Examination of Rubber Adhesion Property of Brass Film on Steel Formed by Magnetron Sputtering

2005 ◽  
Vol 78 (1) ◽  
pp. 105-113 ◽  
Author(s):  
Michael T. Yamauchi ◽  
Toshi Shimizu ◽  
Mitch Doi ◽  
David T. Yasunaga ◽  
Takenori Nakayama ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Adhesion Force ◽  
Adhesion Property ◽  
Cross Sectional ◽  
Steel Cord ◽  
Ar Plasma ◽  
Excellent Adhesion

Abstract Brass films were formed on steel rods by magnetron sputtering by using 63 wt% Cu - 37 wt% Zn target in Ar plasma. The brass plated steel rods were inserted in crude rubber and then cured to form various samples. Rubber-brass inter-reacted layers were investigated by cross sectional TEM observation. Evaluation of adhesion force was also conducted in order to compare with the TEM investigation. The magnetron sputtering brass film has strongly oriented columner crystal structure and thickness of the film is uniform in whole area. The magnetron sputtering film has excellent adhesion regardless of the film thickness that cannot be attained by that of commercially manufactured steel cord.

Growth of 130 μm Thick Epitaxial KNbO3 Film by Hydrothermal Method

2013 ◽  
Vol 1494 ◽  
pp. 291-296 ◽  
Author(s):  
T. Shiraishi ◽  
H. Einishi ◽  
M. Ishikawa ◽  
T. Hasegawa ◽  
M. Kurosawa ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Film Thickness ◽  
Hydrothermal Method ◽  
Thick Film ◽  
Xrd Analysis ◽  
Structure Change ◽  
Thickness Direction ◽  
Cross Sectional ◽  
Sem Observation ◽  
Raman Spectral

ABSTRACTKNbO3 thick films were deposited on (100)c SrRuO3//(100)SrTiO3 substrates at 240 °C for 3 h by hydrothermal method. Film thickness increased linearly with increasing the deposition number of times and 130 μm thickness was achieved by the 6 time deposition. XRD analysis showed the growth of epitaxial orthorhombic films with the mixture orientation of (100), (010) and (001). Cross-sectional SEM observation showed that the 130 μm-thick film was dense and no obvious voids inside the film. In addition, the crystal structure change along film thickness direction was not detected from the cross-sectional Raman spectral observation.

A Study on the Deposition of Hydroxyapatite Nano Thin Films Fabricated by Radio-Frequency Magnetron Sputtering for Biomedical Applications

2020 ◽  
Vol 20 (7) ◽  
pp. 4114-4119 ◽  
Author(s):  
Woon-Jo Jeong
Keyword(s):  
Magnetron Sputtering ◽  
Biomedical Applications ◽  
Adhesion Force ◽  
Rf Magnetron Sputtering ◽  
Orthopedic Implants ◽  
Radio Frequency Magnetron Sputtering ◽  
Coating Technology ◽  
Pvd Coating ◽  
Nano Coating ◽  
Excellent Adhesion

We have developed a HA nano-coating technology suitable for dental and orthopedic implants using RF magnetron sputtering method which can achieve excellent adhesion to titanium compared with other various PVD coating technologies. As a result, the HA thin film prepared by RF magnetron sputtering has a thickness of about 1.6 [μm] and its adhesion force to base metal is about 11.93 [N] or more and Ca/P ratio is about 1.64, which is suitable for dental and orthopedic implants.

scholarly journals Controlling Film Thickness Distribution by Magnetron Sputtering with Rotation and Revolution

Coatings ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 599
Author(s):  
Handan Huang ◽  
Li Jiang ◽  
Yiyun Yao ◽  
Zhong Zhang ◽  
Zhanshan Wang ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Multilayer Film ◽  
Thickness Distribution ◽  
Parabolic Cylinder ◽  
Particle Model ◽  
Planetary Motion ◽  
X Rays ◽  
X Ray ◽  
Sputtering System

The laterally graded multilayer collimator is a vital part of a high-precision diffractometer. It is applied as condensing reflectors to convert divergent X-rays from laboratory X-ray sources into a parallel beam. The thickness of the multilayer film varies with the angle of incidence to guarantee every position on the mirror satisfies the Bragg reflection. In principle, the accuracy of the parameters of the sputtering conditions is essential for achieving a reliable result. In this paper, we proposed a precise method for the fabrication of the laterally graded multilayer based on a planetary motion magnetron sputtering system for film thickness control. This method uses the fast and slow particle model to obtain the particle transport process, and then combines it with the planetary motion magnetron sputtering system to establish the film thickness distribution model. Moreover, the parameters of the sputtering conditions in the model are derived from experimental inversion to improve accuracy. The revolution and rotation of the substrate holder during the final deposition process are achieved by the speed curve calculated according to the model. Measurement results from the X-ray reflection test (XRR) show that the thickness error of the laterally graded multilayer film, coated on a parabolic cylinder Si substrate, is less than 1%, demonstrating the effectiveness of the optimized method for obtaining accurate film thickness distribution.

Properties of MOS Structure Fabricated on 3C-SiC Grown by Reactive Magnetron Sputtering.

1994 ◽  
Vol 339 ◽  
Author(s):  
R. Turan ◽  
Q. Wahab ◽  
L. Hultman ◽  
M. Willander ◽  
J. -E. Sundgren
Keyword(s):  
Magnetron Sputtering ◽  
Interface State ◽  
State Density ◽  
Reactive Magnetron Sputtering ◽  
Oxide Semiconductor ◽  
Reactive Magnetron ◽  
Cross Sectional ◽  
Mos Structure ◽  
Transmission Electron ◽  
Wide Bandgap Materials

ABSTRACTWe report the fabrication and the characterization of Metal Oxide Semiconductor (MOS) structure fabricated on thermally oxidized 3C-SiC grown by reactive magnetron sputtering. The structure and the composition of the SiO2 layer was studied by cross-sectional transmission electron microscopy (XTEM) Auger electron spectroscopy (AES). Homogeneous stoichiometric SiO2 layers formed with a well-defined interface to the faceted SiC(lll) top surface. Electrical properties of the MOS capacitor have been analyzed by employing the capacitance and conductance techniques. C-V curves shows the accumulation, depletion and deep depletion phases. The capacitance in the inversion regime is not saturated, as usually observed for wide-bandgap materials. The unintentional doping concentration determined from the 1/C2 curve was found to be as low as 2.8 × 1015 cm-3. The density of positive charges in the grown oxide and the interface states have been extracted by using high-frequency C-V and conductance techniques. The interface state density has been found to be in the order of 1011cm2-eV-1.

High Performance Metal Surface Coating Using Ta2O5 Thin Film Prepared by D.C. Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 240-243
Author(s):  
Narathon Khemasiri ◽  
Chanunthorn Chananonnawathorn ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Pongpan Chindaudom ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Film Thickness ◽  
Metal Surface ◽  
High Performance ◽  
Grazing Incidence ◽  
Surface Finishing ◽  
Afm Micrographs ◽  
Protective Performance

Tantalum oxide (Ta2O5) thin films were deposited as the protective layers for the metal surface finishing by the DC reactive magnetron sputtering system. The effect of the Ta2O5 film thickness, ranging from 25 nm to 200 nm, on the physical properties and the anti-corrosive performance were investigated. The grazing-incidence X-ray diffraction (GIXRD) and the atomic force microscopy (AFM) were used to examine the crystal structures and the surface topologies of the prepared films, respectively. The XRD results showed that the Ta2O5 thin films were all amorphous. The AFM micrographs demonstrated the film morphology with quite smooth surface features. The surface roughness tended to be rough when the film thickness was increased. To examine the protective performance of the films, the poteniostat and galvanometer was utilized to examine the electrochemical activities with the 1M NaCl as the corrosive electrolyte. The results from the I-V polarization curves (Tafel slope) indicated that, with the Ta2O5 thin film, the current density was significantly reduced by 3 orders of magnitude when compared with the blank sample. Such results were observed because of fully encapsulated surface of the samples were covered with the sputtered Ta2O5 thin films. The study also showed that the Ta2O5 thin film deposited at 50 nm yielded the most extreme protective performance. The Ta2O5 thin films therefore could be optimized for the smallest film thickness for highly potential role in the protective performance of the metal surface finishing products.

scholarly journals Comprehensive Research and Analysis of a Coated Machining Tool with a New TiAlN Composite Microlayer Using Magnetron Sputtering

Materials ◽  
2021 ◽  
Vol 14 (13) ◽  
pp. 3633
Author(s):  
Štefan Michna ◽  
Iryna Hren ◽  
Jan Novotný ◽  
Lenka Michnová ◽  
Václav Švorčík
Keyword(s):  
Magnetron Sputtering ◽  
Surface Defects ◽  
Light And Electron Microscopy ◽  
Cutting Tools ◽  
Microstructural Characterization ◽  
High Wear Resistance ◽  
Drilling Process ◽  
Cross Sectional ◽  
Force Microscopy ◽  
New Type

The application of thin monolayers helps to increase the endurance of a cutting tool during the drilling process. One such trendy coating is TiAlN, which guarantees high wear resistance and helps to “smooth out” surface defects. For this reason, a new type of weak TiAlN microlayer with a new composition has been developed and applied using the HIPIMs magnetron sputtering method. The aim of this study was to analyze surface-applied micro coatings, including chemical composition (EDX) and microstructure in the area of the coatings. Microstructural characterization and visualization of the surface structures of the TiAlN layer were performed using atomic force microscopy. To study the surface layer of the coatings, metallographic cross-sectional samples were prepared and monitored using light and electron microscopy methods. The microhardness of the test layer was also determined. Analyses have shown that a 2-to-4-micron thick monolayer has a microhardness of about 2500 HV, which can help increase the life of cutting tools.

GROWTH CHARACTERISTIC OF GZO FILM FABRICATED BY RF MAGNETRON SPUTTERING

2015 ◽  
Vol 75 (7) ◽  
Author(s):  
Farah Lyana Shain ◽  
Azmizam Manie @ Mani ◽  
Lam Mui Li ◽  
Saafie Salleh ◽  
Afishah Alias ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Glass Substrate ◽  
Deposition Time ◽  
Growth Characteristic ◽  
Rf Magnetron Sputtering ◽  
Optical Transmittance ◽  
Rf Power ◽  
Argon Flow ◽  
Sputtering Power

This paper investigate the dependence of film thickness onto characteristic of Gallium doped Zinc Oxide (GZO). GZO films were deposited on a glass substrate by RF Magnetron Sputtering using GZO ceramic target with 99.99% purity. Thicknesses were altered by varying the deposition time from 10 min to 50 min meanwhile the sputtering power, argon flow and target distance were fixed in order to investigate the influence of film thickness to the growth characteristic, structural, optical properties and surface morphology of the films. Sputtering was performed with RF power of 100 watt and the argon flow was set at 10 sccm. GZO thin films on various thicknesses range from 130 nm to 460 nm were successfully deposited onto glass substrate with the crystallite grain size in range of 20.63 nm to 22.04 nm with the optical transmittance above 85 %. 

Influence of substrate movement on the ITO film thickness distribution during magnetron sputtering

2017 ◽  
Vol 35 (6) ◽  
pp. 061301 ◽  
Author(s):  
Ivan A. Starkov ◽  
Ilya A. Nyapshaev ◽  
Alexander S. Starkov ◽  
Sergey N. Abolmasov ◽  
Alexey S. Abramov ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Thickness Distribution ◽  
Ito Film ◽  
Influence Of Substrate

Effect of Methane Flow Rate on the Microstructural and Mechanical Properties of Silicon Carbide Thin Films Deposited by Reactive DC Magnetron Sputtering

2010 ◽  
Vol 66 ◽  
pp. 35-40 ◽  
Author(s):  
Erdem Baskurt ◽  
Tolga Tavşanoğlu ◽  
Yücel Onüralp
Keyword(s):  
Magnetron Sputtering ◽  
High Speed ◽  
Profile Analysis ◽  
High Speed Steel ◽  
X Ray Diffraction ◽  
Dc Magnetron Sputtering ◽  
Cross Sectional ◽  
Methane Flow Rate ◽  
Surface Morphologies ◽  
Sic Films

SiC films were deposited by reactive DC magnetron sputtering of high purity (99.999%) Si target. 3 types of substrates, AISI M2 grade high speed steel, glass and Si (100) wafer were used in each deposition. The effect of different CH4 flow rates on the microstructural properties and surface morphologies were characterized by cross-sectional FE-SEM (Field-Emission Scanning Electron Microscope) observations. SIMS (Secondary Ion Mass Spectrometer) depth profile analysis showed that the elemental film composition was constant over the whole film depth. XRD (X-Ray Diffraction) results indicated that films were amorphous. Nanomechanical properties of SiC films were also investigated.

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