Characterization of CdO Thin Films Prepared By SILAR Deposition Technique

International Journal of Chemical Engineering and Applications ◽

10.7763/ijcea.2010.v1.26 ◽

2010 ◽

pp. 151-154 ◽

Cited By ~ 6

Author(s):

M. Mahaboob Beevia ◽

M. Anusuyab ◽

V. Saravananc

Keyword(s):

Thin Films ◽

Deposition Technique ◽

Cdo Thin Films

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Preparation and characterization of Bi2Ti2O7 thin films by chemical solution deposition technique

Thin Solid Films ◽

10.1016/s0040-6090(99)01100-1 ◽

2000 ◽

Vol 370 (1-2) ◽

pp. 30-32 ◽

Cited By ~ 33

Author(s):

XianMing Wu ◽

Sh.W. Wang ◽

H. Wang ◽

Z. Wang ◽

S.X. Shang ◽

...

Keyword(s):

Thin Films ◽

Chemical Solution Deposition ◽

Chemical Solution ◽

Deposition Technique ◽

Solution Deposition

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Preparation and characterization of CdO thin films obtained by thermal oxidation of evaporated Cd thin films

Applied Surface Science ◽

10.1016/j.apsusc.2008.07.176 ◽

2008 ◽

Vol 255 (5) ◽

pp. 2665-2670 ◽

Cited By ~ 27

Author(s):

C. Danţuş ◽

G.G. Rusu ◽

M. Dobromir ◽

M. Rusu

Keyword(s):

Thin Films ◽

Thermal Oxidation ◽

Cdo Thin Films

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Characterization of copper selenide thin films deposited by chemical bath deposition technique

Applied Surface Science ◽

10.1016/j.apsusc.2004.05.208 ◽

2004 ◽

Vol 238 (1-4) ◽

pp. 184-188 ◽

Cited By ~ 13

Author(s):

Al-Mamun ◽

A.B.M.O. Islam

Keyword(s):

Thin Films ◽

Chemical Bath Deposition ◽

Copper Selenide ◽

Deposition Technique ◽

Chemical Bath Deposition Technique

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Characterization of CdO thin films by EER and photoelectrochemical measurements

Electrochimica Acta ◽

10.1016/0013-4686(93)80098-k ◽

1993 ◽

Vol 38 (15) ◽

pp. 2199-2201 ◽

Cited By ~ 14

Author(s):

I.J. Ferrer

Keyword(s):

Thin Films ◽

Cdo Thin Films

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Preparation and Characterization of Thin Films of (Bi,Pb)2Sr2Ca2Cu3O10+δ Using the Pulsed Laser Deposition Technique

High Tc Superconductor Thin Films ◽

10.1016/b978-0-444-89353-6.50084-1 ◽

1992 ◽

pp. 517-522

Author(s):

F.S. Razavi ◽

H.-U. Habermeier

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Deposition Technique

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Preparation and Characterization of Highly Conducting and Optically Transparent Fluorine Doped CdO Thin Films

Journal of Applied Sciences ◽

10.3923/jas.2012.1630.1635 ◽

2012 ◽

Vol 12 (16) ◽

pp. 1630-1635 ◽

Cited By ~ 2

Author(s):

Aishwarya Viswanath ◽

N. Nirmmala Devi ◽

B.G. Jeyaprakas ◽

R. Chandiramo

Keyword(s):

Thin Films ◽

Optically Transparent ◽

Cdo Thin Films

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Preparation and Characterization of CdO Thin Films Prepared by Chemical Method

Journal of Environmental Nanotechnology ◽

10.13074/jent.2017.03.171228 ◽

2017 ◽

Vol 6 (1) ◽

pp. 59-66 ◽

Cited By ~ 1

Keyword(s):

Thin Films ◽

Chemical Method ◽

Cdo Thin Films

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Synthesis and Characterization of PbTiO3 Thin Films Grown by Chemical Beam Deposition

MRS Proceedings ◽

10.1557/proc-204-551 ◽

1990 ◽

Vol 204 ◽

Cited By ~ 1

Author(s):

K.Y. Hsieh ◽

S.H. Rou ◽

L.L.H. King ◽

A.I. Kingon

Keyword(s):

Thin Films ◽

Active Oxygen ◽

Deposition Technique ◽

Fine Grained ◽

Si Substrates ◽

Gaas Devices ◽

Substrate Temperatures ◽

Beam Deposition

ABSTRACTA new deposition technique for PbTiO3 films utilizing chemical beams of metalorganic sources in an ultrahigh vacuum chamber is demonstrated. Ozone is introduced to provide a source of active oxygen. The role of active oxygen in controlling the surface chemical reactions is discussed. Fine grained, single phase PbTiO3 films have been deposited on MgO (100) and SiO2/Si substrates at substrate temperatures as low as 350°C. Films were characterized by XRD, SEM, and TEM. The results suggest that the chemical beam deposition technique provides another method for the fabrication and integration of ferroelectric thin films with silicon (or GaAs) devices.

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