Influence of oxygen partial pressure on the growth of Al-doped zinc oxide films by reactive MF magnetron sputtering

2011 ◽  
Vol 102 (2) ◽  
pp. 143-146
Author(s):  
Rui-jiang Hong ◽  
Xin Jiang
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Oxide Films ◽  
Zinc Oxide Films

scholarly journals Influence of Oxygen on Zinc Oxide Films Fabricated by Ion-Beam Sputter Deposition

2013 ◽  
Vol 2013 ◽  
pp. 1-7 ◽  
Author(s):  
Jin-Cherng Hsu ◽  
Yueh-Sheng Chiang
Keyword(s):  
Zinc Oxide ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Ion Beam ◽  
Oxide Films ◽  
Sputter Deposition ◽  
Biaxial Stress ◽  
Zinc Oxide Films ◽  
Light Region ◽  
Ion Beam Sputter Deposition

In this study, zinc oxide films were deposited by an ion-beam sputter deposition in various oxygen partial pressures at room temperature. The films changed the structures from amorphous to polycrystalline with increasing the oxygen partial pressure (). The optimal was found at Torr because the film prepared at the oxygen partial pressure had the lowest resistivity and the highest transparence in the visible light region. The lowest resistivity results from a great number of oxygen vacancy sites formed on the polycrystalline surface as exposed to the atmosphere. Moreover, the film has the highest XRD peak intensity, smallest FWHM diffraction peak, smallest -spacing, and smallest biaxial stress.

The Effect of Oxygen Partial Pressure on the Formation of Nano Crystalline Zinc Oxide Films

2011 ◽  
Vol 3 (1) ◽  
pp. 77-81
Author(s):  
Yasemin Aydin ◽  
Mehmet Oguz Guler ◽  
Ozgur Cevher ◽  
Deniz Gultekin ◽  
Hatem Akbulut
Keyword(s):  
Zinc Oxide ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Oxide Films ◽  
Zinc Oxide Films ◽  
Nano Crystalline ◽  
Effect Of Oxygen

Influence of Thermal Annealing on Microstructures of Zinc Oxide Films Deposited by RF Magnetron Sputtering

2007 ◽  
Vol 46 (6A) ◽  
pp. 3319-3323 ◽  
Author(s):  
Takahiro Hiramatsu ◽  
Mamoru Furuta ◽  
Hiroshi Furuta ◽  
Tokiyoshi Matsuda ◽  
Takashi Hirao
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Thermal Annealing ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Zinc Oxide Films

Structural studies of zinc oxide films grown by RF magnetron sputtering

2005 ◽  
Vol 148 (1) ◽  
pp. 37-41 ◽  
Author(s):  
I. Sayago ◽  
M. Aleixandre ◽  
A. Martínez ◽  
M.J. Fernández ◽  
J.P. Santos ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Structural Studies ◽  
Zinc Oxide Films

Low content indium-doped zinc oxide films with tunable work function fabricated through magnetron sputtering

2010 ◽  
Vol 25 (4) ◽  
pp. 045008 ◽  
Author(s):  
Changgang Huang ◽  
Meili Wang ◽  
Zhonghua Deng ◽  
Yongge Cao ◽  
Quanlin Liu ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Work Function ◽  
Oxide Films ◽  
Zinc Oxide Films
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