scholarly journals Growth Study and Characterization of Single-Layer Graphene Structures Deposited on Copper Substrate by Chemical Vapour Deposition

10.5772/67439 ◽  
2017 ◽  
Author(s):  
Stefanos Chaitoglou ◽  
Enric Bertran ◽  
Jose Luis Andujar
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Copper Substrate ◽  
Chemical Vapour ◽  
Single Layer ◽  
Single Layer Graphene ◽  
Growth Study ◽  
Layer Graphene ◽  
Graphene Structures

scholarly journals Facile Synthesis and Characterization of Multi-Layer Graphene Growth on Co-Ni Oxide/Al2O3 Substrate Using Chemical Vapour Deposition

2018 ◽  
Vol 13 (2) ◽  
pp. 341
Author(s):  
May Ali ◽  
Suraya Abdul Rashid ◽  
Mohd Nizar Hamidon ◽  
Faizah Md Yasin
Keyword(s):  
Chemical Vapour Deposition ◽  
Reaction Rate ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Synthesis And Characterization ◽  
Al2o3 Substrate ◽  
Facile Synthesis ◽  
Layer Graphene ◽  
Ni Oxide

The synthesis and characterization of multilayer graphene (MLG) growth on bimetallic Co-Ni oxide/Al2O3 substrate using chemical vapour deposition (CVD) were investigated. The synthesis of MLG was performed at a temperature range of 700-900 oC. Characterization was carried out using TGA, XRD, FESEM, HRTEM, EDX, XPS, FTIR, and Raman spectroscopy. The MLG growth on the bimetallic substrate was confirmed by XRD, FESEM, and HRTEM analysis. TGA and Raman spectroscopy analyses indicate the formation of thermally stable and high-quality MLG. The kinetic growth of MLG was investigated by varying the reaction temperature and monitoring the partial pressure of the ethanol (C2H5OH) as well as that of hydrogen. The data obtained were fitted to the Langmuir-Hinshelwood kinetic model for the estimation of the reaction rate constants at different temperatures. The results showed that the reaction rate constant increased with temperature and the apparent activation energy of 13.72 kJ.mol-1 was obtained indicating a relatively fast rate of MLG growth. The parity plot obtained for the comparison of the predicted and observed rate of C2H5OH consumptions showed an excellent agreement. This study is important for understanding the growth kinetics of MLG in order to develop appropriate measures that can control the production of MLG thin films for use in the electronic industries. Copyright © 2018 BCREC Group. All rights reservedReceived: 12nd August 2017; Revised: 15th February 2018; Accepted: 18th February 2018; Available online: 11st June 2018; Published regularly: 1st August 2018How to Cite: Ali, M., Rashid, S.A., Hamidon, M.Z., Yasin, F.M. (2018). Facile Synthesis and Characterization of Multi-Layer Graphene Growth on Co-Ni Oxide/Al2O3 Substrate Using Chemical Vapour Deposition. Bulletin of Chemical Reaction Engineering & Catalysis, 13 (2): 341-354 (doi:10.9767/bcrec.13.2.1453.341-354) 

scholarly journals Low temperature growth of fully covered single-layer graphene using a CoCu catalyst

Nanoscale ◽  
2017 ◽  
Vol 9 (38) ◽  
pp. 14467-14475 ◽  
Author(s):  
Hisashi Sugime ◽  
Lorenzo D'Arsié ◽  
Santiago Esconjauregui ◽  
Guofang Zhong ◽  
Xingyi Wu ◽  
...  
Keyword(s):  
Thin Film ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Layer ◽  
Single Layer Graphene ◽  
Alloy Thin Film ◽  
High Quality ◽  
Temperature Growth ◽  
Layer Graphene ◽  
Thin Film Catalyst

A bimetallic CoCu alloy thin-film catalyst is developed that enables the growth of uniform, high-quality graphene at 750 °C in 3 min by chemical vapour deposition.

Synthesis and material characterization of amorphous and crystalline (α-) Al2O3via aerosol assisted chemical vapour deposition

RSC Advances ◽  
2016 ◽  
Vol 6 (105) ◽  
pp. 102956-102960 ◽  
Author(s):  
Sapna D. Ponja ◽  
Ivan P. Parkin ◽  
Claire J. Carmalt
Keyword(s):  
Chemical Vapour Deposition ◽  
Material Characterization ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Facile Synthesis ◽  
Quartz Substrates

The facile synthesis of Al2O3 in the amorphous and corundum phase on glass and quartz substrates, respectively, is reported.

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