scholarly journals Plasma Treatments and Light Extraction from Fluorinated CVD-Grown (400) Single Crystal Diamond Nanopillars

2020 ◽  
Vol 6 (2) ◽  
pp. 37
Author(s):  
Mariusz Radtke ◽  
Abdallah Slablab ◽  
Sandra Van Vlierberghe ◽  
Chao-Nan Lin ◽  
Ying-Jie Lu ◽  
...  
Keyword(s):  
Single Crystal ◽  
Inductively Coupled Plasma ◽  
Room Temperature ◽  
Chemical Vapor ◽  
Light Extraction ◽  
Ambient Conditions ◽  
Remarkable Effect ◽  
Inductively Coupled ◽  
Single Crystal Diamond ◽  
Optically Detected

We investigate the possibilities to realize light extraction from single crystal diamond (SCD) nanopillars. This was achieved by dedicated 519 nm laser-induced spin-state initiation of negatively charged nitrogen vacancies (NV−). We focus on the naturally-generated by chemical vapor deposition (CVD) growth of NV−. Applied diamond was neither implanted with 14N+, nor was the CVD synthesized SCD annealed. To investigate the possibility of light extraction by the utilization of NV−’s bright photoluminescence at room temperature and ambient conditions with the waveguiding effect, we have performed a top-down nanofabrication of SCD by electron beam lithography (EBL) and dry inductively-coupled plasma/reactive ion etching (ICP-RIE) to generate light focusing nanopillars. In addition, we have fluorinated the diamond’s surface by dedicated 0 V SF6 ICP plasma. Light extraction and spin manipulations were performed with photoluminescence (PL) spectroscopy and optically detected magnetic resonance (ODMR) at room temperature. We have observed a remarkable effect based on the selective 0 V SF6 plasma etching and surprisingly, in contrast to literature findings, deactivation of NV− centers. We discuss the possible deactivation mechanism in detail.

Structure and Optical Properties of Si Films Deposited by Inductively Coupled Plasma CVD at Room Temperature

2007 ◽  
Vol 336-338 ◽  
pp. 2228-2231
Author(s):  
Xiao Qiang Wang ◽  
De Yan He ◽  
Jun Shuai Li
Keyword(s):  
Optical Properties ◽  
Inductively Coupled Plasma ◽  
Room Temperature ◽  
Chemical Vapor ◽  
Plasma Chemical Vapor Deposition ◽  
Force Microscopy ◽  
Inductively Coupled ◽  
Atomic Force ◽  
Nano Crystalline ◽  
Si Films

Si films were deposited by inductively coupled plasma chemical vapor deposition at room temperature with a mixture of SiH4/H2. The microstructure of the film was characterized with Fourier transform of infrared, Raman spectroscopy, atomic force microscopy. We found that SiH4 concentration strongly affects the structure of Si films and nano-crystalline film can be synthesized at room temperature by optimizing the silane concentration. The analysis for optical properties of the films suggested that the optical band gap EOPT of films are distinctively lower than those of amorphous Si films. It has been observed that the EOPT of sample decreases with the increasing of H content in film.

Lateral outward growth of single-crystal diamond by two different structures of microwave plasma reactors

CrystEngComm ◽  
2022 ◽  
Author(s):  
Wei Cao ◽  
Zhibin Ma ◽  
Hongyang Zhao ◽  
Deng Gao ◽  
Qiuming Fu
Keyword(s):  
Chemical Vapor Deposition ◽  
Single Crystal ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Chemical Vapor ◽  
Lateral Growth ◽  
Plasma Reactors ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Single Crystal Diamond

On a semi-open holder, the homoepitaxial lateral growth of single-crystal diamond (SCD) was carried out via microwave plasma chemical vapor deposition (MPCVD). By tuning and optimizing two different structures of...

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