scholarly journals Fabrication of titanium nitride thin films by DC magnetron sputtering on different types of subtrates for coating applications

2014 ◽  
Vol 17 (4) ◽  
pp. 65-73
Author(s):  
Thuong Tran Tuyet Vo ◽  
Tuan Anh Dao ◽  
Hang Thi Thu Cu ◽  
Hung Vu Tuan Le
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Crystalline Structure ◽  
Dc Magnetron Sputtering ◽  
Negative Voltage ◽  
Optical Films ◽  
Different Types

Titanium nitride thin films (TiN) are fabricated by DC magnetron sputtering on different types of substrates such as glass substrates, PET substrates, substrate alloy (AISI 304) and drill steel. In this work we study the effect of distance target - substrate, sputtering time and negative voltage to the crystal structure, mechanical properties and optical films. The properties of thin films were studied by X-ray diffraction method Stylus, UV – Vis method and scanning electron microscopy. Results showed that the distance target - substrate, sputtering time and negative voltage affects the crystalline structure, mechanical properties and optical films. TiN films have been synthesized highly crystalline structure, crystal structure of thin films oriented along the the surface lattice (111), (200) and (311). Besides TiN thin films also have high reflectance in the visible and infrared range, good adhesion, high chemical durability.

Structural, Morphological and Adhesion Properties of Cofeb Thin Films Deposited by DC Magnetron Sputtering

2013 ◽  
Vol 802 ◽  
pp. 47-52
Author(s):  
Chuleerat Ibuki ◽  
Rachasak Sakdanuphab
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Grain Size ◽  
Magnetron Sputtering ◽  
Crystalline Structure ◽  
Glass Substrate ◽  
Intrinsic Stress ◽  
Dc Magnetron Sputtering ◽  
Adhesion Properties ◽  
Sputtering Power

In this work the effects of amorphous (glass) and crystalline (Si) substrates on the structural, morphological and adhesion properties of CoFeB thin film deposited by DC Magnetron sputtering were investigated. It was found that the structure of a substrate affects to crystal formation, surface morphology and adhesion of CoFeB thin films. The X-Ray diffraction patterns reveal that as-deposited CoFeB thin film at low sputtering power was amorphous and would become crystal when the power increased. The increase in crystalline structure of CoFeB thin film is attributed to the crystalline substrate and the increase of kinetic energy of sputtering atoms. Atomic Force Microscopy images of CoFeB thin film clearly show that the roughness, grain size, and uniformity correlate to the sputtering power and the structure of substrate. The CoFeB thin film on glass substrate shows a smooth surface and a small grain size whereas the CoFeB thin film on Si substrate shows a rough surface and a slightly increases of grain size. Sticky Tape Test on CoFeB thin film deposited on glass substrate indicates the adhesion failure with a high sputtering power. The results suggest that the crystalline structure of substrate affects to the atomic bonding and the sputtering power affects to intrinsic stress of CoFeB thin film.

Crystal structure and mechanical properties of titanium nitride films synthesized by magnetron sputtering with a hot target

2017 ◽  
Vol 43 (5) ◽  
pp. 477-479 ◽  
Author(s):  
V. I. Shapovalov ◽  
A. S. Useinov ◽  
K. S. Kravchuk ◽  
E. V. Gladkikh ◽  
A. A. Kozin ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Hot Target

scholarly journals Structural and mechanical properties of amorphous AlMgB14 thin films deposited by DC magnetron sputtering on Si, Al2O3 and MgO substrates

2020 ◽  
Vol 126 (2) ◽  
Author(s):  
Mohammad Noroozi ◽  
Andrejs Petruhins ◽  
Grzegorz Greczynski ◽  
Johanna Rosen ◽  
Per Eklund
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering

Effect of Sputtering Current on the Structure of TiCrN Thin Films Prepared from Mosaic Target by Reactive DC Magnetron Sputtering

2020 ◽  
Vol 901 ◽  
pp. 37-42
Author(s):  
Siriwat Alaksanasuwan ◽  
Adisorn Buranawong ◽  
Nirun Witit-Anun
Keyword(s):  
Crystal Structure ◽  
Thin Films ◽  
Solid Solution ◽  
Magnetron Sputtering ◽  
Crystallite Size ◽  
Elemental Composition ◽  
Dc Magnetron Sputtering ◽  
Lattice Constants ◽  
Deposited Films ◽  
Sputtering System

TiCrN thin films have been prepared using a reactive DC magnetron sputtering system from a mosaic target. The effects of sputtering current, in the range of 300 to 700 mA, on the structure of the thin films were investigated. The crystal structure, microstructure, thickness, and composition were characterized by GI-XRD, FE-SEM and EDS technique, respectively. The results revealed that all the as-deposited films were formed as a (Ti,Cr)N solid solution. The as-deposited TiCrN films showed a nanostructure with a crystallite size less than 70 nm. The crystal sizes of all planes were in the range of 22.2 to 69.9 nm. The lattice constants were in the range of 4.149 Å to 4.175 Å. The thickness increases from 1630 nm to 4910 nm with increasing the sputtering current. The elemental composition (Ti Cr and N contents) of the as-deposited films were varied with the sputtering current. Lastly, the all of the thin films in this work showed compact columnar and dense morphology as a resulted of increasing the sputtering current.

Characterization of Microroughness Parameters in Titanium Nitride Thin Films Grown by DC Magnetron Sputtering

2012 ◽  
Vol 31 (6) ◽  
pp. 586-590 ◽  
Author(s):  
Ali Gelali ◽  
Azin Ahmadpourian ◽  
Reza Bavadi ◽  
M. R. Hantehzadeh ◽  
Arman Ahmadpourian
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Nitride ◽  
Dc Magnetron Sputtering
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