scholarly journals Self-Assembly of GeMn Nanocolumns in GeMn Thin Films

Author(s):  
Thi Giang Le

This chapter presents the results of growing GeMn nanocolumns on Ge(001) substrates by means of molecular beam epitaxy (MBE). The samples have been prepared by co-depositing Ge and Mn at growth temperature of 130°C and Mn at concentration of ~6% to ensure the reproduction of GeMn nanocolumns. Based on the observation of changes in reflection high-energy electron diffraction (RHEED) patterns during nanocolumn growth, surface signals of GeMn nanocolumn formation have been identified. Structural analysis using transmission electron microscopy (TEM) show the self-assembled nanocolumns with core-shell structure extend through the whole thickness of the GeMn layer. Most of nanocolumns are oriented perpendicular to the interface along the growth direction. The nanocolumn size has been determined to be about 5–8 nm in diameter and a maximum height of 80 nm. A phenomenological model has been proposed to explain the driving force for self-assembly and growth mechanisms of GeMn nanocolumns. The in-plane or lateral Mn diffusion/segregation is driven by a low solubility of Mn in Ge while the driving force of Mn vertical segregation is induced by the surfactant effect along the [001] direction.

Author(s):  
Z.L. Wang ◽  
J. Bentley ◽  
R.E. Clausing ◽  
L. Heatherly ◽  
L.L. Horton

Microstructural studies by transmission electron microscopy (TEM) of diamond films grown by chemical vapor deposition (CVD) usually involve tedious specimen preparation. This process has been avoided with a technique that is described in this paper. For the first time, thick as-grown diamond films have been examined directly in a conventional TEM without thinning. With this technique, the important microstructures near the growth surface have been characterized. An as-grown diamond film was fractured on a plane containing the growth direction. It took about 5 min to prepare a sample. For TEM examination, the film was tilted about 30-45° (see Fig. 1). Microstructures of the diamond grains on the top edge of the growth face can be characterized directly by transmitted electron bright-field (BF) and dark-field (DF) images and diffraction patterns.


Author(s):  
Tai D. Nguyen ◽  
Ronald Gronsky ◽  
Jeffrey B. Kortright

Nanometer period Ru/C multilayers are one of the prime candidates for normal incident reflecting mirrors at wavelengths < 10 nm. Superior performance, which requires uniform layers and smooth interfaces, and high stability of the layered structure under thermal loadings are some of the demands in practical applications. Previous studies however show that the Ru layers in the 2 nm period Ru/C multilayer agglomerate upon moderate annealing, and the layered structure is no longer retained. This agglomeration and crystallization of the Ru layers upon annealing to form almost spherical crystallites is a result of the reduction of surface or interfacial energy from die amorphous high energy non-equilibrium state of the as-prepared sample dirough diffusive arrangements of the atoms. Proposed models for mechanism of thin film agglomeration include one analogous to Rayleigh instability, and grain boundary grooving in polycrystalline films. These models however are not necessarily appropriate to explain for the agglomeration in the sub-nanometer amorphous Ru layers in Ru/C multilayers. The Ru-C phase diagram shows a wide miscible gap, which indicates the preference of phase separation between these two materials and provides an additional driving force for agglomeration. In this paper, we study the evolution of the microstructures and layered structure via in-situ Transmission Electron Microscopy (TEM), and attempt to determine the order of occurence of agglomeration and crystallization in the Ru layers by observing the diffraction patterns.


2002 ◽  
Vol 737 ◽  
Author(s):  
Shashank Sharma ◽  
Mahendra K. Sunkara ◽  
Elizabeth C. Dickey

ABSTRACTWe report for the first time, bulk synthesis of single crystalline silicon nanowires using molten gallium pools and an activated vapor phase containing silane. The resulting silicon nanowires were single crystalline with <100> growth direction. Nanowires contained an unexpectedly thin, non-uniform oxide sheath determined using high-resolution Transmission Electron Microscopy (TEM). Nanowires were tens of nanometers in diameter and tens to hundreds of microns long. The use of activated gas phase chemistry containing solute of interest over molten metal pools of low-solubility eutectics such as gallium offer a viable route to generate nanowire systems containing abrupt compositional hetero-interfaces.


2010 ◽  
Vol 1258 ◽  
Author(s):  
Khalid Naji ◽  
Herve Dumont ◽  
Guillaume Saint-Girons ◽  
Gilles Patriarche ◽  
michel Gendry

AbstractIndium phosphide (InP) nanowires (NWs) were grown by molecular beam epitaxy on various substrates including SrTiO3 (001), Si (001) and InP (111) at a growth temperature of 380°C. We used the Vapor Liquid Solid assisted method with Au as a metal catalyst. The composition of the catalyst particles and the crystalline structure of the nanowires were compared using reflection high energy electron diffraction, scanning electron microscopy and high resolution transmission electron microscope. It is found that InP nanowires grown onto InP and SrTiO3 substrates are structurally defects free with a wurtzite structure. On Si (001) substrates, the presence of stacking faults and cubic phase insertion along the growth direction is observed. The effect of the substrate on the composition of catalyst droplets and consequently on the crystalline quality of the nanowires is discussed for the conditions of nucleation and defect formation.


IUCrJ ◽  
2014 ◽  
Vol 1 (6) ◽  
pp. 439-445 ◽  
Author(s):  
Yan Cao ◽  
Hui Wu ◽  
Yuji Higaki ◽  
Hiroshi Jinnai ◽  
Atsushi Takahara

Molecular self-assembly of nylon-12 rods in self-organized nanoporous alumina cylinders with two different diameters (65 and 300 nm) is studied with transmission electron microscopy (TEM) and wide-angle X-ray diffraction (WAXD) in symmetrical reflection mode. In a rod with a 300 nm diameter, the tendency of the hydrogen-bonding direction of a γ-form crystal parallel to the long axis of the rod is not clear because of weak two-dimensional confinement. In a rod with a diameter of 65 nm, the tendency of the hydrogen-bonding direction of a γ-form crystal parallel to the long axis of the rod is more distinct because of strong two-dimensional confinement. For the first time, selected-area electron diffraction (SAED) is applied in a transmission electron microscope to a polymer nanorod in order to determine the hydrogen-bond sheet and lamellar orientations. Results of TEM–SAED and WAXD showed that the crystals within the rod possess the γ-form of nylon-12 and that thebaxis (stem axis) of the γ-form crystals is perpendicular to the long axis of the rod. These results revealed that only lamellae with 〈h0l〉 directions are able to grow inside the nanopores and the growth of lamellae with 〈hkl〉 (k≠ 0) directions is stopped owing to impingements against the cylinder walls. The dominant crystal growth direction of the 65 nm rod in stronger two-dimensional confinement is in between the [−201] and [001] directions due to the development of a hydrogen-bonded sheet restricted along the long axis of the rod.


2002 ◽  
Vol 728 ◽  
Author(s):  
Qiang Tang ◽  
Xian Liu ◽  
Theodore I. Kamins ◽  
Glenn S. Solomon ◽  
James S. Harris

AbstractSilicon nanowires catalyzed by Ti islands have been grown by molecular beam epitaxy (MBE) using Si2H6 as the gas source and characterized by in situ reflection high-energy electron diffraction (RHEED), scanning-electron microscopy (SEM) and transmission-electron microscopy (TEM). Approximately one monolayer of Ti was deposited on Si(001) wafers, which, during annealing, reacted with silicon and formed TiSi2 islands. After annealing, but before Si growth, the stoichiometric TiSi2 (C49) phase was observed with RHEED.The silicon nanowires are typically between 20 and 40 nanometers in diameter and several hundred nanometers long. The nanowires changed their growth direction several times during growth, resulting in complex RHEED patterns, which can be matched very well by simulated RHEED patterns calculated assuming that the nanowires change their direction by twinning along (111) planes. RHEED patterns of epitaxial silicon nanowires, first-order twinned nanowires (twinned relative to the substrate orientation), second-order twinned nanowires (twinned relative to the first-order twin), and TiSi2 were observed.


2018 ◽  
Vol 32 (20) ◽  
pp. 1850224
Author(s):  
Thi Kim Phuong Luong

Highly n-doped Ge on Si has been demonstrated to be a promising candidate for the compatible light source with silicon technology. In the in-situ n-doping process of Ge epilayers, the active concentration is limited below [Formula: see text] due to low solubility of dopant element in Ge matrix. Many dopant atoms are incorporated in the interstitial sites instead of substitution sites. We present a new approach to increase the electron concentration by adding carbon elements into P-doped Ge epilayers. A gain of PL intensity has been obtained with a factor of 2. The crystalline quality of the Ge film is also investigated owing to using a reflection high-energy electron diffraction (RHEED) apparatus and high-resolution transmission electron microscopy (HR-TEM). Phosphorus dopant is incorporated into Ge epilayers from specific GaP solid source.


1994 ◽  
Vol 357 ◽  
Author(s):  
Yong-Chae Chung ◽  
Bernhardt J. Wuensch

AbstractFabrication of NiO bicrystals having Σ5 (310) and Σ13 (510) coincidence-site tilt boundaries was successfully carried out by a CVT (Chemical Vapor Transport) method. The CVT method was a very advantageous way to grow ultra pure crystals since it preferentially transported NiO from the source pellet to the substrate by reaction with a HCl carrying gas. Single crystal MgO was used as a substrate for epitaxial growth of NiO as the readily available MgO crystals have only a 1% lattice mismatch with NiO. Moreover, MgO is soluble in acids while NiO is not. This permitted removal of the substrate crystal after growth to provide a free-standing NiO crystal. Using two single crystals of MgO with the desired tilt orientation as a substrate, NiO bicrystals were fabricated at growth rates greater than 100 μm/hour at 1,400K using 250 torr of HCI(g) as a carrying agent. The purity of the epitaxial NiO crystals was determined by mass spectrometry and neutron activation analysis. The grain boundary in the bicrystals is exactly perpendicular to the (100) growth surface. Highly-reflective facets along the growth direction suggest high mechanical quality. High-resolution transmission electron microscopy of the Σ13 boundary revealed structure at the atomic scale that provided no evidence for segregated phases.


Author(s):  
L.E. Murr

The production of void lattices in metals as a result of displacement damage associated with high energy and heavy ion bombardment is now well documented. More recently, Murr has shown that a void lattice can be developed in natural (colored) fluorites observed in the transmission electron microscope. These were the first observations of a void lattice in an irradiated nonmetal, and the first, direct observations of color-center aggregates. Clinard, et al. have also recently observed a void lattice (described as a high density of aligned "pores") in neutron irradiated Al2O3 and Y2O3. In this latter work, itwas pointed out that in order that a cavity be formed,a near-stoichiometric ratio of cation and anion vacancies must aggregate. It was reasoned that two other alternatives to explain the pores were cation metal colloids and highpressure anion gas bubbles.Evans has proposed that void lattices result from the presence of a pre-existing impurity lattice, and predicted that the formation of a void lattice should restrict swelling in irradiated materials because it represents a state of saturation.


Author(s):  
Joseph J. Comer ◽  
Charles Bergeron ◽  
Lester F. Lowe

Using a Van De Graaff Accelerator thinned specimens were subjected to bombardment by 3 MeV N+ ions to fluences ranging from 4x1013 to 2x1016 ions/cm2. They were then examined by transmission electron microscopy and reflection electron diffraction using a 100 KV electron beam.At the lowest fluence of 4x1013 ions/cm2 diffraction patterns of the specimens contained Kikuchi lines which appeared somewhat broader and more diffuse than those obtained on unirradiated material. No damage could be detected by transmission electron microscopy in unannealed specimens. However, Dauphiné twinning was particularly pronounced after heating to 665°C for one hour and cooling to room temperature. The twins, seen in Fig. 1, were often less than .25 μm in size, smaller than those formed in unirradiated material and present in greater number. The results are in agreement with earlier observations on the effect of electron beam damage on Dauphiné twinning.


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