The holy grail of pyrene-based surface ligands on the sensitivity of graphene-based field effect transistors

Graphene has witnessed intensive research interest due to its remarkabe charge mobility and the efforts in the use of graphene-based field effect transistors (GFET) for sensing of biological biomarkers is...

Patternable Quantum-Dot Photoresist with High Photolithographic Uniformity

We present a ligand-exchange-free photo-patternable quantum-dot photoresist (QDPR) with high photolithographic uniformity. The dispersion mechanism between the QD’s surface ligands and the functional groups of photoresist polymers are studied. Results show that the dispersibility and photoluminescent intensity of this QDPR can be both improved by controlling dispersant and antioxidant. For device demonstration, multi-colored quantum dot color conversion films (QDCCF) were prepared and patterned by a photolithography process. High QD dispersibility and film-forming uniformity were both achieved with this QDCCF. It is believed that the proposed QDPR has the potential to be extensively used in lighting or display applications.