Effect of high temperature annealing on non-thermal equilibrium phases induced by energetic ion irradiation in FeRh and Ni3V intermetallic compounds

2014 ◽  
Vol 53 (5S1) ◽  
pp. 05FC08 ◽  
Author(s):  
Akihiro Hashimoto ◽  
Yasuyuki Kaneno ◽  
Satoshi Semboshi ◽  
Hiroaki Yoshizaki ◽  
Yuichi Saitoh ◽  
...  
2012 ◽  
Vol 111 (7) ◽  
pp. 07A742 ◽  
Author(s):  
A. Tohki ◽  
K. Aikoh ◽  
A. Iwase ◽  
K. Yoneda ◽  
S. Kosugi ◽  
...  

1992 ◽  
Vol 279 ◽  
Author(s):  
Toshihiko Kanayama ◽  
Hisao Tanoue

ABSTRACTTo elucidate the mechanism of dose rate (DR) dependence of electrical activation, following two questions are investigated; why the amount of damage remaining after ion bombardment depends on DR and why it affects the electrical activation after high temperature annealing. From the observation that the DR dependence scales with temperature, the activation energy of recovery during ion irradiation has been estimated to be 0.75 and 1.0 eV. A higher DR suppresses the recovery and results in more damage, which in turn delays the electrical activation of implanted impurities.


1990 ◽  
Vol 5 (9) ◽  
pp. 1880-1886 ◽  
Author(s):  
C. Suryanarayana ◽  
F. H. Froes

The solid solubility of magnesium in titanium under equilibrium conditions is reported to be extremely small. Mechanical alloying of a mixture of titanium and magnesium powders resulted in the formation of nanocrystalline (10–15 nm in size) grains of Ti–Mg solid solution. This solid solution has a metastable fcc structure with a = 0.426 nm and contains about 3 wt.% (6 at.%) magnesium in it. It is suggested that the fcc structure has formed as a result of the heavy mechanical deformation of the hep structure introduced during milling. High temperature annealing of the metastable solid solution led to its decomposition forming the equilibrium phases, viz., elemental titanium and magnesium.


Author(s):  
P. Roitman ◽  
B. Cordts ◽  
S. Visitserngtrakul ◽  
S.J. Krause

Synthesis of a thin, buried dielectric layer to form a silicon-on-insulator (SOI) material by high dose oxygen implantation (SIMOX – Separation by IMplanted Oxygen) is becoming an important technology due to the advent of high current (200 mA) oxygen implanters. Recently, reductions in defect densities from 109 cm−2 down to 107 cm−2 or less have been reported. They were achieved with a final high temperature annealing step (1300°C – 1400°C) in conjunction with: a) high temperature implantation or; b) channeling implantation or; c) multiple cycle implantation. However, the processes and conditions for reduction and elimination of precipitates and defects during high temperature annealing are not well understood. In this work we have studied the effect of annealing temperature on defect and precipitate reduction for SIMOX samples which were processed first with high temperature, high current implantation followed by high temperature annealing.


Alloy Digest ◽  
1993 ◽  
Vol 42 (4) ◽  

Abstract Ferroperm is a soft magnetic alloy that contains 1% aluminum. This addition of aluminum combined with high-temperature annealing increases permeability and reduces coercivity without decreasing the high-saturation magnetization of pure iron. This datasheet provides information on composition, physical properties, elasticity, and tensile properties as well as fracture toughness. It also includes information on forming. Filing Code: FE-99. Producer or source: NKK Corporation.


2018 ◽  
Vol 42 (1) ◽  
pp. 149-158
Author(s):  
SHUANG XI ◽  
SHUANGSHUANG ZUO ◽  
YING LIU ◽  
YINLONG ZHU ◽  
YUTU YANG ◽  
...  

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