scholarly journals Preparation of Bi2Sr2Can-1CunOy Superconducting Thin Films by RF Magnetron Sputtering Under External Magnetic Field

Shinku ◽  
2005 ◽  
Vol 48 (3) ◽  
pp. 181-183
Author(s):  
Takahiro ONISHI ◽  
Kenji SAITOU ◽  
Yukari OUCHI ◽  
Naoki FUJIWARA ◽  
Satoru KISHIDA
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
External Magnetic Field ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Superconducting Thin Films

scholarly journals Preparation of Bi-based Superconducting Thin Films by RF Magnetron Sputtering under Magnetic Field

Shinku ◽  
2004 ◽  
Vol 47 (3) ◽  
pp. 194-196
Author(s):  
Naoki FUJIWARA ◽  
Takahiro ONISHI ◽  
Kouji KATSURAHARA ◽  
Satoru KISHIDA
Keyword(s):  
Magnetic Field ◽  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Superconducting Thin Films

Y-Ba-Cu-0 superconducting thin films prepared by RF magnetron sputtering

1988 ◽  
Vol 38 (2) ◽  
pp. 233-236 ◽  
Author(s):  
J. Dérer ◽  
G. Illiťová ◽  
Š. Beňačka ◽  
A. Koller ◽  
V. Skácel ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Superconducting Thin Films

Preparation of superconducting thin films of a new oxide system by rf magnetron sputtering

1989 ◽  
Vol 72 (5) ◽  
pp. 17-26
Author(s):  
Kentaro Setsune ◽  
Takeshi Kamada ◽  
Kumiko Hirochi ◽  
Hideaki Adachi ◽  
Kiyotaka Wasa
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Oxide System ◽  
Superconducting Thin Films

Fabrication of Bi2Sr2Can-1CunOy / Al2O3-Particles on MgO Films by rf Magnetron Sputtering Method

2006 ◽  
Vol 47 ◽  
pp. 159-164
Author(s):  
T. Yamane ◽  
Satoru Kishida ◽  
H. Tanaka ◽  
Hideki Yoshikawa ◽  
Hiroya Imao
Keyword(s):  
Thin Films ◽  
Particle Size ◽  
Magnetron Sputtering ◽  
Single Phase ◽  
Distribution Density ◽  
Annealing Temperature ◽  
Rf Magnetron Sputtering ◽  
Superconducting Thin Films ◽  
Substrate Distance ◽  
Zero Resistance

We deposited Bi2Sr2Ca1Cu2Oy (Bi-2212) superconducting thin films on MgO substrates with or without Al2O3 particles by the rf magnetron sputtering method. From the results, we found that optimum target-substrate distance, rf powers and substrate temperature for obtaining the Bi-2212 films on the MgO substrates were 5mm, 150W and 830°C, respectively. The Bi-2212 films were Bi-2212 single-phase and had the Tc of about 54K . The particle size and the distribution density of Al2O3 were controlled by annealing temperature. The Bi-2212/Al2O3/MgO film showed Bi-2212 single-phase, whereas did not show zero-resistance.

SUPERCONDUCTING Bi-Sr-Ca-Cu-O THIN FILMS PREPARED BY rf MAGNETRON SPUTTERING

1989 ◽  
Vol 03 (10) ◽  
pp. 785-788
Author(s):  
Z. IVANOV ◽  
T. NURGALIEV ◽  
T. DONCHEV ◽  
A. CHERNAKOVA ◽  
B. TODOROV
Keyword(s):  
Thin Films ◽  
Critical Temperature ◽  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering ◽  
Oxygen Atmosphere ◽  
Good Stability ◽  
Superconducting Thin Films

High-Tc superconducting thin films were deposited on MgO (100) and SrTiO 3 (110) substrates by rf magnetron sputtering of Bi2Sr2Ca3Cu4O x target. Critical temperature Tc above 78 K were obtained after annealing the films for one hour at 850°C in oxygen atmosphere. The films showed good stability of Tc and resistivity within a period of 30 days.

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