scholarly journals AZO Films Prepared by Facing Target Sputtering System

2006 ◽  
Vol 7 (5) ◽  
pp. 271-275 ◽  
Author(s):  
Kyung-Hwan Kim
Keyword(s):  
Facing Target Sputtering ◽  
Sputtering System

Nb/AlOx–Al/Nb Josephson junction fabricated using facing target sputtering system

2005 ◽  
Vol 426-431 ◽  
pp. 1519-1524 ◽  
Author(s):  
S. Morohashi ◽  
M. Ikuta ◽  
N. Yamashita ◽  
T. Miyoshi ◽  
Y. Takada
Keyword(s):  
Josephson Junction ◽  
Facing Target Sputtering ◽  
Sputtering System

Preparation of Transparent Metal Films, Gallium-Doped Zinc-Oxide (Ga2O3)x (ZnO)100-x Films by Using Facing Target Sputtering System

2014 ◽  
Vol 601 (1) ◽  
pp. 245-252
Author(s):  
Dongyoung Kim ◽  
Sung-Bo Seo ◽  
Sun-Young Sohn ◽  
Yoon-Soo Han ◽  
Hwa-Min Kim
Keyword(s):  
Zinc Oxide ◽  
Metal Films ◽  
Facing Target Sputtering ◽  
Sputtering System

ITO films prepared by facing target sputtering system

1996 ◽  
Vol 281-282 ◽  
pp. 194-197 ◽  
Author(s):  
Kikuo Tominaga ◽  
Tetsuya Ueda ◽  
Takahiro Ao ◽  
Masahiro Kataoka ◽  
Ichiro Mori
Keyword(s):  
Facing Target Sputtering ◽  
Sputtering System ◽  
Ito Films

Electrical and Optical Properties of AZO Thin Films Fabricated by Using a Facing-target Sputtering System with Hetero-targets

2014 ◽  
Vol 64 (3) ◽  
pp. 246-251
Author(s):  
Litao YAO* ◽  
  Sungbo SEO ◽  
Kang BAE ◽  
Dongyoung KIM ◽  
Myunggyu CHOI ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Electrical And Optical Properties ◽  
Facing Target Sputtering ◽  
Sputtering System

scholarly journals Nb Thin Films Fabricated by Magnetic Field Distribution Variable-type Facing Target Sputtering System

2011 ◽  
Vol 54 (3) ◽  
pp. 181-183
Author(s):  
Shinichi MOROHASHI ◽  
Yuichi MASUMOTO ◽  
Kozo TANAKA ◽  
Keita USUI ◽  
Eiji KOMATSU
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Field Distribution ◽  
Magnetic Field Distribution ◽  
Variable Type ◽  
Facing Target Sputtering ◽  
Sputtering System
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