scholarly journals Influence of Deposition Method on the Structural and Optical Properties of Ge2Sb2Te5

Materials ◽  
2021 ◽  
Vol 14 (13) ◽  
pp. 3663
Author(s):  
Iosif-Daniel Simandan ◽  
Florinel Sava ◽  
Angel-Theodor Buruiana ◽  
Aurelian-Catalin Galca ◽  
Nicu Becherescu ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Rutherford Backscattering Spectrometry ◽  
Mass Density ◽  
Deposition Method ◽  
Deposition Technique ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Chalcogenide Material

Ge2Sb2Te5 (GST-225) is a chalcogenide material with applications in nonvolatile memories. However, chalcogenide material properties are dependent on the deposition technique. GST-225 thin films were prepared using three deposition methods: magnetron sputtering (MS), pulsed laser deposition (PLD) and a deposition technique that combines MS and PLD, namely MSPLD. In the MSPLD technique, the same bulk target is used for sputtering but also for PLD at the same time. The structural and optical properties of the as-deposited and annealed thin films were characterized by Rutherford backscattering spectrometry, X-ray reflectometry, X-ray diffraction, Raman spectroscopy and spectroscopic ellipsometry. MS has the advantage of easily leading to fully amorphous films and to a single crystalline phase after annealing. MS also produces the highest optical contrast between the as-deposited and annealed films. PLD leads to the best stoichiometric transfer, whereas the annealed MSPLD films have the highest mass density. All the as-deposited films obtained with the three methods have a similar optical bandgap of approximately 0.7 eV, which decreases after annealing, mostly in the case of the MS sample. This study reveals that the properties of GST-225 are significantly influenced by the deposition technique, and the proper method should be selected when targeting a specific application. In particular, for electrical and optical phase change memories, MS is the best suited deposition method.

scholarly journals The Effect of the Deposition Method on the Structural and Optical Properties of ZnS Thin Films

Coatings ◽  
2021 ◽  
Vol 11 (9) ◽  
pp. 1064
Author(s):  
Iosif-Daniel Simandan ◽  
Florinel Sava ◽  
Angel-Theodor Buruiana ◽  
Ion Burducea ◽  
Nicu Becherescu ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Band Gap ◽  
Rutherford Backscattering Spectrometry ◽  
Wide Band ◽  
Deposition Method ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
Wide Band Gap ◽  
X Ray

ZnS is a wide band gap material which was proposed as a possible candidate to replace CdS as a buffer layer in solar cells. However, the structural and optical properties are influenced by the deposition method. ZnS thin films were prepared using magnetron sputtering (MS), pulsed laser deposition (PLD), and a combined deposition technique that uses the same bulk target for sputtering and PLD at the same time, named MSPLD. The compositional, structural, and optical properties of the as-deposited and annealed films were inferred from Rutherford backscattering spectrometry, X-ray diffraction, X-ray reflectometry, Raman spectroscopy, and spectroscopic ellipsometry. PLD leads to the best stoichiometric transfer from target to substrate, MS makes fully amorphous films, whereas MSPLD facilitates obtaining the densest films. The study reveals that the band gap is only slightly influenced by the deposition method, or by annealing, which is encouraging for photovoltaic applications. However, sulphur vacancies contribute to lowering the bandgap and therefore should be controlled. Moreover, the results add valuable information towards the understanding of ZnS polymorphism. The combined MSPLD method offers several advantages such as an increased deposition rate and the possibility to tune the optical properties of the obtained thin films.

Structural and optical properties of Tin Oxide and Indium doped SnO2 thin films deposited by thermal evaporation technique

2016 ◽  
Vol 12 (3) ◽  
pp. 4394-4399
Author(s):  
Sura Ali Noaman ◽  
Rashid Owaid Kadhim ◽  
Saleem Azara Hussain
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Tin Oxide ◽  
Thermal Evaporation ◽  
Pure Sno2 ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Evaporation Technique ◽  
Sno2 Thin Films

Tin Oxide and Indium doped Tin Oxide (SnO2:In) thin films were deposited on glass and Silicon  substrates  by  thermal evaporation technique.  X-ray diffraction pattern of  pure SnO2 and SnO2:In thin films annealed at 650oC and the results showed  that the structure have tetragonal phase with preferred orientation in (110) plane. AFM studies showed an inhibition of grain growth with increase in indium concentration. SEM studies of pure  SnO2 and  Indium doped tin oxide (SnO2:In) ) thin films showed that the films with regular distribution of particles and they have spherical shape.  Optical properties such as  Transmission , optical band-gap have been measured and calculated.

Effect of Deposition Time on Structural and Optical Properties of ZnO Thin Films Deposited by Spray Pyrolysis

2019 ◽  
Vol 397 ◽  
pp. 81-87 ◽  
Author(s):  
Farid Khediri ◽  
Abdelkader Hafdallah ◽  
Mouna Bouhelal
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Spray Pyrolysis ◽  
Deposition Time ◽  
Spray Pyrolysis Technique ◽  
Precursor Solution ◽  
Zno Thin Films ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
X Ray

In this work Zinc oxide thin films prepared by spray pyrolysis technique. A set of ZnO thin films were deposited with various deposition times, on glass substrate at 350 °C. The precursor solution is formed with zinc acetate in distilled methanol with 0.1 molarity. The deposition time was ranged from 2 to 8 min. The structural and optical properties of those films were examined by X-ray diffraction (XRD) and ultraviolet-visible spectrometer (UV). X-ray diffraction patterns of the ZnO thin films showed polycrystalline hexagonal wurtzite structure and the preferred orientation was along (002) plane when the grain size varied between 9.66 and 16.67nm. ZnO thin films were highly transparent in the visible with the maximum transmittance of 85% and the optical band gap was found between 3.25 and 3.28 eV.

Structural and Optical Properties of ZnO Film Precursors for Multilayered Transparent Solar Cell Electrodes

2015 ◽  
Vol 1132 ◽  
pp. 217-223
Author(s):  
E.R. Rwenyagila ◽  
B. Agyei-Tuffour ◽  
M.G.Z. Kana ◽  
O. Akin-Ojo ◽  
W.O. Soboyejo
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Rf Magnetron Sputtering ◽  
Zno Thin Films ◽  
X Ray Diffraction ◽  
Zno Film ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Deposition Power ◽  
Different Temperatures

This work examines the modification of the structural and optical properties of ZnO thin films by control of deposition and post-treatment parameters. ZnO thin films were deposited by RF magnetron sputtering from a ceramic target locally made at SHESTCO in Abuja, Nigeria. X-ray diffraction measurements characterized the different films prior to thermal annealing as extremely amorphous with average UV-VIS transmittance spectra between 80 and 90%. Annealing at different temperatures and time spans influenced the formation of Wurtzite (002) oriented ZnO crystallites. Contrary to the crystallinity of the films, which was strongly influenced by the deposition power, the optical transmission of the films was only slightly influenced by the deposition power and it was less sensitive to the crystallinity of ZnO thin films.

scholarly journals Temperature effect on structural and optical properties of V2O5 thin films prepared by spray pyrolysis technique

2020 ◽  
Vol 307 ◽  
pp. 01033
Author(s):  
Asmaa Mrigal ◽  
Lahocine El Gana ◽  
Mouhamed Addou ◽  
Khadija Bahedi ◽  
Rajae Temsamani ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Energy Gap ◽  
Spray Pyrolysis Technique ◽  
Three Dimensional ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
X Ray ◽  
Glass Substrates ◽  
Optical Dielectric Constant

In this work, the effect of substrate temperature on structural and optical properties of V2O5 thin films has been characterized by X-ray diffraction (XRD); SEM and transmission. The films mince has been prepared by Reactive Chemical Spraying technology in Liquid Phase (RCSLP) on glass substrates preheated at (350, 400, 450 and 500 °C). The X-ray diffraction analysis confirms that all layers are polycrystalline, and the preferred orientation of V2O5 is the (001) plane. The morphology of V2O5 thin films are porous nature and their particle’s shape is three-dimensional. The transmittance and absorbance of thin film were measured from which the optical constants (Energy gap, Refractive index, Absorption coefficient, Extinction coefficient and Optical dielectric constant) were determined.

Structural and Optical Properties of Pulse Laser Deposited TiO2 Thin Films

2013 ◽  
Vol 537 ◽  
pp. 224-228
Author(s):  
Yi Liu ◽  
Hong Mo Huang ◽  
Xiao Dong Lin
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Substrate Temperature ◽  
Crystalline Structure ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Quartz Glasses

TiO2 thin films were prepared on quartz glasses by pulsed laser deposition (PLD) using a KrF laser excimer. The crystalline structure was characterized by X-ray diffraction, and the optical properties of the films were investigated using spectroscopic ellipsometry and UV-vis spectra respectively. The effects of the PLD conditions, including substrate temperature and O2 pressure on the crystalline structure and the optical properties of the films were investigated. The results indicated that there are a suitable substrate temperature and an O2 pressure which is favorable for the synthesis of anatase-type TiO2.

Structural and Optical Properties of Nebulized Nickel Oxide Thin Films

2014 ◽  
Vol 938 ◽  
pp. 103-107
Author(s):  
V. Gowthami ◽  
M. Meenakshi ◽  
N. Anandhan ◽  
Chinnappanadar Sanjeeviraja
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Nickel Oxide ◽  
Band Gap ◽  
X Ray Diffraction ◽  
Oxide Thin Films ◽  
Structural And Optical Properties ◽  
Functional Layer ◽  
X Ray ◽  
Nickel Oxide Thin Films

Nickel oxide has been widely used as material for antiferromagnetic, electrochromic display and functional layer for chemical sensors. Nickel oxide thin films of various molarities were deposited using a simple nebulizer technique and the substrate temperature was fixed at 350C. The effect of the molarity of precursor solution on structural and optical properties was studied using X-ray diffraction (XRD) and UV-Vis-NIR spectrometer techniques respectively. The band gap of the material was confirmed by photoluminescence spectrometer. It is found that increase in the molarity of 10ml volume of the sprayed solution leads to the increasing in film thickness. X-ray diffraction studies indicated cubic structure and the crystallites are preferentially oriented along (1 1 1) plane. It is also found that as the concentration of the solution increases the transmittance decreases, consequently the band-gap energy wanes from 4.0 eV to 3.2 eV.

Effects of Fe and Ni Co-Doping on the Optical Properties of TiO2 Thin Films

2019 ◽  
Vol 19 (01) ◽  
pp. 1850046
Author(s):  
Mahboubeh Yeganeh ◽  
Maliheh Mousavi
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Oxygen Vacancies ◽  
Visible Region ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
Tio2 Thin Films ◽  
X Ray ◽  
Co Doping ◽  
Uv Visible

In this work, the effects of Fe/Ni co-doping on structural and optical properties of TiO2 thin films were investigated by the X-ray diffraction, scanning electron microscope and UV-visible spectroscopy. The optical properties of transmittance, extinction coefficient, refractive index, real and imaginary parts of dielectric constant of the thin films, prepared by spray pyrolysis, revealed that the absorption in visible region increases due to the influence of Fe/Ni co-doping. The widening of the gap energies is observed as a result of doping. The increased optical gap as a consequence of doping can be explained by decreasing the size of nanoparticles, as confirmed by SEM and increasing the formation of oxygen vacancies as a result of Ni[Formula: see text] substitution to Ti[Formula: see text] and appearance of the Burstein–Moss effect.

scholarly journals Multiple-Deposition of Cadmium Oxide Nnanocrystalline Thin Films Prepared by Chemical Bath Deposition Technique

2018 ◽  
Vol 26 (10) ◽  
pp. 320-328
Author(s):  
Khalid Hamdi Rzeaj ◽  
Hani Hadi Ahmed ◽  
Jumaa Ayob Homady
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Chemical Bath Deposition ◽  
Cadmium Oxide ◽  
Morphological Properties ◽  
Deposition Technique ◽  
X Ray Diffraction ◽  
X Ray ◽  
Chemical Bath Deposition Technique ◽  
Optical Reflection

In this work CdO nanocrystalline thin films have been prepared by chemical bath deposition technique(CBD) , on commercial glass substrates at room temperature. cadmium nitrat as a source of cadmium ions(Cd+2) and Ammonium hydroxide as a source of hydroxide ions (OH-2). The effect multiple dip process on the structural and optical properties of CdO films and the use x-ray diffraction(XRD),optical reflection microscope( ORM),and UV-visible spectroscopy respectively(UV) were studied. The results of X-ray diffraction showed  that  conversion of cadmium hydroxide film to cadmium oxide film, the  results  show  of  film  and  increases grain size by increases  the multiple dip process. The optical reflection microscope showed that the films prepared has surface Morphological properties of the thin films and is improved with increased the multiple dip process. The results of optical properties showed that transmittance of film was 74% and decreased with increasing the multiple dip process, and found that the energy gap ranged from 2.24-2.63 eV. and found improved properties films with the multiple dip, This makes them suitable in solar cell applications and the detectors.

Effects of Vapor CdCl2 Treatment on the Properties of CdS Thin Films Prepared by R.F. Magnetron Sputtering

2011 ◽  
Vol 347-353 ◽  
pp. 3477-3480
Author(s):  
Liang Min Cai ◽  
Jian Huang ◽  
Jia Wei Jiang ◽  
Jun Le ◽  
Wei Min Shi ◽  
...  
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Structural And Optical Properties ◽  
Solar Cell Application ◽  
X Ray ◽  
Cds Thin Films ◽  
Cds Films

CdS films were prepared by R.F. magnetron sputtering method. The effects of vapor CdCl2treatment on the properties of CdS films were studied. The vapor CdCl2thermal treatment at different temperature was employed in a CSS device, using CdCl2powder as evaporant. The structural and optical properties of CdS films were investigated by x-ray diffraction (XRD), PL spectra, and transmittance spectra, respectively. The results revealed that the CdS films had a structure of hexagonal wurtzite with a preferential orientation of the (002) plane. A better crystal quality and larger grain size, which are good for the solar cell application, were observed in the CdS samples annealed with CdCl2Subscript text.

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