scholarly journals Rational design of a binary metal alloy for chemical vapour deposition growth of uniform single-layer graphene

2011 ◽  
Vol 2 (1) ◽  
Author(s):  
Boya Dai ◽  
Lei Fu ◽  
Zhiyu Zou ◽  
Min Wang ◽  
Haitao Xu ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Rational Design ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Layer ◽  
Metal Alloy ◽  
Single Layer Graphene ◽  
Layer Graphene ◽  
Binary Metal

scholarly journals Low temperature growth of fully covered single-layer graphene using a CoCu catalyst

Nanoscale ◽  
2017 ◽  
Vol 9 (38) ◽  
pp. 14467-14475 ◽  
Author(s):  
Hisashi Sugime ◽  
Lorenzo D'Arsié ◽  
Santiago Esconjauregui ◽  
Guofang Zhong ◽  
Xingyi Wu ◽  
...  
Keyword(s):  
Thin Film ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Layer ◽  
Single Layer Graphene ◽  
Alloy Thin Film ◽  
High Quality ◽  
Temperature Growth ◽  
Layer Graphene ◽  
Thin Film Catalyst

A bimetallic CoCu alloy thin-film catalyst is developed that enables the growth of uniform, high-quality graphene at 750 °C in 3 min by chemical vapour deposition.

scholarly journals Chemical Vapour Deposition of Graphene for Durable Anticorrosive Coating on Copper

Nanomaterials ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 2511
Author(s):  
Dali Ji ◽  
Xinyue Wen ◽  
Tobias Foller ◽  
Yi You ◽  
Fei Wang ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Electrochemical Impedance ◽  
Pure Copper ◽  
Chemical Vapour ◽  
Source Surface ◽  
Layer Graphene ◽  
Chemical Inertness ◽  
Grown Graphene ◽  
One Year

Due to the excellent chemical inertness, graphene can be used as an anti-corrosive coating to protect metal surfaces. Here, we report the growth of graphene by using a chemical vapour deposition (CVD) process with ethanol as a carbon source. Surface and structural characterisations of CVD grown films suggest the formation of double-layer graphene. Electrochemical impedance spectroscopy has been used to study the anticorrosion behaviour of the CVD grown graphene layer. The observed corrosion rate of 8.08 × 10−14 m/s for graphene-coated copper is 24 times lower than the value for pure copper which shows the potential of graphene as the anticorrosive layer. Furthermore, we observed no significant changes in anticorrosive behaviour of the graphene coated copper samples stored in ambient environment for more than one year.

Synthesis of Few-Layer Graphene on Copper Using a Low-Cost Atmospheric Thermal Chemical Vapour Deposition System with Methane and Forming Gas

Nano Hybrids ◽  
2016 ◽  
Vol 10 ◽  
pp. 1-13
Author(s):  
M.S. Shamsudin ◽  
S.J. Fishlock ◽  
M. Rusop ◽  
S.M. Sanip ◽  
Suan Hui Pu
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Low Cost ◽  
Graphene Film ◽  
Chemical Vapour ◽  
Force Microscopy ◽  
Layer Graphene ◽  
Atomic Force ◽  
Temperature Deposition ◽  
Few Layer Graphene

Graphene has attracted wide interest across a range of applications due to its electrical, mechanical and optical properties. The use of a low-cost, table-top chemical vapour deposition system to deposit few-layer graphene onto copper is reported in this work. Characterisation of the graphene is performed using Raman spectroscopy and atomic force microscopy. The results show that few-layer graphene can be deposited at 1000 °C using CH4 as a carbon precursor, and 5% H2, 95% N2 forming gas as a diluent. The effects of deposition temperature, deposition time, and forming gas addition on graphene film quality was studied experimentally. An increase in graphene quality was observed when forming gas was added during deposition.

scholarly journals Optimized single-layer MoS2 field-effect transistors by non-covalent functionalisation

Nanoscale ◽  
2018 ◽  
Vol 10 (37) ◽  
pp. 17557-17566 ◽  
Author(s):  
HyunJeong Kim ◽  
WungYeon Kim ◽  
Maria O'Brien ◽  
Niall McEvoy ◽  
Chanyoung Yim ◽  
...  
Keyword(s):  
Molybdenum Disulfide ◽  
Chemical Vapour Deposition ◽  
Field Effect ◽  
Vapour Deposition ◽  
Field Effect Transistors ◽  
Chemical Vapour ◽  
High Mobility ◽  
Single Layer

High mobility, fully encapsulated field-effect transistors with non-covalently functionalised molybdenum disulfide (MoS2) channels grown by chemical vapour deposition are reported.

Initial stages of few-layer graphene growth by microwave plasma-enhanced chemical vapour deposition

2010 ◽  
Vol 21 (9) ◽  
pp. 095602 ◽  
Author(s):  
Roumen Vitchev ◽  
Alexander Malesevic ◽  
Roumen H Petrov ◽  
Raymond Kemps ◽  
Myrjam Mertens ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Graphene Growth ◽  
Layer Graphene ◽  
Few Layer Graphene

Chemically induced transformation of chemical vapour deposition grown bilayer graphene into fluorinated single-layer diamond

2019 ◽  
Vol 15 (1) ◽  
pp. 59-66 ◽  
Author(s):  
Pavel V. Bakharev ◽  
Ming Huang ◽  
Manav Saxena ◽  
Suk Woo Lee ◽  
Se Hun Joo ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Layer ◽  
Bilayer Graphene ◽  
Chemically Induced

scholarly journals Apparent differences between single layer molybdenum disulphide fabricated via chemical vapour deposition and exfoliation

2020 ◽  
Vol 31 (50) ◽  
pp. 505604 ◽  
Author(s):  
Erik Pollmann ◽  
Lukas Madauß ◽  
Simon Schumacher ◽  
Uttam Kumar ◽  
Flemming Heuvel ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Single Layer ◽  
Molybdenum Disulphide

scholarly journals Facile Synthesis and Characterization of Multi-Layer Graphene Growth on Co-Ni Oxide/Al2O3 Substrate Using Chemical Vapour Deposition

2018 ◽  
Vol 13 (2) ◽  
pp. 341
Author(s):  
May Ali ◽  
Suraya Abdul Rashid ◽  
Mohd Nizar Hamidon ◽  
Faizah Md Yasin
Keyword(s):  
Chemical Vapour Deposition ◽  
Reaction Rate ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Synthesis And Characterization ◽  
Al2o3 Substrate ◽  
Facile Synthesis ◽  
Layer Graphene ◽  
Ni Oxide

The synthesis and characterization of multilayer graphene (MLG) growth on bimetallic Co-Ni oxide/Al2O3 substrate using chemical vapour deposition (CVD) were investigated. The synthesis of MLG was performed at a temperature range of 700-900 oC. Characterization was carried out using TGA, XRD, FESEM, HRTEM, EDX, XPS, FTIR, and Raman spectroscopy. The MLG growth on the bimetallic substrate was confirmed by XRD, FESEM, and HRTEM analysis. TGA and Raman spectroscopy analyses indicate the formation of thermally stable and high-quality MLG. The kinetic growth of MLG was investigated by varying the reaction temperature and monitoring the partial pressure of the ethanol (C2H5OH) as well as that of hydrogen. The data obtained were fitted to the Langmuir-Hinshelwood kinetic model for the estimation of the reaction rate constants at different temperatures. The results showed that the reaction rate constant increased with temperature and the apparent activation energy of 13.72 kJ.mol-1 was obtained indicating a relatively fast rate of MLG growth. The parity plot obtained for the comparison of the predicted and observed rate of C2H5OH consumptions showed an excellent agreement. This study is important for understanding the growth kinetics of MLG in order to develop appropriate measures that can control the production of MLG thin films for use in the electronic industries. Copyright © 2018 BCREC Group. All rights reservedReceived: 12nd August 2017; Revised: 15th February 2018; Accepted: 18th February 2018; Available online: 11st June 2018; Published regularly: 1st August 2018How to Cite: Ali, M., Rashid, S.A., Hamidon, M.Z., Yasin, F.M. (2018). Facile Synthesis and Characterization of Multi-Layer Graphene Growth on Co-Ni Oxide/Al2O3 Substrate Using Chemical Vapour Deposition. Bulletin of Chemical Reaction Engineering & Catalysis, 13 (2): 341-354 (doi:10.9767/bcrec.13.2.1453.341-354) 

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