scholarly journals Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities

Lithography ◽  
10.5772/8172 ◽  
2010 ◽  
Author(s):  
N.I. Chkhalo ◽  
A.E. Pestov ◽  
N. N. ◽  
Salashchenko ◽  
M.N. Toropov
Keyword(s):  
Objective Lens ◽  
Ultrahigh Resolution

Development of 200kV ultrahigh-resolution analytical electron microscope

1989 ◽  
Vol 47 ◽  
pp. 108-109
Author(s):  
T. Kaneyama ◽  
M. Naruse ◽  
Y. Ishida ◽  
M. Kersker
Keyword(s):  
Electron Microscope ◽  
Optical Constants ◽  
Materials Science ◽  
Objective Lens ◽  
The Finite Element Method ◽  
Ultrahigh Resolution ◽  
Analytical Electron ◽  
Analytical Electron Microscope ◽  
Characteristic Features ◽  
Better Than

In the field of materials science, the importance of the ultrahigh resolution analytical electron microscope (UHRAEM) is increasing. A new UHRAEM which provides a resolution of better than 0.2 nm and allows analysis of a few nm areas has been developed. [Fig. 1 shows the external view] The followings are some characteristic features of the UHRAEM.Objective lens (OL)Two types of OL polepieces (URP for ±10' specimen tilt and ARP for ±30' tilt) have been developed. The optical constants shown in the table on the next page are figures calculated by the finite element method. However, Cs was experimentally confirmed by two methods (namely, Beam Tilt method and Krivanek method) as 0.45 ∼ 0.50 mm for URP and as 0.9 ∼ 1.0 mm for ARP, respectively. Fig. 2 shows an optical diffractogram obtained from a micrograph of amorphous carbon with URP under the Scherzer defocus condition. It demonstrates a resolution of 0.19 nm and a Cs smaller than 0.5 mm.

Development of high-performance objective lens polepiece for ultrahigh resolution Analytical Electron Microscope

1993 ◽  
Vol 51 ◽  
pp. 254-255
Author(s):  
K. Fukushima ◽  
T. Kaneyama ◽  
F. Hosokawa ◽  
H. Tsuno ◽  
T. Honda ◽  
...  
Keyword(s):  
Electron Microscope ◽  
High Performance ◽  
Open Space ◽  
Materials Science ◽  
Objective Lens ◽  
Ultrahigh Resolution ◽  
Science Field ◽  
Specimen Holder ◽  
Analytical Electron ◽  
Analytical Electron Microscope

Recently, in the materials science field, the ultrahigh resolution analytical electron microscope (UHRAEM) has become a very important instrument to study extremely fine areas of the specimen. The requirements related to the performance of the UHRAEM are becoming gradually severer. Some basic characteristic features required of an objective lens are as follows, and the practical performance of the UHRAEM should be judged by totally evaluating them.1) Ultrahigh resolution to resolve ultrafine structure by atomic-level observation.2) Nanometer probe analysis to analyse the constituent elements in nm-areas of the specimen.3) Better performance of x-ray detection for EDS analysis, that is, higher take-off angle and larger detection solid angle.4) Higher specimen tilting angle to adjust the specimen orientation.To attain these requirements simultaneously, the objective lens polepiece must have smaller spherical and chromatic aberration coefficients and must keep enough open space around the specimen holder in it.

Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities

2008 ◽  
Author(s):  
Nikolay I. Chkhalo ◽  
Evgeniy B. Kluenkov ◽  
Aleksey E. Pestov ◽  
Denis G. Raskin ◽  
Nikolay N. Salashchenko ◽  
...  
Keyword(s):  
Objective Lens ◽  
Ultrahigh Resolution

scholarly journals Ultrahigh resolution and color gamut with scattering-reducing transmissive pixels

2019 ◽  
Vol 10 (1) ◽  
Author(s):  
June Sang Lee ◽  
Ji Yeon Park ◽  
Yong Hwan Kim ◽  
Seokwoo Jeon ◽  
Olivier Ouellette ◽  
...  
Keyword(s):  
Surface Plasmon ◽  
Multispectral Imaging ◽  
Localized Surface Plasmon ◽  
Objective Lens ◽  
Color Gamut ◽  
Ultrahigh Resolution ◽  
Localized Surface Plasmon Resonances ◽  
Recent Trends ◽  
Color Mixing ◽  
And Performance

Abstract While plasmonic designs have dominated recent trends in structural color, schemes using localized surface plasmon resonances and surface plasmon polaritons that simultaneously achieve high color vibrancy at ultrahigh resolution have been elusive because of tradeoffs between size and performance. Herein we demonstrate vibrant and size-invariant transmissive type multicolor pixels composed of hybrid TiOx-Ag core-shell nanowires based on reduced scattering at their electric dipolar Mie resonances. This principle permits the hybrid nanoresonator to achieve the widest color gamut (~74% sRGB area coverage), linear color mixing, and the highest reported single color dots-per-inch (58,000~141,000) in transmission mode. Exploiting such features, we further show that an assembly of distinct nanoresonators can constitute a multicolor pixel for use in multispectral imaging, with a size that is ~10-folds below the Nyquist limit using a typical high NA objective lens.

scholarly journals Development of Ultrahigh Resolution Objective Lens Enabling High Analytical Sensitivity

2020 ◽  
Vol 26 (S2) ◽  
pp. 3126-3128
Author(s):  
Yu Jimbo ◽  
Ichiro Ohnishi ◽  
Hiroki Hashiguchi ◽  
Yorinobu Iwasawa ◽  
Shigeyuki Morishita ◽  
...  
Keyword(s):  
Objective Lens ◽  
Analytical Sensitivity ◽  
Ultrahigh Resolution ◽  
High Analytical Sensitivity

An Application of 200kV Ultrahigh Resolution Analytical Electron Microscope

1990 ◽  
Vol 48 (2) ◽  
pp. 98-99
Author(s):  
M. Suzuki ◽  
T. Kaneyama ◽  
E. Watanabe ◽  
M. Naruse ◽  
Y. Kokubo
Keyword(s):  
Electron Microscope ◽  
Spherical Aberration ◽  
Objective Lens ◽  
Theoretical Point ◽  
Ultrahigh Resolution ◽  
X Ray ◽  
Probe Current ◽  
Probe Size ◽  
Analytical Electron ◽  
Analytical Electron Microscope

A 200 kV ultrahigh resolution analytical electron microscope (UHRAEM), JEM-2010, enables both ultrahigh resolution imaging with a theoretical point resolution of 0.194 nm and nm-area analysis. In this paper, its preliminary data for x-ray analysis (Energy Dispersive X ray Spectroscopy: EDS) and its application data will be shown.An objective lens polepiece has been designed to minimize the spherical aberration coefficient (Cs) of the prefield and thereby increase the probe current in small probe size for nm-area EDS analysis. Measured values of Cs and chromatic aberration coefficient (Cc) are 0.5 mm and 1.0 mm, respectively. Fig. 1 shows a theoretical relation between the illumination angle and probe size of this objective lens on the assumption that the brightness of electrons is 6×106 A/cm2 • str in a LaB6 cathode. This calculation shows that an electron probe smaller than 1 nm in diameter is available even with a probe current of 10 pA.

Design of a 400KV Ultrahigh-Resolution Analytical TEM

1990 ◽  
Vol 48 (1) ◽  
pp. 134-135
Author(s):  
H. Tsuno ◽  
T. Honda ◽  
Y. Kokubo
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Spherical Aberration ◽  
New Technology ◽  
Objective Lens ◽  
Ultrahigh Resolution ◽  
X Ray ◽  
Analytical Tem ◽  
Analytical Electron ◽  
Analytical Electron Microscope

The condenser-objective (C/O) lens proposed by Riecke, which has a very short gap length and small spherical aberration, was utilized for a commercial 200 kV ultrahigh resolution analytical TEM by Yanaka and Kaneyama. Fig. 1 shows the relation between theoretical resolution and objective lens (OL) spherical aberration coefficient (Cs) at accelerating voltages 200-1250 kV. It was reported that the Cs of a 400kV high resolution TEM is 1.0 mm and its resolution is 0.167 nm. The Cs of 400kV analytical TEM is 1.8 mm and the pre-field spherical aberration coefficient (Csp) is 1.8 mm. Fig. 2 (A), (B) show beam broading in specimens against the thickness when a 200kV and a 400kV electron beam transmit the specimen (C-Au), respectively. The broading of 400kV electron beam is about half of 200kV one. Then it is expected that spacial resolution of x-ray analysis improve. The above-captioned 400kV ultrahigh resolution analytical TEM is designed by applying a new technology which is adopted for a 200kV ultrahigh resolution analytical electron microscope, JEM-2010.Its fundamental construction is the same as the 400kV analytical electron microscope JEM-4000FX, except the 0L. The goniometer is a modified JEM-2010 goniometer, because it is too small for 400kV EM. Although it was expected that the focus ampere turn increases because of its short gap length, the objective lens coil used by JEM-4000EX/FX is adopted, because it has enough capacity. The shapes of the upper yoke and objective polepiece were calculated by the finite element method (55×110 Meshes) under the following condition: (1) maximum tilting-angle 10° (2) x-ray take-off angle 17.5° and solid angle 0.068 strad (3) minimized Cs.

Design of objective lens for 200-kV high-resolution electron microscopes

1983 ◽  
Vol 41 ◽  
pp. 314-315
Author(s):  
K. Tsuno ◽  
T. Honda ◽  
Y. Harada ◽  
M. Naruse
Keyword(s):  
Optical Properties ◽  
Computer Technology ◽  
Axial Magnetic Field ◽  
Chromatic Aberration ◽  
Objective Lens ◽  
Resolution Electron ◽  
Correction Of Astigmatism ◽  
Three Stages ◽  
Electron Microscopes ◽  
Stage 1

Developement of computer technology provides much improvements on electron microscopy, such as simulation of images, reconstruction of images and automatic controll of microscopes (auto-focussing and auto-correction of astigmatism) and design of electron microscope lenses by using a finite element method (FEM). In this investigation, procedures for simulating the optical properties of objective lenses of HREM and the characteristics of the new lens for HREM at 200 kV are described.The process for designing the objective lens is divided into three stages. Stage 1 is the process for estimating the optical properties of the lens. Firstly, calculation by FEM is made for simulating the axial magnetic field distributions Bzc of the lens. Secondly, electron ray trajectory is numerically calculated by using Bzc. And lastly, using Bzc and ray trajectory, spherical and chromatic aberration coefficients Cs and Cc are numerically calculated. Above calculations are repeated by changing the shape of lens until! to find an optimum aberration coefficients.

A Liquid Nitrogen Cooled Stage for STEM

1974 ◽  
Vol 32 ◽  
pp. 444-445
Author(s):  
Louis T. Germinario
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
Liquid Nitrogen ◽  
Room Temperature ◽  
Objective Lens ◽  
Thermal Drift ◽  
Specimen Holder ◽  
Resolution Capability ◽  
Focal Position

A liquid nitrogen stage has been developed for the JEOL JEM-100B electron microscope equipped with a scanning attachment. The design is a modification of the standard JEM-100B SEM specimen holder with specimen cooling to any temperatures In the range ~ 55°K to room temperature. Since the specimen plane is maintained at the ‘high resolution’ focal position of the objective lens and ‘bumping’ and thermal drift la minimized by supercooling the liquid nitrogen, the high resolution capability of the microscope is maintained (Fig.4).

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