scholarly journals Approach to EUV Lithography Simulation

10.5772/23533 ◽  
2011 ◽  
Author(s):  
Atsushi Sekiguchi
Keyword(s):  
Lithography Simulation ◽  
Euv Lithography

EUV lithography simulation for the 32nm node

2006 ◽  
Author(s):  
Eun Jin Kim ◽  
Wook Chang ◽  
Jin Back Park ◽  
Sung Jin Kim ◽  
Jong Sun Kim ◽  
...  
Keyword(s):  
Lithography Simulation ◽  
Euv Lithography

Physical resist models and their calibration: their readiness for accurate EUV lithography simulation

2010 ◽  
Author(s):  
U. K. Klostermann ◽  
T. Mülders ◽  
T. Schmöller ◽  
G. F. Lorusso ◽  
E. Hendrickx
Keyword(s):  
Lithography Simulation ◽  
Euv Lithography

The Rayleigh method applied to EUV lithography simulation

2003 ◽  
Author(s):  
Maxime Besacier ◽  
Patrick Schiavone ◽  
Gerard Granet ◽  
Vincent Farys
Keyword(s):  
Lithography Simulation ◽  
Euv Lithography ◽  
Rayleigh Method

Status of the liquid-xenon-jet laser-plasma source for EUV lithography

2002 ◽  
Author(s):  
Bjoern A. M. Hansson ◽  
Lars Rymell ◽  
Magnus Berglund ◽  
Oscar E. Hemberg ◽  
Emmanuelle Janin ◽  
...  
Keyword(s):  
Laser Plasma ◽  
Plasma Source ◽  
Liquid Xenon ◽  
Euv Lithography

Toward the In Situ Remediation of Carbon Deposition on Ru-Capped Multilayer Mirrors Intended for EUV Lithography:  Exploiting the Electron-Induced Chemistry

2007 ◽  
Vol 111 (33) ◽  
pp. 12165-12168 ◽  
Author(s):  
David J. Davis ◽  
Georgios Kyriakou ◽  
Robert B. Grant ◽  
Mintcho S. Tikhov ◽  
Richard M. Lambert
Keyword(s):  
Carbon Deposition ◽  
In Situ Remediation ◽  
Multilayer Mirrors ◽  
Euv Lithography
Sign in / Sign up

Export Citation Format

Share Document