
Author(s):  
K. Maex ◽  
E. Kondoh ◽  
A. Lauwers ◽  
A. Steegen ◽  
M. De Potter ◽  
...  

ABSTRACTThe introduction of rapid thermal processing for silicide formation has triggered a lot of research to temperature uniformity and reproducibility in RTP systems. In addition to the temperature, the ambient control is to be taken into account. Although gasses are specified to a low level of contaminants, the RTP step needs to be optimised for optimal contaminant reduction. Besides, the process wafer itself is a source of contamination.In this paper an overview will be given of the role of RTP ambient on the silicidation processes. The effect of the wafer on ambient purity will be highlighted. It will be shown that the use of a reactive capping layer during silicidation represents an adequate solution for both sources of contamination.


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