scholarly journals EUV/Soft X-Ray Interference Lithography

2018 ◽  
Author(s):  
Shumin Yang ◽  
Yanqing Wu
Keyword(s):  
Interference Lithography ◽  
X Ray

Fabrication of high aspect ratio nanoscale periodic structures by the soft X-ray interference lithography

2017 ◽  
Vol 170 ◽  
pp. 49-53 ◽  
Author(s):  
Jun Zhao ◽  
Yanqing Wu ◽  
Chaofan Xue ◽  
Shumin Yang ◽  
Liansheng Wang ◽  
...  
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Periodic Structures ◽  
Interference Lithography ◽  
X Ray

scholarly journals The recent development of soft x-ray interference lithography in SSRF

2020 ◽  
Vol 2 (1) ◽  
pp. 012005
Author(s):  
Jun Zhao ◽  
Shumin Yang ◽  
Chaofan Xue ◽  
Liansheng Wang ◽  
Zhaofeng Liang ◽  
...  
Keyword(s):  
Interference Lithography ◽  
X Ray

Interference lithography by a soft x-ray laser beam: Nanopatterning on photoresists

2007 ◽  
Vol 102 (3) ◽  
pp. 034313 ◽  
Author(s):  
A. Ritucci ◽  
A. Reale ◽  
P. Zuppella ◽  
L. Reale ◽  
P. Tucceri ◽  
...  
Keyword(s):  
Laser Beam ◽  
Interference Lithography ◽  
X Ray

Interference lithography at EUV and soft X-ray wavelengths: Principles, methods, and applications

2015 ◽  
Vol 143 ◽  
pp. 55-63 ◽  
Author(s):  
Nassir Mojarad ◽  
Jens Gobrecht ◽  
Yasin Ekinci
Keyword(s):  
Interference Lithography ◽  
X Ray

Broadband interference lithography at extreme ultraviolet and soft x-ray wavelengths

2014 ◽  
Vol 39 (8) ◽  
pp. 2286 ◽  
Author(s):  
Nassir Mojarad ◽  
Daniel Fan ◽  
Jens Gobrecht ◽  
Yasin Ekinci
Keyword(s):  
Extreme Ultraviolet ◽  
Interference Lithography ◽  
X Ray

scholarly journals High throughput fabrication of large-area plasmonic color filters by soft-X-ray interference lithography

2016 ◽  
Vol 24 (17) ◽  
pp. 19112 ◽  
Author(s):  
Libin Sun ◽  
Xiaolin Hu ◽  
Qingjun Wu ◽  
Liansheng Wang ◽  
Jun Zhao ◽  
...  
Keyword(s):  
High Throughput ◽  
Interference Lithography ◽  
Large Area ◽  
X Ray ◽  
Color Filters

The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF

2018 ◽  
Vol 25 (6) ◽  
pp. 1869-1876 ◽  
Author(s):  
Chaofan Xue ◽  
Xiangyu Meng ◽  
Yanqing Wu ◽  
Yong Wang ◽  
Liansheng Wang ◽  
...  
Keyword(s):  
Synchrotron Radiation ◽  
Process Design ◽  
Spatial Coherence ◽  
Interference Lithography ◽  
Wave Optics ◽  
Shanghai Synchrotron Radiation Facility ◽  
X Ray ◽  
Whole Process ◽  
Simulation Results

A new spatially coherent beamline has been designed and constructed at the Shanghai Synchrotron Radiation Facility. Here, the design of the beamline is introduced and the spatial coherence is analyzed throughout the whole process by wave optics. The simulation results show good spatial coherence at the endstation and have been proven by experiment results.

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