Effect of Ion Irradiation for Ni Films Prepared on an Acrylonitrile-Butadiene-Styrene Resin Using Unbalanced Magnetron Sputtering Assisted by Inductively Coupled Plasma

Tatsunori KODA; Hiroshi TOYOTA

doi:10.3131/jvsj2.58.257

Effect of Ion Irradiation for Ni Films Prepared on an Acrylonitrile-Butadiene-Styrene Resin Using Unbalanced Magnetron Sputtering Assisted by Inductively Coupled Plasma

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.58.257 ◽

2015 ◽

Vol 58 (7) ◽

pp. 257-260 ◽

Cited By ~ 1

Author(s):

Tatsunori KODA ◽

Hiroshi TOYOTA

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Ion Irradiation ◽

Acrylonitrile Butadiene Styrene ◽

Inductively Coupled ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Butadiene Styrene

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Gas Pressure Dependence on Structural and Electrical Properties of Ni Thin Films on an Acrylonitrile-Butadiene-Styrene Resin Prepared Using Unbalanced Magnetron Sputtering Assisted by Inductively Coupled Plasma

IEEJ Transactions on Sensors and Micromachines ◽

10.1541/ieejsmas.140.60 ◽

2020 ◽

Vol 140 (3) ◽

pp. 60-64

Author(s):

Masayuki Iwasaki ◽

Hiroshi Toyota

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Acrylonitrile Butadiene Styrene ◽

Inductively Coupled ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Structural And Electrical Properties ◽

Butadiene Styrene

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Effects of magnetic flux density and substrate temperature on Ni films prepared by means of unbalanced magnetron sputtering assisted by inductively coupled plasma

Journal of Physics Conference Series ◽

10.1088/1742-6596/417/1/012035 ◽

2013 ◽

Vol 417 ◽

pp. 012035 ◽

Cited By ~ 1

Author(s):

K Otani ◽

N Sakata ◽

T Ozaki ◽

K Kawabata

Keyword(s):

Magnetic Flux ◽

Magnetron Sputtering ◽

Substrate Temperature ◽

Flux Density ◽

Inductively Coupled Plasma ◽

Magnetic Flux Density ◽

Inductively Coupled ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4832226 ◽

2014 ◽

Vol 32 (2) ◽

pp. 02B104 ◽

Cited By ~ 4

Author(s):

Tatsunori Koda ◽

Hiroshi Toyota

Keyword(s):

Magnetic Flux ◽

Inductively Coupled Plasma ◽

Flexible Substrate ◽

Substrate Material ◽

Magnetic Flux Density ◽

Substrate Bias ◽

Substrate Bias Voltage ◽

Inductively Coupled ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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An Investigation on the Extraction and Quantitation of a Hexavalent Chromium in Acrylonitrile Butadiene Styrene Copolymer (ABS) and Printed Circuit Board (PCB) by Ion Chromatography Coupled with Inductively Coupled Plasma Atomic Emission Spectrometry

Bulletin of the Korean Chemical Society ◽

10.5012/bkcs.2012.33.6.1967 ◽

2012 ◽

Vol 33 (6) ◽

pp. 1967-1971

Author(s):

Sang-Ho Nam ◽

Yu-Na Kim

Keyword(s):

Inductively Coupled Plasma ◽

Printed Circuit Board ◽

Acrylonitrile Butadiene Styrene ◽

Atomic Emission ◽

Circuit Board ◽

Emission Spectrometry ◽

Plasma Atomic Emission Spectrometry ◽

Printed Circuit ◽

Inductively Coupled ◽

Butadiene Styrene

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In-situstress measurement during the deposition of CNxthin films by unbalanced magnetron sputtering; formation of high levels of stress with 28 eV ion irradiation

Philosophical Magazine Letters ◽

10.1080/09500830410001716140 ◽

2004 ◽

Vol 84 (6) ◽

pp. 395-403 ◽

Cited By ~ 2

Author(s):

I. F. Brunell ¶ ◽

L. Pichon ◽

N. Hellgren ◽

Zs. Czigány ◽

J. Neidhardt ◽

...

Keyword(s):

Magnetron Sputtering ◽

Ion Irradiation ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Effect of Ion Irradiation for Ni Films prepared on a Flexible Substrate Material Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

Journal of the Vacuum Society of Japan ◽

10.3131/jvsj2.58.319 ◽

2015 ◽

Vol 58 (8) ◽

pp. 319-323 ◽

Cited By ~ 1

Author(s):

Sho MIYASHITA ◽

Hiroshi TOYOTA

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Ion Irradiation ◽

Flexible Substrate ◽

Substrate Material ◽

Plasma Confinement ◽

Inductively Coupled ◽

Magnetic Plasma

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Deposition Behavior of Boron Carbide Thin Film Deposited by Unbalanced Magnetron Sputtering Method

Korean Journal of Metals and Materials ◽

10.3365/kjmm.2014.52.12.969 ◽

2014 ◽

Vol 52 (12) ◽

pp. 969-974

Author(s):

Young Joon Baik ◽

Kyung Eun Bae ◽

Jong Keuk Park ◽

Wook Seong Lee

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Boron Carbide ◽

Deposition Behavior ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Electrical properties of ZnO-based photodetector prepared by room temperature DC unbalanced magnetron sputtering

10.1117/12.2243831 ◽

2016 ◽

Cited By ~ 2

Author(s):

Eka Nurfani ◽

Angga Virdian ◽

Robi Kurniawan ◽

Shibghatullah Muhammady ◽

Inge M. Sutjahja ◽

...

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Room Temperature ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes

Materials Science Forum ◽

10.4028/www.scientific.net/msf.102-104.563 ◽

1992 ◽

Vol 102-104 ◽

pp. 563-572 ◽

Cited By ~ 1

Author(s):

S.L. Rohde

Keyword(s):

Thin Film ◽

Magnetron Sputtering ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron ◽

Plasma Characteristics

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TiN/NbN superlattice hard coatings deposited by unbalanced magnetron sputtering

Surface and Coatings Technology ◽

10.1016/s0257-8972(98)00825-1 ◽

1999 ◽

Vol 113 (1-2) ◽

pp. 75-79 ◽

Cited By ~ 41

Author(s):

X.T. Zeng

Keyword(s):

Magnetron Sputtering ◽

Hard Coatings ◽

Unbalanced Magnetron Sputtering ◽

Unbalanced Magnetron

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