individual layer thickness
Recently Published Documents


TOTAL DOCUMENTS

18
(FIVE YEARS 1)

H-INDEX

9
(FIVE YEARS 0)

Materialia ◽  
2019 ◽  
Vol 7 ◽  
pp. 100400 ◽  
Author(s):  
A.V. Druzhinin ◽  
D. Ariosa ◽  
S. Siol ◽  
N. Ott ◽  
B.B. Straumal ◽  
...  

2018 ◽  
Vol 444 ◽  
pp. 505-510 ◽  
Author(s):  
Andreas Herz ◽  
Felix Theska ◽  
Diana Rossberg ◽  
Thomas Kups ◽  
Dong Wang ◽  
...  

2014 ◽  
Vol 63 ◽  
pp. 216-231 ◽  
Author(s):  
Y.Y. Lu ◽  
R. Kotoka ◽  
J.P. Ligda ◽  
B.B. Cao ◽  
S.N. Yarmolenko ◽  
...  

2012 ◽  
Vol 621 ◽  
pp. 23-26
Author(s):  
Wei Rao ◽  
Ding Guo Li ◽  
Hong Chun Yan

Ba0.8Sr0.2TiO3 thin films were prepared with various individual layer thicknesses using a sol– gel process. The individual layer thickness strongly affected the structure, ferroelectricity, and dielectric properties of the films. The films prepared with an individual layer thickness of 60 nm showed small equiaxed grains, cubic structure, temperature-independent dielectric constant, and no ferroelectricity. The films prepared with an individual layer thickness of 8 nm showed columnar grains, tetragonal structure, good ferroelectricity, and two dielectric peaks in the dielectric constant–temperature curve. The individual layer thickness for layer-by-layer homoepitaxy growth that resulted in columnar grains was <20 nm.


Sign in / Sign up

Export Citation Format

Share Document