scholarly journals New Method for Optimization of Polymer Powder Plasma Treatment for Composite Materials

Polymers ◽  
2021 ◽  
Vol 13 (6) ◽  
pp. 965
Author(s):  
Zuzana Weberová ◽  
Hana Šourková ◽  
Jakub Antoň ◽  
Taťána Vacková ◽  
Petr Špatenka
Keyword(s):  
Composite Materials ◽  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Treatment Time ◽  
Dissimilar Materials ◽  
Melting Process ◽  
Thermoplastic Composites ◽  
Glass Substrates ◽  
Treatment Conditions ◽  
Effective Development

This paper describes a newly developed testing method for determination of the adhesivity of a film sintered from thermoplastic powder. This method is based on the modified EN 15337 standard. Application of this method enables an effective development of thermoplastic composites with enhanced adhesion between reinforcement and matrix and/or high-quality joints between plastics and dissimilar materials. The proposed method was successfully tested on a series of polyethylene powders treated in the oxygen atmosphere for 0–1200 s. Adhesion to metal and glass substrates in dependence on treatment conditions is described along with powder wettability and X-ray photoelectron spectroscopy analysis. The results show an increase in adhesion to metal by 580% and to glass by 1670% for the longest treatment time, compared to a nontreated powder. Sintering of treated powders revealed a strong influence of treatment time on the melting process. The XPS analysis confirmed the formation of new oxygen groups (C–O, C=O, O–C=O). The method reveals a specific behavior of powders based on treatment conditions, which is crucial for the optimization of plasma treatment for the improved adhesion, applicability of polymer powders, and a development of composite materials.

Investigation of the Adhesion of Electroless Copper to Glass Substrates

2008 ◽  
Vol 1113 ◽  
Author(s):  
Xiaoyun Cui ◽  
David A. Hutt ◽  
Paul P. Conway
Keyword(s):  
Photoelectron Spectroscopy ◽  
Immersion Time ◽  
Secondary Ion Mass Spectrometry ◽  
Treatment Time ◽  
Catalyst Layer ◽  
Thin Layers ◽  
Glass Substrates ◽  
Substrate Adhesion ◽  
Electroless Copper ◽  
Secondary Ion

ABSTRACTThis paper reports the effect of a Pd/Sn catalyst treatment process on the adhesion of electroless copper deposited onto a glass substrate. Adhesion of the copper varied with catalyst treatment time: short or extended catalyst immersion times led to lower adhesion. In this work silanisation of the glass surface with (3-aminopropyl)-trimethoxysilane was used to provide a layer of functional molecules to assist the adhesion of the Pd/Sn catalyst. Surface analysis of the catalyzed glass was carried out by X-ray Photoelectron Spectroscopy (XPS) and together with Time-of-Flight Secondary Ion Mass Spectrometry, showed that the Pd/Sn structures changed with increasing immersion time in the catalyst bath. The Pd XPS core level peaks indicated that Pd(0) became more significant in the catalyst layer than Pd(II) with increasing immersion time. Tape peel testing was used to assess the adhesion of the coatings: thin layers adhered well to the glass, but for layers thicker than 160 nm tape tests removed large areas. The failure surfaces of copper layers peeled off the glass were also examined by XPS which indicated that the failure occurred between the copper and catalyst.

Assessment of Inhibition of Biofilm Formation on TiO2 Nanotubes According to Non-Thermal Plasma Treatment Conditions and the Elapsed Time in the Atmosphere

2020 ◽  
Vol 20 (9) ◽  
pp. 5742-5745
Author(s):  
Min-Kyung Ji ◽  
Byung-Kwon Moon ◽  
Hee-Seon Kim ◽  
Chan Park ◽  
Gye-Jeong Oh ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Thermal Plasma ◽  
Photoelectron Spectroscopy ◽  
Biofilm Formation ◽  
Plasma Generator ◽  
Elapsed Time ◽  
Treatment Conditions ◽  
Initial Adhesion ◽  
Non Thermal Plasma ◽  
Surface Changes

Periimplantitis is an inflammation similar to periodontitis, and is caused by biofilms formed on the surface of dental implants. Application of plasma on biomaterials has been reported to decrease the initial adhesion of microorganism by causing chemical changes without changing the surface morphology. The purpose of this study is to evaluate the effect of inhibition of biofilm formation on the elapsed time after plasma treatment. Non thermal plasma generator (PGS-200 Plasma generator, Expantech Co., Korea) was applied to the specimens. The elapsed time in the atmosphere was set to 5 immediately after treatment, after 30 minutes of treatment, after 60 minutes of treatment, after 90 minutes of treatment. Surface property change with the elapsed time in the atmosphere after plasma treatment were confirmed by X-ray photoelectron spectroscopy and contact angle. Inhibition of biofilm formation was evaluated by the fluorescent nucleic acid staining. It was confirmed that the chemical composition and bonding state of the surface changes as the elapsed time in the atmosphere increases after plasma treatment. The adhesion of Porphyromonas gingivalis was the lowest immediately after plasma treatment, and increased again with increasing elapsed time in the atmosphere after plasma treatment. As a result of this study, it was confirmed that elapsed time in the atmosphere is a very important factor for inhibition of biofilm formation.

scholarly journals Effects on the Surface and Luminescence Properties of GaAs by SF6 Plasma Passivation

Crystals ◽  
2018 ◽  
Vol 8 (9) ◽  
pp. 339 ◽  
Author(s):  
Yumeng Xu ◽  
Xin Gao ◽  
Xiaolei Zhang ◽  
Zhongliang Qiao ◽  
Jing Zhang ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Treatment Time ◽  
Gaas Surface ◽  
Chamber Pressure ◽  
Rf Plasma ◽  
Force Microscopy ◽  
Plasma Passivation ◽  
Plasma Treatment Time ◽  
The Stability

The passivation effects of the SF6 plasma on a GaAs surface has been investigated by using the radio frequency (RF) plasma method. The RF’s power, chamber pressure, and plasma treatment time are optimized by photoluminescence (PL), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The PL intensity of passivated GaAs samples is about 1.8 times higher than those which are untreated. The oxide traps and As-As dimers can be removed effectively by using SF6 plasma treatment, and Ga-F can form on the surface of GaAs. It has also been found that the stability of the passivated GaAs surface can be enhanced by depositing SiO2 films onto the GaAs surface. These indicate that the passivation of GaAs surfaces can be achieved by using SF6 plasma treatment.

scholarly journals Highly Hydrophobic Organosilane-Functionalized Cellulose: A Promising Filler for Thermoplastic Composites

Materials ◽  
2021 ◽  
Vol 14 (8) ◽  
pp. 2005
Author(s):  
Pavel Cerny ◽  
Petr Bartos ◽  
Pavel Kriz ◽  
Pavel Olsan ◽  
Petr Spatenka
Keyword(s):  
Functional Groups ◽  
Photoelectron Spectroscopy ◽  
Microwave Plasma ◽  
Treatment Time ◽  
Cellulose Fibers ◽  
Thermoplastic Composites ◽  
Process Gas ◽  
Highly Hydrophobic ◽  
Oxygen Process ◽  
Polypropylene Powder

The aim of this work is to design and optimize the process of functionalization of cellulose fibers by organosilane functional groups using low-pressure microwave plasma discharge with hexamethyldisiloxane (HMDSO) precursor in order to prepare a compatible hydrophobic filler for composites with nonpolar thermoplastic matrices. Particular attention was paid to the study of agglomeration of cellulose fibers in the mixture with polypropylene. In our contribution, the dependence of the surface wettability on used process gas and treatment time was investigated. Scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS) analyses were applied to characterize the surface morphology and chemical composition of the cellulose fibers. It was observed that the plasma treatment in oxygen process gas led to the functionalization of cellulose fibers by organosilane functional groups without degradation. In addition, the treated cellulose was highly hydrophobic with water contact angle up to 143°. The use of treated cellulose allowed to obtain a homogeneous mixture with polypropylene powder due to the significantly lower tendency of the functionalized cellulose fibers to agglomerate.

Wet Removal of Post-Etch Residues by a Combination of UV Irradiation and a SC1 Process

2012 ◽  
Vol 195 ◽  
pp. 114-118 ◽  
Author(s):  
Els Kesters ◽  
Q.T. Le ◽  
I. Simms ◽  
K. Nafus ◽  
H. Struyf ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Analytical Techniques ◽  
Critical Dimension ◽  
Treatment Conditions ◽  
High Adhesion ◽  
Patterned Structures ◽  
Before And After ◽  
Lift Off

In back-end of line processing (BEOL), the polymer deposited on the dielectric sidewalls during the etch process must be removed prior to subsequent processing steps to achieve high adhesion and good coverage of materials deposited in the etched features [1, . Typically, this is done by a combination of a short plasma treatment and a diluted wet clean, or by wet cleans alone. On the one hand, for porous dielectric stacks, a mild plasma treatment that preserves the integrity of the low-k dielectrics would not be sufficient to effectively remove this residue. With regard to wet clean, diluted aqueous solutions (e.g. HF-based) are not efficient for polymer removal without etching the underlying dielectric to lift off the polymer, leading to unacceptable critical dimension (CD) loss. In addition, analytical techniques available for direct characterization of sidewall residues are limited. For a fast screening of potential chemistries capable of dissolving/removing polymer residues generated during the low-k etch, a model fluoropolymer was deposited on a blanket, checkerboard low-k substrate. The present study mainly focused on the characterization of model polymer after deposition (as-deposited) and after immersion in aqueous and solvent-based cleaning solutions. The polymer removal efficiency was influenced/ improved by UV treatments prior to wet clean processes. In the second part of the study, selected UV treatment conditions and cleaning solutions were applied to low-k patterned structures using Angle-resolved X-ray photoelectron spectroscopy (AR-XPS) to characterize the dielectric sidewall before and after UV modification and the subsequent cleaning process.

Plasma treatment of polyaniline films: Effect on the intrinsic oxidation states

1996 ◽  
Vol 11 (6) ◽  
pp. 1570-1573 ◽  
Author(s):  
E. T. Kang ◽  
K. Kato ◽  
Y. Uyama ◽  
Y. Ikada
Keyword(s):  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Treatment Time ◽  
Argon Plasma ◽  
Carbon Oxidation ◽  
X Ray ◽  
Extended Plasma ◽  
Atmospheric Exposure ◽  
Plasma Treatment Time ◽  
Polyaniline Films

Surface modification of emeraldine (EM) and nigraniline (NA) base films by argon plasma treatment was investigated by x-ray photoelectron spectroscopy (XPS). Argon plasma treatment, followed by atmospheric exposure, results in the oxidation of some carbon atoms, first to C–O species and then to C = O and COOH species for samples with extended plasma treatment time. Most important of all, Ar plasma treatment and the accompanied carbon oxidation readily cause a decrease in the intrinsic oxidation state ([=N— ]/[—NH—] ratio) of the aniline polymers.

scholarly journals Functionalization of Cellulose Nanocrystals Powder by Non-Thermal Atmospheric-Pressure Plasmas

2021 ◽  
Author(s):  
Zineb Matouk ◽  
Rocío Rincón ◽  
Badr Torriss ◽  
Amir Mirzaei ◽  
Joëlle Margot ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Atmospheric Pressure ◽  
Water Repellency ◽  
Melting Process ◽  
Xrd Analysis ◽  
Raw Material ◽  
Sem Images ◽  
Experimental Conditions ◽  
X Ray

Abstract Despite promising characteristics such as the biodegradability and the environmentally-benign nature of cellulose nanocrystal (CNC) based composites, their poor dispersion and agglomeration in thermoplastic matrix during the melting process is a “bottleneck” in the development of these composites. In this work, a cylindrical atmospheric pressure dielectric barrier discharge (AP-DBD) was employed to functionalize CNCs to reduce their surface hydrophilicity and improve their dispersion in polar organic solvents. Three different gas mixtures were used for plasma treatment, argon/methane, argon/silane and an argon/methane followed by argon/silane. In all cases, the plasma treatment was conducted below 90°C as determined from optical emission spectroscopy (OES) analysis. The x-ray diffraction (XRD) analysis of both raw and plasma treated CNC powders confirms that the CNC crystallographic properties remain unchanged after plasma treatment. Fourier transform infrared (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) analysis reveal the presence of hydrophobic C-Hx moieties on the CNC granular surface after argon/methane plasma treatment whereas SiHx, Si-O-Si, SiC bonds were formed after argon/silane plasma treatment. Under these experimental conditions, water wettability tests reveal some significant water repellency of the naturally hydrophilic cellulosic raw material. Moreover, the formation the SiHx moieties in silane-treated CNCs clearly enhances the hydrophobicity of the CNC powder in contrast to the sole C-Hx moieties synthetized by argon/methane plasma. High-resolution SEM images indicate the presence of agglomerated granules with 5-10 µm diameters in size. The surface functionalities of CNC powder enhance its dispersibility in polar solvents. Overall, this study emphasizes that AP-DBDs are suitable to process thermo-sensitive CNCs.

The Study of SiC Surface Cleaning by Hydrogen Plasma

2013 ◽  
Vol 473 ◽  
pp. 61-64
Author(s):  
Su Hua Chen
Keyword(s):  
Plasma Treatment ◽  
Photoelectron Spectroscopy ◽  
Treatment Time ◽  
Hydrogen Plasma ◽  
Surface Cleaning ◽  
Plasma System ◽  
Xps Spectra ◽  
X Ray ◽  
Surface Oxides ◽  
Before And After

The SiC surfaces were cleaned by the hydrogen plasma with ECRPEMOCVD plasma system at low temperature of 200°C, after the traditional wet cleaning. The surfaces were investigated by RHEED and X-ray Photoelectron Spectroscopy before and after hydrogen plasma treatment. The RHEED imagines showed that the SiC surfaces by hydrogen plasma treatment were more flatter than the SiC surfaces by the traditional wet cleaning, and we found the result that more treatment time, more flatter. The XPS spectra examinations indicated that the surface oxides reduced obviously and the C/C-H compounds on the SiC surface were removed by hydrogen plasma treatment, so the antioxidant ability of the SiC surface was improved.

Conductivity Improvement of Silver Nanowire Transparent Electrodes by Surface Plasma Treatment

2017 ◽  
Vol 890 ◽  
pp. 89-92 ◽  
Author(s):  
Nathaniel de Guzman ◽  
Joybelle Lopez ◽  
Magdaleno Vasquez Jr. ◽  
Mary Donnabelle Balela
Keyword(s):  
Plasma Treatment ◽  
Sheet Resistance ◽  
Treatment Time ◽  
Silver Nanowires ◽  
Optical Transmittance ◽  
Silver Nanowire ◽  
Transparent Electrodes ◽  
Glass Substrates ◽  
Plasma Treatment Time ◽  
Transparent Conducting Electrodes

High aspect ratio silver nanowires (Ag NWs) were successfully synthesized by CuCl2-mediated synthesis. Scanning electron microscopy (SEM) and X-Ray diffraction were employed to investigate the morphology and structure of the Ag products, respectively. Suspensions of Ag NW in ethanol were coated on glass substrates by Meyer rod coating to fabricate transparent conducting electrodes (TCE’s). The electrodes were then plasma treated at a power of 75 W. The effects of increasing plasma treatment time and oxygen exposure on the sheet resistance of the transparent electrodes were investigated. A sheet resistance of 8 Ω/sq with an optical transmittance of 80 % at 550nm was obtained for an electrode with a nanowire density of 0.18 mg/cm2 after 5 mins of plasma (Ar) exposure.

SURFACE CHEMICAL MODIFICATION OF CIIR RUBBER BY HIGH DENSITY PLASMA TREATMENT

2010 ◽  
Vol 24 (15n16) ◽  
pp. 2682-2687 ◽  
Author(s):  
JONG-HYOUNG KIM ◽  
NORITSUGU UMEHARA ◽  
HIROYUKI KOUSAKA ◽  
MAMORU SHIMADA ◽  
MITSURU HASEGAWA
Keyword(s):  
Surface Energy ◽  
Plasma Treatment ◽  
Treatment Time ◽  
Argon Plasma ◽  
Angle Measurements ◽  
Plasma Treatments ◽  
Treatment Conditions ◽  
Contact Angle Measurements ◽  
Effect Of Oxygen ◽  
Oxygen Functionality

This paper has reported the effect of oxygen and argon plasma treatments of CIIR rubber using Attenuated Total Reflectance (ATR) and surface energy measurements. Plasma treatment led to changes in the surface energy from 31 to 45.7 mN/m. Plasma treatment conditions influenced both the changes in surface energy and stability, and they also became more difficult to obtain good contact angle measurements. However, plasma treatments made the interfacial properties to be stabilized. ATR measurements revealed that changes in surface energy with treatment time are due mostly to increased oxygen functionality.

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