scholarly journals THE METHOD OF FOCUSED Ga+ ION BEAM IMPLANTATION TO FABRICATE SEMICONDUCTOR QUANTUM WELL WIRE

1996 ◽  
Vol 45 (3) ◽  
pp. 486
Author(s):  
WU ZHENG-YUN ◽  
HUANG QI-SHENG
1995 ◽  
Vol 17 (1) ◽  
pp. 85-90 ◽  
Author(s):  
Vera Beatriz Campos ◽  
Marcos H. Degani ◽  
Oscar Hipólito

1992 ◽  
Author(s):  
Howard E. Jackson ◽  
Ahn G. Choo ◽  
Bernard L. Weiss ◽  
Joseph T. Boyd ◽  
Andrew J. Steckl ◽  
...  

2018 ◽  
Vol 93 (9) ◽  
pp. 095804 ◽  
Author(s):  
M Fernández-Lozada ◽  
Ri Betancourt-Riera ◽  
Re Betancourt-Riera ◽  
J M Nieto Jalil

1988 ◽  
Vol 126 ◽  
Author(s):  
P. M. Petroff ◽  
Xueyu Qian ◽  
Per Olof Holtz ◽  
R. J. Simes ◽  
J. H. English ◽  
...  

ABSTRACTThe effects of Implantation Enhanced Interdiffusion (IEI) in GaAs-GaAlAs quantum well structures are investigated. A Focused Ion Beam (FIB) source is used to implant narrow lines (500Å wide) with Ga+ ions. IEI in these structures is characterized by low temperature Cathodoluminescence. The dose effects and annealing kinetics dependence on IEI are presented. An unusual damage distribution which produces IEI deep below the surface is observed for the case of FIB implant. The possible origins of this effect and the limits of IEI for processing quantum wires and boxes are discussed.


2006 ◽  
Vol 20 (01) ◽  
pp. 49-60
Author(s):  
B. REKHA ◽  
K. NAVANEETHAKRISHNAN

Carrier mobility in a narrow GaAs semiconductor quantum well wire embedded in the GaAlAs matrix is investigated using a simple model developed by Lee and Spector. Five different screening functions with three different impurity distributions are used in the calculations. The results show that (i) the choice of the screening function is important as the mobility values vary by two orders of magnitude, and (ii) the mobility values not only depend on the impurity distribution but also vary differently with the wire radius. While hydrostatic pressure reduces the mobility values, temperature increases the values. The polaronic effect decreases the mobility values irrespective of temperature and pressure, the maximum contribution being 9%.


2015 ◽  
Vol 24 (11) ◽  
pp. 117302 ◽  
Author(s):  
Re. Betancourt-Riera ◽  
Ri. Betancourt-Riera ◽  
J. M. Nieto Jalil ◽  
R. Riera

Sign in / Sign up

Export Citation Format

Share Document