scholarly journals SYNTHESIS AND CHARACTERIZATION OF HYBRID ORGANIC-INORGANIC THIN FILMS VIA ATOMIC LAYER DEPOSITION FOR MEMS/NEMS

2008 ◽  
Author(s):  
D. Seghete ◽  
Y.J. Chang ◽  
B. Davidson ◽  
V.M. Bright ◽  
S.M. George
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Synthesis And Characterization ◽  
Layer Deposition ◽  
Inorganic Thin Films

Synthesis and characterization of PbTe thin films by atomic layer deposition

2014 ◽  
Vol 211 (6) ◽  
pp. 1329-1333 ◽  
Author(s):  
K. Zhang ◽  
A. D. Ramalingom Pillai ◽  
M. Tangirala ◽  
D. Nminibapiel ◽  
K. Bollenbach ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Synthesis And Characterization ◽  
Layer Deposition

Second-generation hexavalent molybdenum oxo-amidinate precursors for atomic layer deposition

2017 ◽  
Vol 46 (4) ◽  
pp. 1172-1178 ◽  
Author(s):  
T. Jurca ◽  
A. W. Peters ◽  
A. R. Mouat ◽  
O. K. Farha ◽  
J. T. Hupp ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Second Generation ◽  
Atomic Layer ◽  
Synthesis And Characterization ◽  
Layer Deposition

The synthesis and characterization of molybdenum oxo-amidinate ALD precursors MoO2(R2AMD)2[AMD =N,N′-di-R-acetamidinate; R = Cy (2; cyclohexyl) andiPr (3)] is reported.

Atomic Layer Deposition and Characterization of Erbium Oxide-Doped Zirconium Oxide Thin Films

2010 ◽  
Vol 157 (10) ◽  
pp. G193 ◽  
Author(s):  
Aile Tamm ◽  
Marianna Kemell ◽  
Jekaterina Kozlova ◽  
Timo Sajavaara ◽  
Massimo Tallarida ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Zirconium Oxide ◽  
Atomic Layer ◽  
Erbium Oxide ◽  
Oxide Thin Films ◽  
Layer Deposition

scholarly journals Atomic Layer Deposition of Inorganic Thin Films on 3D Polymer Nanonetworks

2019 ◽  
Vol 9 (10) ◽  
pp. 1990 ◽  
Author(s):  
Jinseong Ahn ◽  
Changui Ahn ◽  
Seokwoo Jeon ◽  
Junyong Park
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Interference Lithography ◽  
Technical Requirement ◽  
Layer Deposition ◽  
Direct Laser ◽  
Inorganic Thin Films ◽  
Polymer Template

Atomic layer deposition (ALD) is a unique tool for conformally depositing inorganic thin films with precisely controlled thickness at nanoscale. Recently, ALD has been used in the manufacture of inorganic thin films using a three-dimensional (3D) nanonetwork structure made of polymer as a template, which is pre-formed by advanced 3D nanofabrication techniques such as electrospinning, block-copolymer (BCP) lithography, direct laser writing (DLW), multibeam interference lithography (MBIL), and phase-mask interference lithography (PMIL). The key technical requirement of this polymer template-assisted ALD is to perform the deposition process at a lower temperature, preserving the nanostructure of the polymer template during the deposition process. This review focuses on the successful cases of conformal deposition of inorganic thin films on 3D polymer nanonetworks using thermal ALD or plasma-enhanced ALD at temperatures below 200 °C. Recent applications and prospects of nanostructured polymer–inorganic composites or hollow inorganic materials are also discussed.

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