scholarly journals Characterization of Platinum-Based Thin Films Deposited by Thermionic Vacuum Arc (TVA) Method

Materials ◽  
2020 ◽  
Vol 13 (7) ◽  
pp. 1796
Author(s):  
Sebastian Cozma ◽  
Rodica Vlǎdoiu ◽  
Aurelia Mandes ◽  
Virginia Dinca ◽  
Gabriel Prodan ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Materials Science ◽  
Vacuum Arc ◽  
Silicon Substrates ◽  
Force Microscopy ◽  
Energy Evaluation ◽  
Transmission Electron ◽  
Potential Applications ◽  
Thermionic Vacuum Arc

The current work aimed to characterize the morphology, chemical, and mechanical properties of Pt and PtTi thin films deposited via thermionic vacuum arc (TVA) method on glass and silicon substrates. The deposited thin films were characterized by means of a scanning electron microscope technique (SEM). The quantitative elemental microanalysis was done using energy-dispersive X-ray spectroscopy (EDS). The tribological properties were studied by a ball-on-disc tribometer, and the mechanical properties were measured using nanoindentation tests. The roughness, as well as the micro and nanoscale features, were characterized using atomic force microscopy (AFM) and transmission electron microscopy (TEM). The wettability of the deposited Pt and PtTi thin films was investigated by the surface free energy evaluation (SFE) method. The purpose of our study was to prove the potential applications of Pt-based thin films in fields, such as nanoelectronics, fuel cells, medicine, and materials science.

scholarly journals Structural and Mechanical Properties of Nanostructured C-Ag Thin Films Synthesized by Thermionic Vacuum Arc Method

2018 ◽  
Vol 2018 ◽  
pp. 1-10 ◽  
Author(s):  
Rodica Vladoiu ◽  
Aurelia Mandes ◽  
Virginia Dinca-Balan ◽  
Vilma Bursikova
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Mechanical Properties ◽  
Elastic Modulus ◽  
Silicon Substrate ◽  
Vacuum Arc ◽  
Average Roughness ◽  
Thermionic Vacuum Arc ◽  
Induced Aggregation ◽  
Ag Film

Nanostructured C-Ag thin films of 200 nm thickness were successfully synthesized by the Thermionic Vacuum Arc (TVA) method. The influence of different substrates (glass, silicon wafers, and stainless steel) on the microstructure, morphology, and mechanical properties of nanostructured C-Ag thin films was characterized by High-Resolution Transmission Electron Microscopy (HRTEM), Scanning Electron Microscopy (SEM), Atomic Force Microscopy (AFM), and TI 950 (Hysitron) nanoindenter equipped with Berkovich indenter, respectively. The film’s hardness deposited on glass (HC-Ag/Gl = 1.8 GPa) was slightly lower than in the case of the C-Ag film deposited on a silicon substrate (HC-Ag/Si = 2.2 GPa). Also the apparent elastic modulus Eeff was lower for C-Ag/Gl sample (Eeff = 100 GPa) than for C-Ag/Si (Eeff = 170 GPa), while the values for average roughness are Ra=2.9 nm (C-Ag/Si) and Ra=10.6 (C-Ag/Gl). Using the modulus mapping mode, spontaneous and indentation-induced aggregation of the silver nanoparticles was observed for both C-Ag/Gl and C-Ag/Si samples. The nanocomposite C-Ag film exhibited not only higher hardness and effective elastic modulus, but also a higher fracture resistance toughness to the silicon substrate compared to the glass substrate.

Anisotropic Behaviour of Surface Roughening in Lattice Mismatched Heteroepitaxial Thin Films

1996 ◽  
Vol 436 ◽  
Author(s):  
Cengiz S. Ozkan ◽  
William D. Nix ◽  
Huajian Gao
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Transmission Electron Microscopy ◽  
Lattice Mismatch ◽  
Surface Roughening ◽  
Silicon Substrates ◽  
Force Microscopy ◽  
Atomic Force ◽  
Transmission Electron ◽  
Annealing Experiments

AbstractHeteroepitaxial Si1-xGex. thin films deposited on silicon substrates exhibit surface roughening via surface diffusion under the effect of a compressive stress which is caused by a lattice mismatch. In these films, surface roughening can take place in the form of ridges which can be aligned along <100> or <110> directions, depending on the film thickness. In this paper, we investigate this anisotropic dependence of surface roughening and present an analysis of it. We have studied the surface roughening behaviour of 18% Ge and 22% Ge thin films subjected to controlled annealing experiments. Transmission electron microscopy and atomic force microscopy have been used to study the morphology and microstructure of the surface ridges and the dislocations that form during annealing.

ZnSe nanocrystalline thin films deposition on Si substrate by thermionic vacuum arc

2012 ◽  
Vol 226 (2) ◽  
pp. 103-108 ◽  
Author(s):  
M Özkan ◽  
N Ekem ◽  
M Z Balbag ◽  
S Pat
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Vacuum Arc ◽  
Refractive Indices ◽  
X Ray ◽  
Force Microscopy ◽  
Nanocrystalline Thin Film ◽  
Semiconductor Thin Films ◽  
Thermionic Vacuum Arc ◽  
Nanocrystalline Thin Films

ZnSe nanocrystalline thin films were deposited on Si wafer using thermionic vacuum arc (TVA) method. For the first time, binary semiconductor thin films were deposited by TVA. The microstructure and surface morphology of the ZnSe nanocrystalline thin films were investigated using X-ray diffractometry, scanning electron microscopy, energy-dispersive X-ray spectrometry, and atomic force microscopy (AFM). Grain dimensions and grain size were determined by AFM measurement. Moreover, spectroscopic ellipsometer was used to characterize the refractive indices of ZnSe nanocrystalline thin film. According to experimental measurement, ZnSe nanocrystalline thin film was polycrystalline with (1 1 1), (2 2 0), and (3 1 1) preferred orientations. Refractive indices were approximately 2.50 in all visible ranges. Our results show that nanocrystalline thin films can be deposited with TVA method.

scholarly journals Synthesis and Characterization of Complex Nanostructured Thin Films Based on Titanium for Industrial Applications

Materials ◽  
2020 ◽  
Vol 13 (2) ◽  
pp. 399 ◽  
Author(s):  
Rodica Vladoiu ◽  
Aurelia Mandes ◽  
Virginia Dinca ◽  
Maria Balasoiu ◽  
Dmytro Soloviov ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Lattice Parameter ◽  
Industrial Applications ◽  
Vacuum Arc ◽  
Average Roughness ◽  
Force Microscopy ◽  
Transmission Electron ◽  
Cubic System ◽  
Gear Wheels ◽  
Thermionic Vacuum Arc

Titanium-based composites—titanium and silver (TiAg) and titanium and carbon (TiC)—were synthesized by the Thermionic Vacuum Arc (TVA) method on substrates especially for gear wheels and camshaft coating as mechanical components of irrigation pumps. The films were characterized by surface morphology, microstructure, and roughness through X-ray Diffraction (XRD), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and Small-Angle Neutron Scattering (SANS). The silver (Ag) films crystallized into a cubic system with lattice a = 4.0833 Å at room temperature, indexed as cubic Ag group Fm3m. The crystallites were oriented in the [111] direction, and mean grain size was <D>111 = 265 Å. The TiC structure revealed a predominant cubic TiC phase, with a = 0.4098 as a lattice parameter determined by Cohen’s method. Average roughness (Ra) was 8 nm for the as-grown 170 nm thick TiAg film, and 1.8 nm for the as-grown 120 nm thick TiC film. Characteristic SANS contribution was detected from the TiAg layer deposited on a substrate of high-quality stainless steel with 0.45% carbon (OLC45) in the range of 0.015 Å−1 ≤ Q ≤ 0.4 Å−1, revealing the presence of sharp surfaces and an averaged triaxial ellipsoidal core-shell object.

ULTRA THIN CARBON FILMS DEPOSITED ON SrTiO3 SUBSTRATES BY THERMIONIC VACUUM ARC

NANO ◽  
2013 ◽  
Vol 08 (03) ◽  
pp. 1350028 ◽  
Author(s):  
SUAT PAT ◽  
M. ZAFER BALBAĞ ◽  
ŞADAN KORKMAZ
Keyword(s):  
Thin Films ◽  
Adhesion Force ◽  
Microstructural Characterization ◽  
Carbon Films ◽  
Vacuum Arc ◽  
Force Microscopy ◽  
Thin Carbon ◽  
Carbon Thin Films ◽  
Thermionic Vacuum Arc ◽  
Polycrystalline Structures

Carbon thin films were obtained on strontium titanate ( SrTiO3 ) substrates using the thermionic vacuum arc (TVA) method. TVA is a different, cheap and fast technology for thin film production. The films were produced with filament current of 22 amperes from a high purity graphite rod. The crystal structure and surface morphology of the thin films were investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM), respectively. In this way, microstructural characterization, surface topography, nanomechanical properties (nanohardness and adhesion force) and reflective properties of the carbon thin films produced on SrTiO3 (100), (110) and (111) substrates were determined. Deposited carbon thin films on different orientated SrTiO3 substrates are in polycrystalline structures. Hardness of the carbon thin films has been measured in approximately 40 GPa. This hardness value is in the range of excellent hardness region. According to reflection analysis, the film is antireflective.

scholarly journals Morphology, microstructure and magnetic properties of thermionic vacuum arc deposited NiFeCu ferromagnetic thin films

2012 ◽  
Vol 23 (1) ◽  
pp. 21-26
Author(s):  
Viorel Ionescu ◽  
Gabriel Prodan ◽  
Ionut Jepu ◽  
Ion Mustata ◽  
Cristian Petrica Lungu ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Thin Films ◽  
Morphological Properties ◽  
Vacuum Arc ◽  
Spectroscopy Analysis ◽  
Kerr Rotation ◽  
Ferromagnetic Thin Films ◽  
Transmission Electron ◽  
Thermionic Vacuum Arc ◽  
Microstructure And Magnetic Properties

AbstractNiFeCo granular ferromagnetic thin films were deposited on glass and silicon wafer substrates in thermionic vacuum arc plasma with simultaneous ignition of plasma in Cu and NiFe vapors. The structural and morphological properties of the prepared films were investigated by TEM Transmission Electron Microscopy (TEM) and Scanning Electron Microscopy (SEM). Elemental composition of the films was revealed after X-ray energy dispersive spectroscopy analysis (EDAX). The magneto-optical longitudinal Kerr rotation spectra of the samples were also measured and compared.

Investigation of Composition-Properties’ Relations on Silicon and Carbon Based Nanomaterials

2013 ◽  
Vol 816-817 ◽  
pp. 232-236
Author(s):  
Rodica Vladoiu ◽  
Aurelia Mandes ◽  
Mirela Contulov ◽  
Virginia Dinca ◽  
Corneliu Porosnicu
Keyword(s):  
Thin Films ◽  
Electron Microscope ◽  
Energy Dispersive Spectrometer ◽  
High Hardness ◽  
Vacuum Arc ◽  
Transmission Electron ◽  
Low Wear ◽  
Thermionic Vacuum Arc ◽  
Carbon Based Nanomaterials ◽  
Composition Properties

Multicomponent thin films (binary-SiC and ternary-SiCAl) as well as single thin films (silicon Si) were deposited using Thermionic Vacuum Arc (TVA) technology. The thin films were characterized using X-ray diffractometer (XRD, Philips PW1050, Cu K), scanning electron microscope (SEM, Zeiss EVO 50 SEM) accompanied with energy dispersive spectrometer and transmission electron microscope (TEM, Phillips CM 120 ST, 100 kV). The film is composed of nanoparticles very smoothly distributed of 15-30 nanometer size embedded in amorphous matrix film. The results reveal high hardness for SiC (10-40 GPa) and for SiCAl: low wear rate (6.16E-05 mm3/Nm).

Growth and Characterization of the High Purity C-Mg Thin Films Obtained by Thermionic Vacuum Arc (TVA) Technology

2013 ◽  
Vol 816-817 ◽  
pp. 106-110
Author(s):  
Aurelia Mandes ◽  
Rodica Vladoiu ◽  
Virginia Dinca ◽  
Gabriel Prodan
Keyword(s):  
Thin Films ◽  
Evaluation System ◽  
High Energy ◽  
Vacuum Arc ◽  
High Dispersion ◽  
Energy Evaluation ◽  
Thermionic Vacuum Arc ◽  
First Time ◽  
Structure Properties

We investigated the growth and structure properties of C-Mg thin films obtained for the first time by Thermionic Vacuum Arc (TVA) deposition. The TVA technology is suitable for producing nanostructured materials because of the high power density of the vapor plasma generated by accelerated electron flux from the cathode and high energy of the ions incident on the depositing film, both these properties ensuring a high dispersion of the evaporated material. The properties of the deposited C-Mg thin films were investigated in terms of wettability and morphology. The surface free energy (SFE) was determined by means of Surface Energy Evaluation System (See System) indicating a hydrophobic character and the morphology were determined from BF-TEM image performed by Philips CM 120 ST TEM system.

scholarly journals A Slot-Die Technique for the Preparation of Continuous, High-Area, Chitosan-Based Thin Films

Polymers ◽  
2021 ◽  
Vol 13 (10) ◽  
pp. 1566
Author(s):  
Oliver J. Pemble ◽  
Maria Bardosova ◽  
Ian M. Povey ◽  
Martyn E. Pemble
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
High Volume ◽  
Mechanical Anisotropy ◽  
Diverse Range ◽  
Direction Parallel ◽  
High Area ◽  
Wide Range ◽  
Slot Die ◽  
Potential Applications

Chitosan-based films have a diverse range of potential applications but are currently limited in terms of commercial use due to a lack of methods specifically designed to produce thin films in high volumes. To address this limitation directly, hydrogels prepared from chitosan, chitosan-tetraethoxy silane, also known as tetraethyl orthosilicate (TEOS) and chitosan-glutaraldehyde have been used to prepare continuous thin films using a slot-die technique which is described in detail. By way of preliminary analysis of the resulting films for comparison purposes with films made by other methods, the mechanical strength of the films produced was assessed. It was found that as expected, the hybrid films made with TEOS and glutaraldehyde both show a higher yield strength than the films made with chitosan alone. In all cases, the mechanical properties of the films were found to compare very favorably with similar measurements reported in the literature. In order to assess the possible influence of the direction in which the hydrogel passes through the slot-die on the mechanical properties of the films, testing was performed on plain chitosan samples cut in a direction parallel to the direction of travel and perpendicular to this direction. It was found that there was no evidence of any mechanical anisotropy induced by the slot die process. The examples presented here serve to illustrate how the slot-die approach may be used to create high-volume, high-area chitosan-based films cheaply and rapidly. It is suggested that an approach of the type described here may facilitate the use of chitosan-based films for a wide range of important applications.

scholarly journals The Infuence of Salicin on Rheological and Film-Forming Properties of Collagen

Molecules ◽  
2021 ◽  
Vol 26 (6) ◽  
pp. 1661
Author(s):  
Katarzyna Adamiak ◽  
Katarzyna Lewandowska ◽  
Alina Sionkowska
Keyword(s):  
Mechanical Properties ◽  
Atomic Force Microscopy ◽  
Infrared Spectroscopy ◽  
Rheological Properties ◽  
Silver Carp ◽  
Shear Tests ◽  
Force Microscopy ◽  
Atomic Force ◽  
Film Forming ◽  
Potential Applications

Collagen films are widely used as adhesives in medicine and cosmetology. However, its properties require modification. In this work, the influence of salicin on the properties of collagen solution and films was studied. Collagen was extracted from silver carp skin. The rheological properties of collagen solutions with and without salicin were characterized by steady shear tests. Thin collagen films were prepared by solvent evaporation. The structure of films was researched using infrared spectroscopy. The surface properties of films were investigated using Atomic Force Microscopy (AFM). Mechanical properties were measured as well. It was found that the addition of salicin modified the roughness of collagen films and their mechanical and rheological properties. The above-mentioned parameters are very important in potential applications of collagen films containing salicin.

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