scholarly journals Nanosphere Lithography for Structuring Polycrystalline Diamond Films

Crystals ◽  
2020 ◽  
Vol 10 (2) ◽  
pp. 118 ◽  
Author(s):  
Mária Domonkos ◽  
Pavel Demo ◽  
Alexander Kromka
Keyword(s):  
Plasma Etching ◽  
Chemical Vapour ◽  
Polycrystalline Diamond ◽  
Nanosphere Lithography ◽  
Polystyrene Spheres ◽  
Self Assembled Monolayer ◽  
Lithographic Mask ◽  
Potential Applications ◽  
Oxygen Plasma Etching ◽  
Lift Off

This paper deals with the structuring of polycrystalline diamond thin films using the technique of nanosphere lithography. The presented multistep approaches relied on a spin-coated self-assembled monolayer of polystyrene spheres, which served as a lithographic mask for the further custom nanofabrication steps. Various arrays of diamond nanostructures—close-packed and non-close-packed monolayers over substrates with various levels of surface roughness, noble metal films over nanosphere arrays, ordered arrays of holes, and unordered pores—were created using reactive ion etching, chemical vapour deposition, metallization, and/or lift-off processes. The size and shape of the lithographic mask was altered using oxygen plasma etching. The periodicity of the final structure was defined by the initial diameter of the spheres. The surface morphology of the samples was characterized using scanning electron microscopy. The advantages and limitations of the fabrication technique are discussed. Finally, the potential applications (e.g., photonics, plasmonics) of the obtained nanostructures are reviewed.

Nanorings, Nanopillars and Nanospikes on Si(111) by Modified Nanosphere Lithography: Fabrication and Application

2004 ◽  
Vol 832 ◽  
Author(s):  
Jefferson Rose ◽  
Delroy Baugh
Keyword(s):  
Optoelectronic Devices ◽  
Nanosphere Lithography ◽  
Ion Bombardment ◽  
Fabrication Process ◽  
Foreseeable Future ◽  
Polystyrene Spheres ◽  
Self Assembled Monolayer ◽  
Judicious Choice ◽  
Self Assembled ◽  
Si Nanostructures

ABSTRACTUniform arrays of nanopillars, nanospikes, nanorings and rings atop nanopillars were fabricated using modified nanosphere lithography on the Si(111) surface and observed using AFM and SEM. A self-assembled monolayer mask which utilized 450±10nm polystyrene spheres were used as an etch mask during a fabrication process of physical Ar+ ion bombardment followed by SF6RIE to produce nanopillars with flat tops that could be as large as 210nm in height and 175nm in diameter. Nanospikes of approximately the same height were fabricated made with a FWHM of 250nm. The initial Ar+ion bombardment step was varied to achieve up to 4 times faster etch rates and narrowed widths in the nanospikes. Both types nanostructures systems were “self-wired” which is an intrinsic result of this fabrication process. Self-wired nanorings and rings atop nanopillar structures were also fabricated using a two step etching process along with sonication. The nanorings had inner and outer diameters of 225±5nm and 175±5 nm, respectively and were up to 20nm in height and their nanowire connectivity could be made optional by a judicious choice of solvent for sonication. The self-wired Si nanostructures were also “dressed” with self-assembled Ge quantum dots. These Ge/Si nano-architectured structures possess the basic framework for fabricating novel nanoelectronic and nano-optoelectronic devices in the foreseeable future.

A Novel Fabrication Process of Large Area Triangular Nanocavity Arrays by Bilayer Nanosphere Lithography

2012 ◽  
Vol 516 ◽  
pp. 447-451 ◽  
Author(s):  
Chao Guang Wang ◽  
Hong Juan Cui ◽  
Pei Tao Dong ◽  
Di Di ◽  
Jian Chen ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Plasma Etching ◽  
Self Assembly ◽  
Spin Coating ◽  
Nanosphere Lithography ◽  
Silicon Etching ◽  
Cavity Size ◽  
Large Area ◽  
Oxygen Plasma Etching ◽  
Cr Film

A simple and novel self-assembly based process is presented in this paper for the fabrication of gold triangular nanocavity arrays. This process combines nanosphere lithography (NSL) with some standard MEMS technologies. A carboxylated polystyrene (PS) nanosphere bilayer with a relatively large area is fabricated on silicon wafer as the starting template by spin-coating. Oxygen plasma etching, metal deposition and lifting-off of the PS upper layer are then orderly carried out for the formation of triangular space, which is made up of Cr film and the remaining PS nanoparticles. Then silicon etching is used to transfer the triangle pattern onto the silicon wafer. Finally, a 50 nm thick gold layer is deposited on the pattern to fabricate gold triangular nanocavity arrays. With this strategy, both the period and the cavity size can be adjusted independently. This will allow the tuning of the optical properties for desired application.

Self-Assembled Fluid Phase Floating Membranes with Tuneable Water Interlayers

2019 ◽  
Author(s):  
Luke Clifton ◽  
Nicoló Paracini ◽  
Arwel V. Hughes ◽  
Jeremy H. Lakey ◽  
Nina-Juliane Seinke ◽  
...  
Keyword(s):  
Fluid Phase ◽  
Interlayer Thickness ◽  
Supported Bilayers ◽  
Self Assembled Monolayer ◽  
High Coverage ◽  
Nano Technology ◽  
Surface Distance ◽  
Potential Applications ◽  
Self Assembled ◽  
Coated Surfaces

<p>We present a reliable method for the fabrication of fluid phase unsaturated bilayers which are readily self-assembled on charged self-assembled monolayer (SAM) surfaces producing high coverage floating supported bilayers where the membrane to surface distance could be controlled with nanometer precision. Vesicle fusion was used to deposit the bilayers onto anionic SAM coated surfaces. Upon assembly the bilayer to SAM solution interlayer thickness was 7-10 Å with evidence suggesting that this layer was present due to SAM hydration repulsion of the bilayer from the surface. This distance could be increased using low concentrations of salts which caused the interlayer thickness to enlarge to ~33 Å. Reducing the salt concentration resulted in a return to a shorter bilayer to surface distance. These accessible and controllable membrane models are well suited to a range of potential applications in biophysical studies, bio-sensors and Nano-technology.</p><br>

scholarly journals High-yield fabrication of perpendicularly magnetised synthetic antiferromagnetic nanodiscs

Nano Research ◽  
2021 ◽  
Author(s):  
Emma N. Welbourne ◽  
Tarun Vemulkar ◽  
Russell P. Cowburn
Keyword(s):  
Thin Film ◽  
Magnetic Properties ◽  
Sacrificial Layer ◽  
Nanosphere Lithography ◽  
High Yield ◽  
Perpendicular Anisotropy ◽  
Ion Milling ◽  
Lift Off

AbstractSynthetic antiferromagnetic (SAF) particles with perpendicular anisotropy display a number of desirable characteristics for applications in biological and other fluid environments. We present an efficient and effective method for the patterning of ultrathin Ruderman-Kittel-Kasuya-Yoshida coupled, perpendicularly magnetised SAFs using a combination of nanosphere lithography and ion milling. A Ge sacrificial layer is utilised, which provides a clean and simple lift-off process, as well as maintaining the key magnetic properties that are beneficial to target applications. We demonstrate that the method is capable of producing a particularly high yield of well-defined, thin film based nanoparticles.

scholarly journals Chirality in porous self-assembled monolayer networks at liquid/solid interfaces: induction, reversion, recognition and transfer

2021 ◽  
Author(s):  
Yoshito Tobe ◽  
Kazukuni Tahara ◽  
Steven De Feyter
Keyword(s):  
Two Dimensions ◽  
Self Assembled Monolayer ◽  
Supramolecular Chirality ◽  
Potential Applications ◽  
Self Assembled ◽  
Chirality Control

Chirality in two-dimensions (2D) has attracted increasing attention with regard to interesting fundamental aspects as well as potential applications. This article reports several aspects of supramolecular chirality control as exemplified...

FABRICATION OF TWO-DIMENSIONAL PHOTONIC CRYSTALS WITH GE2SB2TE5 NANOHOLE ARRAYS BY NANOSPHERE LITHOGRAPHY

2009 ◽  
Vol 23 (06n07) ◽  
pp. 1300-1305
Author(s):  
KI-HO SONG ◽  
HYUN-YONG LEE ◽  
HOE-YOUNG YANG ◽  
SUNG-WON KIM ◽  
JAE-HEE SEO ◽  
...  
Keyword(s):  
Photonic Crystals ◽  
Plasma Treatment ◽  
Treatment Time ◽  
Reduction Rate ◽  
Nanosphere Lithography ◽  
Two Dimensional ◽  
Photonic Bandgaps ◽  
Nanohole Arrays ◽  
Plasma Treatment Time ◽  
Lift Off

Two-dimensional photonic crystals (2D-PCs) with Ge 2 Sb 2 Te 5 ( GST ) nanohole arrays were prepared by the nanosphere lithography (NSL) process. A primary factor of PCs is that the refractive index (n) and the n-modulation can be realized by using the GST films, which exhibit a reversible phase transformation between amorphous and crystalline states by laser illumination. The polystyrene (PS) spheres with a diameter of 500 nm were spin-coated on Si substrate and subsequently reduced by O 2-plasma treatment. The reduced spheres were utilized as a lift-off mask of the NSL process and their size and separation could be precisely controlled. Amorphous GST films were thermally evaporated and then the reduced PS spheres were removed. The fabricated GST nanohole arrays were observed by SEM and AFM. The nanohole diameters are nearly linearly reduced with increasing plasma-treatment time (t). The reduction rate (δ) for the conditions of this work was evaluated to be ~ 0.92 nm/s. The period (Λ) and filling factor (η) of PCs are structure parameters that determine their photonic bandgaps (PBGs). η-modulation can be easily achieved via a control of t and the Λ can be also modulated by the use of PS spheres with specific diameter. In addition, the PBGs for the fabricated GST 2 D PC were calculated by considering the amorphous and crystalline states of GST .

Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography

2009 ◽  
Vol 517 (14) ◽  
pp. 3859-3861 ◽  
Author(s):  
Byung-Jae Kim ◽  
Hyunjung Jung ◽  
Hong-Yeol Kim ◽  
Joona Bang ◽  
Jihyun Kim
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Nanosphere Lithography ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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