scholarly journals A Study on High Frequency-Plasma Enhanced Chemical Vapor Deposition Silicon Nitride Films for Crystalline Silicon Solar Cells

2011 ◽  
Vol 12 (4) ◽  
pp. 156-159 ◽  
Author(s):  
Zhen-Hua Li ◽  
Si-Cheol Roh ◽  
Dong-Yeol Ryu ◽  
Jeong-Ho Choi ◽  
Hwa-Il Seo ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Vapor Deposition ◽  
High Frequency ◽  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Silicon Solar Cells ◽  
Crystalline Silicon Solar Cells ◽  
Silicon Nitride Films ◽  
High Frequency Plasma ◽  
Frequency Plasma

The Development of Polyethylene Naphthalate Films by Low-pressure High-frequency Plasma Chemical Vapor Deposition System with Advance Oxidations Process

2015 ◽  
Vol 18 (1) ◽  
Author(s):  
Nuttee Thungsuk ◽  
Toshifumi Yuji ◽  
Narong Mungkung ◽  
Yoshimi Okamura ◽  
Atsushi Fujimaru ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
High Frequency ◽  
Chemical Vapor ◽  
Low Pressure ◽  
Polyethylene Naphthalate ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
High Frequency Plasma ◽  
Frequency Plasma

AbstractThe low-pressure high-frequency plasma chemical vapor deposition (CVD) system was developed with non-thermal plasma process to study the Polyethylene naphthalate (PEN) surface characteristics. Plasma surface treatment by oxygen can improve the adhesive properties. A mixture of Ar and O

Sign in / Sign up

Export Citation Format

Share Document