Surface chemical analysis. Total reflection X-ray fluorescence analysis of water

10.3403/30319521u ◽

2018 ◽

Keyword(s):

Chemical Analysis ◽

Fluorescence Analysis ◽

Total Reflection ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis

10.3403/30276380u ◽

2015 ◽

Keyword(s):

Chemical Analysis ◽

Fluorescence Spectroscopy ◽

Environmental Analysis ◽

Total Reflection ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis

10.3403/30276380 ◽

2015 ◽

Keyword(s):

Chemical Analysis ◽

Fluorescence Spectroscopy ◽

Environmental Analysis ◽

Total Reflection ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

10.3403/02222256u ◽

2015 ◽

Keyword(s):

Chemical Analysis ◽

Silicon Wafers ◽

Total Reflection ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis ◽

Analysis Determination

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Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

10.3403/30281605 ◽

2014 ◽

Keyword(s):

Chemical Analysis ◽

Silicon Wafers ◽

Total Reflection ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis ◽

Analysis Determination

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Summary of ISO/TC 201 Standard: VI ISO 14706:2000?Surface chemical analysis?Determination of surface elemental contamination on silicon wafers by total reflection x-ray fluorescence (TXRF) spectroscopy

Surface and Interface Analysis ◽

10.1002/sia.1194 ◽

2002 ◽

Vol 33 (4) ◽

pp. 369-370 ◽

Cited By ~ 5

Author(s):

Yohichi Gohshi

Keyword(s):

Chemical Analysis ◽

Silicon Wafers ◽

Total Reflection ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis ◽

Analysis Determination

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Summary of ISO/TC 201 Standard: XIX ISO 17331:2004—Surface chemical analysis—Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection x-ray fluorescence (TXRF) spectroscopy

Surface and Interface Analysis ◽

10.1002/sia.2043 ◽

2005 ◽

Vol 37 (5) ◽

pp. 522-523 ◽

Cited By ~ 5

Author(s):

Yoshihiro Mori

Keyword(s):

Chemical Analysis ◽

Silicon Wafer ◽

Reference Materials ◽

Total Reflection ◽

Surface Chemical ◽

Chemical Methods ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

10.3403/02222256 ◽

2001 ◽

Keyword(s):

Chemical Analysis ◽

Silicon Wafers ◽

Total Reflection ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis ◽

Analysis Determination

Download Full-text

Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

10.3403/03241654u ◽

2015 ◽

Keyword(s):

Chemical Analysis ◽

Silicon Wafer ◽

Reference Materials ◽

Total Reflection ◽

Surface Chemical ◽

Chemical Methods ◽

X Ray ◽

Surface Chemical Analysis

Download Full-text

Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy

10.3403/03241654 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Silicon Wafer ◽

Reference Materials ◽

Total Reflection ◽

Surface Chemical ◽

Chemical Methods ◽

X Ray ◽

Surface Chemical Analysis

Download Full-text