scholarly journals Mathematical Modeling and Experimental Validation of Mixed Metal Oxide Thin Film Deposition by Spray Pyrolysis

2015 ◽  
Vol 06 (01) ◽  
pp. 68-77 ◽  
Author(s):  
S. M. Navid Khatami ◽  
Olusegun J. Ilegbusi ◽  
Leonid I. Trakhtenberg
Keyword(s):  
Mathematical Modeling ◽  
Thin Film ◽  
Metal Oxide ◽  
Spray Pyrolysis ◽  
Experimental Validation ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
Mixed Metal Oxide ◽  
Metal Oxide Thin Film

Technology of metal oxide thin film deposition with interruptions

2007 ◽  
Vol 202 (3) ◽  
pp. 453-459 ◽  
Author(s):  
V. Khatko ◽  
J. Calderer ◽  
S. Vallejos ◽  
E. Llobet ◽  
X. Correig
Keyword(s):  
Thin Film ◽  
Metal Oxide ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
Metal Oxide Thin Film

scholarly journals Editorial for the Special Issue on ‘Metal Oxide Thin Film: Synthesis, Characterization, and Application’

Materials ◽  
2021 ◽  
Vol 14 (8) ◽  
pp. 1834
Author(s):  
Erwan Rauwel ◽  
Protima Rauwel
Keyword(s):  
Thin Film ◽  
Metal Oxide ◽  
New Technologies ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
Special Issue ◽  
Metal Oxide Thin Film ◽  
Film Synthesis

The last two decades have witnessed the development of new technologies for thin-film deposition and coating [...]

scholarly journals Transparent ZnO Thin-Film Deposition by Spray Pyrolysis for High-Performance Metal-Oxide Field-Effect Transistors

Materials ◽  
2019 ◽  
Vol 12 (20) ◽  
pp. 3423 ◽  
Author(s):  
Junhee Cho ◽  
Seongkwon Hwang ◽  
Doo-Hyun Ko ◽  
Seungjun Chung
Keyword(s):  
Thin Film ◽  
Metal Oxide ◽  
Spray Pyrolysis ◽  
Field Effect ◽  
Field Effect Transistors ◽  
Spray Pyrolysis Technique ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Zno Films ◽  
Process Conditions

Solution-based metal oxide semiconductors (MOSs) have emerged, with their potential for low-cost and low-temperature processability preserving their intrinsic properties of high optical transparency and high carrier mobility. In particular, MOS field-effect transistors (FETs) using the spray pyrolysis technique have drawn huge attention with the electrical performances compatible with those of vacuum-based FETs. However, further intensive investigations are still desirable, associated with the processing optimization and operational instabilities when compared to other methodologies for depositing thin-film semiconductors. Here, we demonstrate high-performing transparent ZnO FETs using the spray pyrolysis technique, exhibiting a field-effect mobility of ~14.7 cm2 V−1 s−1, an on/off ratio of ~109, and an SS of ~0.49 V/decade. We examine the optical and electrical characteristics of the prepared ZnO films formed by spray pyrolysis via various analysis techniques. The influence of spray process conditions was also studied for realizing high quality ZnO films. Furthermore, we measure and analyze time dependence of the threshold voltage (Vth) shifts and their recovery behaviors under prolonged positive and negative gate bias, which were expected to be attributed to defect creation and charge trapping at or near the interface between channel and insulator, respectively.

scholarly journals Cobalt and manganese carboxylates for metal oxide thin film deposition by applying the atmospheric pressure combustion chemical vapour deposition process

RSC Advances ◽  
2018 ◽  
Vol 8 (28) ◽  
pp. 15632-15640 ◽  
Author(s):  
B. S. M. Kretzschmar ◽  
K. Assim ◽  
A. Preuß ◽  
A. Heft ◽  
M. Korb ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Atmospheric Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Thin Film Deposition ◽  
Deposition Process ◽  
Film Deposition ◽  
Oxide Thin Film ◽  
Metal Oxide Thin Film

Complexes [M(O2CCH2OC2H4OMe)2] (M = Co, Mn) were synthesized characterised regarding their thermal behaviour. They were used as precursors for deposition of rough Co3O4and smooth Mn2O3/Mn3O4thin filmsviathe CCVD process.

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