Calibration of magnetic field coil standards by means of field profile measurement

2005 ◽  
Vol 22 (3-4) ◽  
pp. 169-175 ◽  
Author(s):  
Kurt Weyand ◽  
Rainer Ketzler ◽  
Manfred Kitschke
Keyword(s):  
Magnetic Field ◽  
Profile Measurement ◽  
Field Profile ◽  
Field Coil

Dependence of the a-Si:H Defect Density of States on the Magnetic Field Profile of an Electron Cyclotron Resonance Microwave Plasma

1992 ◽  
Vol 258 ◽  
Author(s):  
F.S. Pool ◽  
J.M. Essick ◽  
Y.H. Shing ◽  
R.T. Mather
Keyword(s):  
Magnetic Field ◽  
Density Of States ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Microwave Plasma ◽  
Defect Density ◽  
Electron Cyclotron ◽  
Field Profile ◽  
Magnetic Field Profile ◽  
The Magnetic Field

ABSTRACTThe magnetic field profile of an electron cyclotron resonance (ECR) microwave plasma was systematically altered to determine subsequent effects on a-Si:H film quality. Films of a-Si:H were deposited at pressures of 0.7 mTorr and 5 mTorr with a H2/SiH4 ratio of approximately three. The mobility gap density of states ND, deposition rate and light to dark conductivity were determined for the a-Si:H films. This data was correlated to the magnetic field profile of the plasma, which was characterized by Langmuir probe measurements of the ion current density. By variation of the magnetic field profile ND could be altered by more than an order of magnitude, from 1×1016 to 1×1017 at 0.7 mTorr and 1×1016 to 5×1017 at 5 mTorr. Two deposition regimes were found to occur for the conditions of this study. Highly divergent magnetic fields resulted in poor quality a-Si:H, while for magnetic field profiles defining a more highly confined plasma, the a-Si:H was of device quality and relatively independent of the magnetic field configuration.

Untersuchung des Druckaufbaus einer stationären, magnetfeldstabilisierten Helium-Entladung mit Hilfe magnetischer Messungen

1967 ◽  
Vol 22 (10) ◽  
pp. 1599-1612 ◽  
Author(s):  
Otto Klüber
Keyword(s):  
Magnetic Field ◽  
Magnetic Flux ◽  
Plasma Column ◽  
Ambipolar Diffusion ◽  
Nernst Effect ◽  
Thermomagnetic Effect ◽  
Field Coil ◽  
Neutral Gas ◽  
Ring Currents ◽  
The Magnetic Field

A stationary discharge is produced bya current flowing parallel to the magnetic field ofa cylindrical coil. In the region where the field is homogeneous the pressure in the plasma column is much higher than that in the surrounding neutral gas. This is mainly caused by diamagnetic ring currents, as is shown by measuring the magnetic flux due to these currents. Two effects are primarily responsible for the ring currents in this region: The already known effect of the ambipolar diffusion across the magnetic field anda thermomagnetic effect, called NERNST effect, whose influence on the pressure build-up ofa plasma has not been investigated hitherto. Other phenomena causing ring currents occur in the plasma near the coil ends and outside the field coil.

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