scholarly journals Self-Standing Graphene Sheets Prepared with Chemical Vapor Deposition and Chemical Etching

Author(s):  
Genki Odahara ◽  
Tsuyoshi Ishikawa ◽  
Kazuya Fukase ◽  
Shigeki Otani ◽  
Chuhei Oshima ◽  
...  
RSC Advances ◽  
2017 ◽  
Vol 7 (71) ◽  
pp. 45101-45106 ◽  
Author(s):  
Gangqiang Dong ◽  
Yurong Zhou ◽  
Hailong Zhang ◽  
Fengzhen Liu ◽  
Guangyi Li ◽  
...  

High aspect ratio silicon nanowires (SiNWs) prepared by metal-assisted chemical etching were passivated by using catalytic chemical vapor deposition (Cat-CVD).


Nanomaterials ◽  
2017 ◽  
Vol 7 (10) ◽  
pp. 318 ◽  
Author(s):  
Angjian Wu ◽  
Xiaodong Li ◽  
Jian Yang ◽  
Changming Du ◽  
Wangjun Shen ◽  
...  

2019 ◽  
Vol 25 (10) ◽  
pp. 59-61
Author(s):  
Hye Jin Park ◽  
Viera Skakalova ◽  
Jannik Meyer ◽  
S. Roth ◽  
Klaus Von Klitzing

ACS Omega ◽  
2019 ◽  
Vol 4 (5) ◽  
pp. 8758-8766 ◽  
Author(s):  
Harsh A. Chaliyawala ◽  
Narasimman Rajaram ◽  
Roma Patel ◽  
Abhijit Ray ◽  
Indrajit Mukhopadhyay

2013 ◽  
Vol 117 (39) ◽  
pp. 9454-9461 ◽  
Author(s):  
Chun-Da Liao ◽  
Yi-Ying Lu ◽  
Srinivasa Reddy Tamalampudi ◽  
Hung-Chieh Cheng ◽  
Yit-Tsong Chen

2013 ◽  
Vol 750 ◽  
pp. 252-255
Author(s):  
Yoshifumi Ikoma ◽  
Yuta Nishino ◽  
Shouhei Anan ◽  
Toshiaki Abe ◽  
Hirofumi Sakita

We investigated the formation of nanopores on top Si layers of silicon on insulator substrates by CH3SiH3pulse jet chemical vapor deposition. Nanopores were obtained by chemical etching of the buried oxide layer below the pits which were introduced during the SiC growth. The high nanopore density was obtained when the SiC growth temperature was set at 925 °C. The nanopore density gradually decreased with increasing the temperature at higher SiC growth temperature. The pore size increased with increasing the SiC growth temperature. These results suggest that pore density and size strongly depend on the SiC growth temperature.


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