Fiber based interference lithography for large-area nanopatterning

2015 ◽  
Author(s):  
Tuo Qu
Keyword(s):  
Interference Lithography ◽  
Large Area

Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography

2004 ◽  
Vol 15 (5) ◽  
pp. 639-642 ◽  
Author(s):  
L Prodan ◽  
T G Euser ◽  
H A G M van Wolferen ◽  
C Bostan ◽  
R M de Ridder ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Infrared Light ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Two Dimensional ◽  
Laser Interference ◽  
Large Area ◽  
Silicon Photonic

scholarly journals The Fabrication of Nanostructures on Polydimethylsiloxane by Laser Interference Lithography

Nanomaterials ◽  
2019 ◽  
Vol 9 (1) ◽  
pp. 73 ◽  
Author(s):  
Jun Wu ◽  
Zhaoxin Geng ◽  
Yiyang Xie ◽  
Zhiyuan Fan ◽  
Yue Su ◽  
...  
Keyword(s):  
Indium Tin Oxide ◽  
Splitting Method ◽  
Vertical Direction ◽  
Interference Lithography ◽  
Wearable Electronics ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
Periodic Nanostructures ◽  
Ito Glass

We report a method for fabricating periodic nanostructures on the surface of polydimethylsiloxane (PDMS) using laser interference lithography. The wave-front splitting method was used for the system, as the period and duty cycle can be easily controlled. Indium tin oxide (ITO) glass reveals favorable characteristics for controlling the standing waves distributed in the vertical direction, and was selected as the rigid substrate for the curing of the PDMS prepolymer, photoresist spin coating, and exposure processes. Periodic nanostructures such as gratings, dot, and hole arrays were prepared. This efficient way of fabricating large area periodic nanoscale patterns will be useful for surface plasmonic resonance and wearable electronics.

Large area metal micro-/nano-groove arrays with both structural color and anisotropic wetting fabricated by one-step focused laser interference lithography

Nanoscale ◽  
2019 ◽  
Vol 11 (11) ◽  
pp. 4803-4810 ◽  
Author(s):  
Hao Wu ◽  
Yunlong Jiao ◽  
Chenchu Zhang ◽  
Chao Chen ◽  
Liang Yang ◽  
...  
Keyword(s):  
Metal Surfaces ◽  
Structural Color ◽  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
One Step

Colorful and anisotropic multi-functional metal surfaces fabricated by focused laser interference lithography.

Interference lithography patterned large area plasmonic nanodisks for infrared detection

2014 ◽  
Vol 128 ◽  
pp. 373-375 ◽  
Author(s):  
Guangyuan Si ◽  
Qiaoyun Wang ◽  
Jiangtao Lv ◽  
Ligang Miao ◽  
Fengwen Wang ◽  
...  
Keyword(s):  
Infrared Detection ◽  
Interference Lithography ◽  
Large Area

Large-area metallic photonic crystal fabrication with interference lithography and dry etching

2005 ◽  
Vol 81 (2-3) ◽  
pp. 271-275 ◽  
Author(s):  
H. C. Guo ◽  
D. Nau ◽  
A. Radke ◽  
X. P. Zhang ◽  
J. Stodolka ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Dry Etching ◽  
Interference Lithography ◽  
Large Area ◽  
Metallic Photonic Crystal

Fabrication of large-area periodic nanostructures using two-mirror laser interference lithography

2013 ◽  
Vol 9 (6) ◽  
pp. 879-882 ◽  
Author(s):  
Jongseok Kim ◽  
Il Gyu Jeong ◽  
Sang Ho Lee ◽  
Kyung Tae Kang ◽  
Sung Ho Lee
Keyword(s):  
Interference Lithography ◽  
Laser Interference Lithography ◽  
Laser Interference ◽  
Large Area ◽  
Periodic Nanostructures

scholarly journals Large Area Nanohole Arrays for Sensing Fabricated by Interference Lithography

Sensors ◽  
2019 ◽  
Vol 19 (9) ◽  
pp. 2182 ◽  
Author(s):  
Chiara Valsecchi ◽  
Luis Enrique Gomez Armas ◽  
Jacson Weber de Menezes
Keyword(s):  
Soft Lithography ◽  
Focused Ion Beam ◽  
Near Infrared ◽  
Ion Beam ◽  
Production Method ◽  
Interference Lithography ◽  
Visible Range ◽  
Large Area ◽  
Nanohole Array ◽  
Nanohole Arrays

Several fabrication techniques are recently used to produce a nanopattern for sensing, as focused ion beam milling (FIB), e-beam lithography (EBL), nanoimprinting, and soft lithography. Here, interference lithography is explored for the fabrication of large area nanohole arrays in metal films as an efficient, flexible, and scalable production method. The transmission spectra in air of the 1 cm2 substrate were evaluated to study the substrate behavior when hole-size, periodicity, and film thickness are varied, in order to elucidate the best sample for the most effective sensing performance. The efficiency of the nanohole array was tested for bulk sensing and compared with other platforms found in the literature. The sensitivity of ~1000 nm/RIU, achieved with an array periodicity in the visible range, exceeds near infrared (NIR) performances previously reported, and demonstrates that interference lithography is one of the best alternative to other expensive and time-consuming nanofabrication methods.

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