scholarly journals Research of a Novel Ag Temperature Sensor Based on Fabric Substrate Fabricated by Magnetron Sputtering

Materials ◽  
2021 ◽  
Vol 14 (20) ◽  
pp. 6014
Author(s):  
Zong-Yao Yan ◽  
Jian-Yong Liu ◽  
Jia-Rong Niu
Keyword(s):  
Heat Treatment ◽  
Magnetron Sputtering ◽  
Temperature Sensor ◽  
Polyester Fabric ◽  
Heat Treatment Condition ◽  
Good Reliability ◽  
Sputtering Power ◽  
Ag Particles ◽  
Bending Resistance ◽  
Wearable Products

TPU-coated polyester fabric was used as the substrate of a flexible temperature sensor and Ag nanoparticles were deposited on its surface as the temperature sensing layer by the magnetron sputtering method. The effects of sputtering powers and heat treatment on properties of the sensing layers, such as the temperature coefficient of resistance (TCR), linearity, hysteresis, drift, reliability, and bending resistance, were mainly studied. The results showed that the TCR (0.00234 °C−1) was the highest when sputtering power was 90 W and sputtering pressure was 0.8 Pa. The crystallinity of Ag particles would improve, as the TCR was improved to 0.00262 °C−1 under heat treatment condition at 160°. The Ag layer obtained excellent linearity, lower hysteresis and drift value, as well as good reliability and bending resistance when the sputtering power was 90 W. The flexible temperature sensor based on the coated polyester fabric improved the softness and comfortableness of sensor, which can be further applied in intelligent wearable products.

scholarly journals Structural and Optical Properties of CuInS2Thin Films Prepared by Magnetron Sputtering and Sulfurization Heat Treatment

2015 ◽  
Vol 2015 ◽  
pp. 1-8 ◽  
Author(s):  
Rongfeng Guan ◽  
Xiaoxue Wang ◽  
Qian Sun
Keyword(s):  
Thin Films ◽  
Heat Treatment ◽  
Magnetron Sputtering ◽  
Treatment Temperature ◽  
Gas Pressure ◽  
X Ray Diffraction ◽  
Raman Spectrometry ◽  
Optimization Of Process Parameters ◽  
Sputtering Power ◽  
Good Crystallinity

CuInS2thin films were prepared by sulfurization of Cu-In precursor films through magnetron sputtering and the resulting films characterized using X-ray diffraction, Raman spectrometry, and UV-Vis spectrophotometry. The results demonstrate that a sputtering power of 80–120 W is more suitable for sputtered Cu-In precursor films and can be used to obtain CuInS2films with good crystallinity through vulcanization heat treatment. The sputtering gas pressure and sulfurization temperature were shown to impact on the film quality due to improper processes during the CuInS2phase. Some of the CuIn11S17and CuS2impurities were observed in the composition of the prepared CuInS2thin films. Optimization of process parameters obtained from the experimental data was determined as a sputtering power of 80~120 W, a sputtering gas pressure of 0.6–0.8 Pa, a heat treatment temperature of 450~470°C, and a holding time of 2~3 hours. The optical band gap obtained for CuInS2thin films is between 1.48 and 1.5 eV.

GROWTH CHARACTERISTIC OF GZO FILM FABRICATED BY RF MAGNETRON SPUTTERING

2015 ◽  
Vol 75 (7) ◽  
Author(s):  
Farah Lyana Shain ◽  
Azmizam Manie @ Mani ◽  
Lam Mui Li ◽  
Saafie Salleh ◽  
Afishah Alias ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Film Thickness ◽  
Glass Substrate ◽  
Deposition Time ◽  
Growth Characteristic ◽  
Rf Magnetron Sputtering ◽  
Optical Transmittance ◽  
Rf Power ◽  
Argon Flow ◽  
Sputtering Power

This paper investigate the dependence of film thickness onto characteristic of Gallium doped Zinc Oxide (GZO). GZO films were deposited on a glass substrate by RF Magnetron Sputtering using GZO ceramic target with 99.99% purity. Thicknesses were altered by varying the deposition time from 10 min to 50 min meanwhile the sputtering power, argon flow and target distance were fixed in order to investigate the influence of film thickness to the growth characteristic, structural, optical properties and surface morphology of the films. Sputtering was performed with RF power of 100 watt and the argon flow was set at 10 sccm. GZO thin films on various thicknesses range from 130 nm to 460 nm were successfully deposited onto glass substrate with the crystallite grain size in range of 20.63 nm to 22.04 nm with the optical transmittance above 85 %. 

Microstructural Effect and Material Homogenization of Thermal-Hydroforming Magnesium Alloy Tubes

2011 ◽  
Vol 465 ◽  
pp. 459-462 ◽  
Author(s):  
Lin Wang ◽  
Luen Chow Chan ◽  
Ting Fai Kong
Keyword(s):  
Heat Treatment ◽  
Magnesium Alloy ◽  
Tensile Tests ◽  
Heat Treatment Condition ◽  
Material Strength ◽  
Forming Process ◽  
Engineering Strain ◽  
Treatment Conditions ◽  
Metal Forming Process ◽  
Microstructural Effect

The microstrctural evolution pre and post heat treatment is critical to achieve a successful product for metal forming process. This paper aims to investigate the microstructual effect of the magnesium alloy tubes undergone various heat treatment conditions to achieve material homogenization. The heat treatment conditions under various periods of time (1, 2, 6, 12 and 30 hours) at 400 °C were employed to investigate the microstructural effect on hydroforming magnesium tubes. The greatly reduced impurity embedded in grain boundaries and more uniform grain sizes do indicate the improvement of material strength and ductility. To validate the conclusion, corresponding tensile tests at the different temperatures (20 °C and 200 °C) were carried out. The increased engineering strain in two directions (hoop and longitudinal) implies that the microstructural evolution is unquestionably useful to enhance the ductility of the magnesium tubes. Subsequently, the tubes after optimal heat treatment condition at 400 °C for 6 hours were used to further carry out the thermal hydroforming process for validation. The defect-free hydroformed tubes were produced under the same working condition, which is unable to be achieved for tubes without the heat-treatment process.

Effects of sputtering power toward the Al-doped ZnO thin Film prepared by pulsed DC magnetron sputtering

2017 ◽  
Vol 4 (5) ◽  
pp. 6466-6471 ◽  
Author(s):  
Kittikhun Seawsakul ◽  
Mati Horprathum ◽  
Pitak Eiamchai ◽  
Viyapol Pattantsetakul ◽  
Saksorn Limwichean ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Zno Thin Film ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Sputtering Power ◽  
Doped Zno ◽  
Pulsed Dc Magnetron Sputtering

Effects of RF magnetron sputtering power density on NTC characteristics of Mn–Co–Ni thin films

2012 ◽  
Vol 24 (4) ◽  
pp. 1203-1207 ◽  
Author(s):  
Guanhuan Lei ◽  
Hongwei Chen ◽  
Shanxue Zheng ◽  
Feizhi Lou ◽  
Linling Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Power Density ◽  
Rf Magnetron Sputtering ◽  
Sputtering Power

Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

2013 ◽  
Vol 802 ◽  
pp. 47-52
Author(s):  
Chuleerat Ibuki ◽  
Rachasak Sakdanuphab
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Magnetron Sputtering ◽  
Crystalline Structure ◽  
Glass Substrate ◽  
Intrinsic Stress ◽  
Dc Magnetron Sputtering ◽  
Adhesion Properties ◽  
Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

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