scholarly journals Monte Carlo simulation of optical emission spectra in electron assisted chemical vapor deposition of diamond

2005 ◽  
Vol 54 (2) ◽  
pp. 880
Author(s):  
Wang Zhi-Jun ◽  
Dong Li-Fang ◽  
Shang Yong
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Emission Spectra ◽  
Chemical Vapor ◽  
Optical Emission ◽  
Optical Emission Spectra

Investigation of optical emission spectroscopy in diamond chemical vapor deposition by Monte Carlo simulation

2008 ◽  
Vol 6 (3) ◽  
pp. 218-221
Author(s):  
王志军 Zhijun Wang ◽  
董丽芳 Lifang Dong ◽  
李盼来 Panlai Li ◽  
尚勇 Yong Shang ◽  
何寿杰 Shoujie He
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Chemical Vapor ◽  
Optical Emission ◽  
Diamond Chemical Vapor Deposition

Optical Emission Spectra Related to Microstructures of Diamond Film Deposited by Plasma Enhanced Chemical Vapor Deposition

2006 ◽  
Vol 321-323 ◽  
pp. 1691-1694
Author(s):  
Mikio Noda ◽  
Masayoshi Umeno ◽  
Hee Joon Kim
Keyword(s):  
Chemical Vapor Deposition ◽  
Deposition Rate ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Emission Spectra ◽  
Chemical Vapor ◽  
Optical Emission ◽  
Deposition Process ◽  
Amorphous Component ◽  
Optical Emission Spectra

Optical emission spectra from plasma during deposition of diamond film were investigated by an optic multi-channel spectrometer using a CCD array sensor. The diamond film was deposited by DC plasma enhanced (PE) chemical vapor deposition (CVD) using hydrogen and methane gas mixture, where substrate was located at near the plasma and the discharge was performed by intermittent discharge. When Pg during the deposition was increased from 50 to 250 Torr, the optical emissions of hydrogen (Hα and Hβ) and C2 were increased, and corresponding to these increases, deposition rate of the diamond film was increased and crystalline quality became superior. When Cm was changed from 1 to 3 %, the emission from C2 was increased, and whereas, the emission from hydrogen was decreased. Corresponding to these changes of the emission, the deposition rate of the film was increased and amorphous component in the deposited film was also increased. These results show that the increase of C2 results in the increase of the deposition rate, and increase of hydrogen is effective to eliminate amorphous component, and therefore, monitoring of the optical emission from hydrogen and C2 is useful for the deposition process of the diamond film.

A Monte Carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition

1998 ◽  
Vol 10 (1-4) ◽  
pp. 116-126 ◽  
Author(s):  
J. Flicstein ◽  
S. Pata ◽  
J.M. Le Solliec ◽  
L.S. How Kee Chun ◽  
J.F. Palmier ◽  
...  
Keyword(s):  
Thin Film ◽  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Film Microstructure
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