scholarly journals Material Removal Model for Lapping Process Based on Spiral Groove Density

2021 ◽  
Vol 11 (9) ◽  
pp. 3950
Author(s):  
Taekyung Lee ◽  
Haedo Jeong ◽  
Sangjik Lee ◽  
Hanchul Cho ◽  
Doyeon Kim ◽  
...  
Keyword(s):  
Material Removal Rate ◽  
Material Removal ◽  
Removal Rate ◽  
Thickness Variation ◽  
Contact Interface ◽  
Spiral Groove ◽  
Lubrication Condition ◽  
Material Removal Model ◽  
Increasing Demand ◽  
Removal Model

The increasing demand for single-crystal wafers combined with the increase in diameter of semiconductor wafers has warranted further improvements in thickness variation and material removal rate during lapping to ensure price competitiveness of wafers; consequently, the lapping process has gained the attention of researchers. However, there is insufficient research on the effect of platen grooves on the lapping process. In this study, the parameters to describe grooves were defined in order to understand their influence on the lapping process, and a material removal model was suggested based on indentation theory and subsequently experimentally validated. The results indicate that changes in groove density affect the lubrication condition at the contact interface as well as the probability of abrasive participation by varying the oil film thickness. When fabricating the groove for a lapping platen, a groove density at the critical groove density (CGD) or higher should be selected. The higher the groove density, the easier it is to avoid the CGD, and the higher is the material removal rate. The results of this study will enable engineers to design lapping platen grooves that are suitable for the production of modern semiconductor wafers.

A Mechanistic Model of Material Removal in Magnetorheological Finishing (MRF)

2007 ◽  
Vol 359-360 ◽  
pp. 384-388
Author(s):  
Feng Jun Chen ◽  
Shao Hui Yin ◽  
Jian Wu Yu ◽  
Hitoshi Ohmori ◽  
Wei Min Lin ◽  
...  
Keyword(s):  
Material Removal Rate ◽  
Material Removal ◽  
Reynolds Equation ◽  
Removal Rate ◽  
Mechanistic Model ◽  
Magnetorheological Fluid ◽  
Magnetorheological Finishing ◽  
Material Removal Model ◽  
Removal Model ◽  
The Magnetic Field

According to the sharp rheological characteristics of magnetorheological fluid in the magnetic field, the principle and mechanism of magnetorheological finishing is analyzed. Based on the Preston equation, the Reynolds equation and its boundary conditions, the two-dimensional material removal model is built and simulated. Furthermore, a series of MRF experiments are carried out, and the influence of the immersed depth and material kinds on material removal rate are clarified respectively. The experimental results are compared with the modeling results of material removal rate to confirm the mechanistic model validity.

Development of a New Plate Polishing Technique with an Instantaneous Tiny-Grinding Wheel Cluster Based on Magnetorheological Effect

2008 ◽  
Vol 53-54 ◽  
pp. 155-160 ◽  
Author(s):  
Qiu Sheng Yan ◽  
Ai Jun Tang ◽  
Jia Bin Lu ◽  
Wei Qiang Gao
Keyword(s):  
Surface Roughness ◽  
Material Removal Rate ◽  
Material Removal ◽  
Removal Rate ◽  
Grinding Wheel ◽  
Abrasive Particles ◽  
Magnetorheological Effect ◽  
Material Removal Model ◽  
Mr Effect ◽  
Removal Model

A new plate polishing technique with an instantaneous tiny-grinding wheel cluster based on the magnetorheological (MR) effect is presented in this paper, and some experiments were conducted to prove its effectiveness and applicability. Under certain experimental condition, the material removal rate was improved by a factor of 20.84% as compared with the conventional polishing methods with dissociative abrasive particles, while the surface roughness of the workpiece was not obviously increased. Furthermore, the composite of the MR fluid was optimized to obtain the best polishing performance. On the basis of the experimental results, the material removal model of the new plate polishing technique was presented.

Material Removal Model and Experimental Verification for Abrasive Jet Precision Finishing with Wheel as Restraint

2006 ◽  
Vol 304-305 ◽  
pp. 555-559 ◽  
Author(s):  
Chang He Li ◽  
Guang Qi Cai ◽  
Shi Chao Xiu ◽  
Q. Li
Keyword(s):  
Material Removal Rate ◽  
Material Removal ◽  
Removal Rate ◽  
Experimental Results ◽  
Grinding Wheel ◽  
Rate Model ◽  
Material Removal Model ◽  
Material Removal Rate Model ◽  
Three Body ◽  
Precision Finishing

The material removal rate (MRR) model was investigated in abrasive jet precision finishing (AJPF) with wheel as restraint. When abrasive wore and workpiece surface micro-protrusion removed, the size ratio for characteristic particle size to minimum film thickness gradually diminishing, the abrasive machining from two-body lapping to three-body polishing transition in AJPF with grinding wheel as restraint. In the study, the material removal rate model was established according to machining mechanisms and machining modes from two-body to three-body process transition condition, and active number of particles in grinding zone were calculated and simulated. Experiments were performed in the plane grinder for material removal mechanism and academic models verification. It can be observed from experimental results that the surface morphology change dramatically to a grooved or micro-machined surface with all the grooves aligned in the sliding direction in two-body lapping mode. On the other hand, the surface is very different, consists of a random machining pits with very little sign of any directionality to the deformation in the three-body machining mode. Furthermore, the material removal rate model was found to give a good description of the experimental results.

Experimental Study of Lapping Using Mixed Abrasive Grits

2009 ◽  
Author(s):  
Chunhui Chung ◽  
Glenn Melendez ◽  
Imin Kao
Keyword(s):  
Surface Roughness ◽  
Surface Quality ◽  
Material Removal Rate ◽  
Material Removal ◽  
Removal Rate ◽  
Wafer Surface ◽  
Thickness Variation ◽  
Parameter Study ◽  
Manufacturing Processes ◽  
Mixing Ratios

Wafers made of materials such as silicon, III-V and II-VI compounds, and optoelectronic materials, require high-degree of surface quality in order to increase the yield in micro-electronics fabrication to produce IC chips and devices. Measures of properties of surface quality of wafers include: nanotopography, surface morphology, global planarization, total thickness variation (TTV) and warp. Due to the reduction of feature size in micro-electronics fabrication, the requirements of such properties become more and more stringent. To meet such requirements, the wafer manufacturing processes of brittle semiconductor materials, such as slicing, lapping, grinding, and polishing have been continually improved. In this paper, the lapping process of wafer surface treatment is studied with experimental results of surface roughness and material removal rate. In order to improve the performance of lapping process, effects of mixed abrasive grits in the slurry of the free abrasive machining (FAM) processes are studied using a single-sided wafer-lapping machine. Under the same slurry density, experiments employing different mixing ratios of large and small abrasive grits, and various normal loadings on the wafer surface applied through a jig are conducted for parameter study. With various mixing ratios and loadings, observations and measurements such as the total amount of material removed, material removal rate, surface roughness, and relative angular velocity are presented and discussed in this paper. The experiments show that the half-half mixing ratio of abrasives removes more material than other mixing ratios under the same conditions, but with a higher surface roughness. The results of this study can provide a good reference to the FAM processes that practitioners use today by exploiting different mixing ratios and loadings of abrasive slurry in the manufacturing processes.

scholarly journals Removal Characteristics of Sapphire Lapping using Composite Plates with Consciously Patterned Resinoid-Bonded Semifixed Diamond Grits

Crystals ◽  
2020 ◽  
Vol 10 (4) ◽  
pp. 293 ◽  
Author(s):  
Wenshan Wang ◽  
Yiqing Yu ◽  
Zhongwei Hu ◽  
Congfu Fang ◽  
Jing Lu ◽  
...  
Keyword(s):  
Material Removal Rate ◽  
Material Removal ◽  
Removal Rate ◽  
Sol Gel ◽  
High Hardness ◽  
Dimensional Accuracy ◽  
Composite Plates ◽  
Thickness Variation ◽  
Total Thickness Variation ◽  
Abrasive Tools

Sapphire lapping is of key importance for the successful planarization of wafers that are widely present in electronic devices. However, the high hardness of sapphire makes it extremely challenging to improve its material removal rate during the lapping process without compromising surface quality and dimensional accuracy. In this work, a novel composite lapping plate consisting of a rigid resin frame and flexible sol–gel balls was fabricated with consciously designed patterns. Through lapping experiment, it was revealed that the diamond grits imbedded in the sol–gel balls can effectively lap the sapphire at a promising material removal rate (MRR), without the formation of undesirable scratches and loss of surface integrity. Moreover, by designing the arrangement patterns of sol–gel balls, the total thickness variation (TTV) can also be ensured for lapped sapphire substrates. The implications of experimental results were also discussed based on the trajectory analysis and contact mechanics of lapping grits in order to demonstrate the potential of the newly developed composite abrasive tools for sapphire-lapping applications.

Study of Local Material Removal Model of Bonnet Tool Polishing

2006 ◽  
Vol 304-305 ◽  
pp. 335-339 ◽  
Author(s):  
Da Gang Xie ◽  
B. Gao ◽  
Ying Xue Yao ◽  
Zhe Jun Yuan
Keyword(s):  
Material Removal ◽  
Dwell Time ◽  
Removal Rate ◽  
Rate Model ◽  
Polishing Process ◽  
Flexible Membrane ◽  
Local Material ◽  
Internal Fluid ◽  
Material Removal Model ◽  
Removal Model

Bonnet tool polishing is a novel aspherical polishing method. This paper describes a method to obtain the local removal rate for the polishing process using bulbous flexible membrane covered with a polishing pad and pressurized by an internal fluid. According to the principle of bonnet polishing and Preston equation, the local removal rate model was established. It is confirmed by the experiments that the local removal depth has a linear relation with the dwell time. Preston coefficient can be calculated from the experimental data. Finally the expression of the local removal rate in bonnet tool polishing is acquired semi-empirically.

Modeling and Analysis of Material Removal Characteristics in Silicon Wafer Double Side Polishing

2012 ◽  
Vol 516 ◽  
pp. 384-389
Author(s):  
Sang Jik Lee ◽  
Hyoung Jae Kim ◽  
Hae Do Jeong
Keyword(s):  
Integrated Circuits ◽  
Process Parameters ◽  
Material Removal Rate ◽  
Material Removal ◽  
Removal Rate ◽  
Thickness Variation ◽  
Modeling And Analysis ◽  
Profile Variation ◽  
Friction Energy ◽  
Wafer Edge

As advancing technologies increase the demand for yield and planarity in integrated circuits, wafers have become larger and their specifications more stringent. Flatness, thickness variation and nanotopography have emerged as important concerns in the wafering process. Double side polishing has been adopted as a solution to these problems. This paper focuses on the material removal characteristics and wafer profile variation during Si double side polishing. A polishing experiment to investigate Si removal characteristics according to process parameters was carried out in a single head rotary polisher equipped with a monitoring system for friction force. It was found that the material removal rate is related to friction energy rate, and the polishing state was transited and divided into three conditions according to pressure. On the basis of the experimental results, the wafer profile variation in double side polishing was modelled and simulated according to pressure. The friction energy was calculated to find the material removal amount across the wafer. With the conversion of calculated friction energy to the material removal amount, wafer profile variation was simulated. As a result, the wafer profile variation and its range were increased with a pressure increase, and originated from the position near the wafer edge.

scholarly journals Modeling and Analysis of the Material Removal Rate for Ultrasonic Vibration-assisted Polishing of Optical Glass BK7

2021 ◽  
Author(s):  
Yingdong Liang ◽  
Chao Zhang ◽  
Xin Chen ◽  
Tianqi Zhang ◽  
Tianbiao Yu ◽  
...  
Keyword(s):  
Ultrasonic Vibration ◽  
Material Removal Rate ◽  
Material Removal ◽  
Optical Glass ◽  
Removal Rate ◽  
Machining Accuracy ◽  
Removal Mechanism ◽  
Material Removal Mechanism ◽  
Abrasive Particles ◽  
Material Removal Model

Abstract The emergence of ultrasonic vibration-assisted polishing technology has effectively improved the machining accuracy and efficiency of hard and brittle materials in modern optical industry, however, the material removal mechanism of ultrasonic vibration-assisted polishing (UVAP) still needs to be further revealed. This paper focuses on the material removal mechanism of ultrasonic vibration-assisted polishing of optical glass (BK7), the application of ultrasonic vibration to axial vibration and the atomization of polishing slurry, the material removal model was established. Based on the analysis of the relationship between the nominal distance d of the polishing pad and the actual contact area distribution, the prediction of the material removal profile is realized. In addition, the effects of different parameters on the material removal rate (MRR) were analyzed, including polishing force, spindle speed, abrasive particle size, ultrasonic amplitude, feed rate, and flow-rate of polishing slurry. Based on the motion equation of abrasive particles, the trajectory of abrasive particles in the polishing slurry was simulated, and the simulation results show that the introduction of the ultrasonic vibration field changes the motion state and trajectory of embedded and free abrasive particles. The new model can not only qualitatively analyze the influence of different process parameters on MRR, but also predict the material removal depth and MRR, providing a possibility for deterministic material removal and a theoretical basis for subsequent polishing of complex curved surfaces of optical glass.

Influence of Abrasive on Planarization Polishing with the Tiny-Grinding Wheel Cluster Based on the Magnetorheological Effect

2009 ◽  
Vol 76-78 ◽  
pp. 229-234 ◽  
Author(s):  
Qiu Sheng Yan ◽  
Yong Yang ◽  
Jia Bin Lu ◽  
Wei Qiang Gao
Keyword(s):  
Surface Roughness ◽  
Particle Size ◽  
Material Removal Rate ◽  
Material Removal ◽  
Magnetic Particles ◽  
Optical Glass ◽  
Removal Rate ◽  
Grinding Wheel ◽  
Material Particle ◽  
Material Removal Model

Experiments were conducted to polish optical glass with the magnetorheological (MR) effect-based tiny-grinding wheel cluster, and the influences of abrasive material, particle size and content on the material removal rate and surface roughness are investigated. The experimental results indicate that: the higher the hardness of abrasives, the higher the material removal rate, but the abrasives with lower hardness can obtain lower surface roughness. The better polishing quality of the workpiece can be obtained when the particle size of abrasives is similar to the particle size of magnetic particles. Moreover, the content of abrasives has an optimum value, and the material removal rate and the surface quality can not be improved further when the content of abrasives exceeds the optimum value. On the basis of above, the material removal model of the new planarization polishing technique is presented.

Research on Material Removal of Magnetorheological Finishing

2007 ◽  
Vol 329 ◽  
pp. 285-290
Author(s):  
Gui Wen Kang ◽  
Fei Hu Zhang
Keyword(s):  
Material Removal ◽  
Removal Rate ◽  
Mathematic Model ◽  
Magnetorheological Finishing ◽  
Fixed Rate ◽  
Hydrodynamic Analysis ◽  
Finishing Process ◽  
Material Removal Model ◽  
Removal Model ◽  
Surface Figure

Magnetorheological finishing (MRF) is a novel precision optical machining technology. Owing to its flexible finishing process, MRF can eliminate subsurface damage, smooth rms micro roughness and correct surface figure errors. The finishing process can be easily controlled by a computer. Material removal model in MRF is established. According to Preston equation in optical machining, mathematic model of material removal rate in MRF rotating at fixed rate is established through hydrodynamic analysis of the MR fluid flow in the polishing zone. The validity of the model is examined by the experimental results.

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