scholarly journals Negative Hydrogen and Deuterium Ion Density in a Low Pressure Plasma in Front of a Converter Surface at Different Work Functions

Plasma ◽  
2021 ◽  
Vol 4 (1) ◽  
pp. 94-107
Author(s):  
Sofia Cristofaro ◽  
Roland Friedl ◽  
Ursel Fantz
Keyword(s):  
Work Function ◽  
Inductively Coupled Plasma ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Balance Model ◽  
Ion Density ◽  
Inductively Coupled ◽  
Work Functions ◽  
Surface Conversion

Negative ion sources of neutral beam injection (NBI) systems for future fusion devices like ITER (“The Way” in Latin) rely on the surface conversion of hydrogen (or deuterium) atoms and positive ions to negative ions in an inductively coupled plasma (ICP). The efficiency of this process depends on the work function of the converter surface. By introducing caesium into the ion source the work function decreases, enhancing the negative ion yield. In order to study the isotope effect on the negative ion density at different work functions, fundamental investigations are performed in a planar ICP laboratory experiment where the work function and the negative ion density in front of a sample can be simultaneously and absolutely determined. For work functions above 2.7 eV, the main contribution to the negative hydrogen ion density is solely due to volume formation, which can be modeled via the rate balance model YACORA H−, while below 2.7 eV the surface conversion become significant and the negative ion density increases. For a work function of 2.1 eV (bulk Cs), the H− density increases by at least a factor of 2.8 with respect to a non-caesiated surface. With a deuterium plasma, the D− density measured at 2.1 eV is a factor of 2.5 higher with respect to a non-caesiated surface, reaching densities of surface produced negative ions comparable to the hydrogen case.

Negative-Ion Implantation

1994 ◽  
Vol 354 ◽  
Author(s):  
Junzo Ishikawa
Keyword(s):  
Ion Implantation ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Currents ◽  
Promising Technique ◽  
Surface Charging ◽  
Silicon Carbon ◽  
A Charge

AbstractNegative-ion implantation is a promising technique for forthcoming ULSI (more than 256 M bits) fabrication and TFT (for color LCD) fabrication, since the surface charging voltage of insulated electrodes or insulators implanted by negative ions is found to saturate within so few as several volts, no breakdown of insulators would be expected without a charge neutralizer in these fabrication processes. Scatter-less negative-ion implantation into powders is also possible. For this purpose an rf-plasma-sputter type heavy negative-ion source was developed, which can deliver several milliamperes of various kinds of negative ion currents such as boron, phosphor, silicon, carbon, copper, oxygen, etc. A medium current negative-ion implanter with a small version of this type of ion source has been developed.

Plasma and electrical characteristics depending on an antenna position in an inductively coupled plasma with a passive resonant antenna

2021 ◽  
Author(s):  
Ju Ho Kim ◽  
Chin-Wook Chung
Keyword(s):  
Inductively Coupled Plasma ◽  
Metal Plate ◽  
Electrical Characteristics ◽  
Coupling Loss ◽  
Rf Power ◽  
Ion Density ◽  
Electron Kinetics ◽  
Inductively Coupled ◽  
Cylindrical Reactor ◽  
Antenna Position

Abstract We investigated the plasma and electrical characteristics depending on the antenna position in an inductively coupled plasma with a passive resonant antenna. When the powered antenna and passive resonant antenna are installed near the top plate and in the middle of the cylindrical reactor (Setup A), respectively, the ion density at the resonance is about 2.4 times to 9 times higher than that at non-resonance. This is explained by the reduction in power loss in the powered antenna (including the matching circuits) and the increase in power absorbed by the plasma discharge. However, when the powered antenna and passive resonant antenna are interchanged (Setup B), the ion density at the resonance is not significantly different from that at the non-resonance. When RF power is changed from 50 W to 200 W, the ion density at the resonance of Setup B is 1.6 times to 5.4 times higher than at the non-resonance of Setup A. To analyse this difference, the profile of the z-axis ion density is measured and the electric and magnetic field simulations are investigated. The results are discussed along with the electron kinetics effect and the coupling loss between the antenna and the metal plate.

6. Measuring isotopes

2016 ◽  
Author(s):  
Rob Ellam
Keyword(s):  
Inductively Coupled Plasma ◽  
Isotope Ratio ◽  
Ion Source ◽  
Routine Laboratory ◽  
Mass Filter ◽  
Mass Spectrometers ◽  
Inductively Coupled ◽  
Gas Source ◽  
Essential Components ◽  
Secondary Ion

Mass spectrometers have become routine laboratory instruments in many disciplines. ‘Measuring isotopes: mass spectrometers’ concentrates on those used to quantify the abundance of different isotopes—gas source isotope ratio, thermal ionization, inductively coupled plasma, and secondary ion mass spectrometers. A mass spectrometer can be used to quantify the concentration of a particular element by monitoring an isotope of that element not overlapped by isotopes of other elements. All mass spectrometers have three essential components: an ion source, a mass filter, and a detector. There are two main types of detector: Faraday detectors measure large signals and a variant of photomultiplier tubes measures small isotope signals.

The Boltzmann relation in electronegative plasmas: When is it permissible to use it?

2000 ◽  
Vol 64 (2) ◽  
pp. 131-153 ◽  
Author(s):  
R. N. FRANKLIN ◽  
J. SNELL
Keyword(s):  
Fluid Model ◽  
Negative Ions ◽  
Ionization Rate ◽  
Negative Ion ◽  
Simple Relationship ◽  
Ion Temperature ◽  
Ion Density ◽  
Positive Ions ◽  
Electronegative Plasmas ◽  
Low Pressures

This paper reports the results of computations to obtain the spatial distributions of the charged particles in a bounded active plasma dominated by negative ions. Using the fluid model with a constant collision frequency for electrons, positive ions and negative ions the cases of both detachment-dominated gases (such as oxygen) and recombination-dominated gases (such as chlorine) are examined. It is concluded that it is valid to use a Boltzmann relation ne = ne0exp(eV/kT) for the electrons of density ne, where the temperature T is approximately the electron temperature Te, and that the density nn of the negative ions at low pressures obeys nn = nn0exp(eV/kTn), where Tn is the negative-ion temperature. However, at high pressure in detachment-dominated gases where the ratio of negative-ion density to electron density is constant and greater than unity, and when the attachment rate is larger than the ionization rate, the negative ions are distributed with the same effective temperature as the electrons. In all other cases there is no simple relationship. Thus to put nn/ne = const, nn = ne0exp(eV/kTe) and nn = nn0exp(eV/kTn) simultaneously is mathematically inconsistent and physically unsound. Accordingly, expressions deduced for ambipolar diffusion coefficients based on these assumptions have no validity. The correct expressions for the situation where nn/ne = const are obtained without invoking a Boltzmann relation for the negative ions.

Negative Ionen durch Elektronenstoß aus organischen Nitroverbindungen, Äthylnitrit und Äthylnitrat

1967 ◽  
Vol 22 (5) ◽  
pp. 700-704
Author(s):  
K. Jäger ◽  
A. Henglein
Keyword(s):  
Electron Impact ◽  
Negative Ions ◽  
Molecular Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Electron Affinities ◽  
Low Intensity ◽  
Ion Molecule Reactions ◽  
Fragment Ions ◽  
Product Ions

Negative ion formation by electron impact has been studied in nitromethane, nitroethane, nitrobenzene, tetranitromethane, ethylnitrite and ethylnitrate. Appearance potentials, ionization efficiency curves and kinetic energies of negative ions were measured by using a Fox ion source. The electron affinities of C2H5O and of C (NO2)3 are discussed as well as the energetics of processes which yield NO2-. The electron capture in nitrobenzene and tetranitromethane leads to molecular ions [C6H5NO2~ in high, C (NO2)4 in very low intensity] besides many fragment ions. A number of product ions from negative ion-molecule reactions has also been found.

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