Investigation of a-Si:H film characteristics influenced by magnetic field gradient in MWECR CVD plasma system
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Keyword(s):
1996 ◽
Vol 54
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pp. 884-885
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Keyword(s):
2014 ◽
Vol 248
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pp. 126-130
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Keyword(s):
2018 ◽
2018 ◽
Vol 741
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pp. 1006-1011
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