Composition control of Bi2Sr2Can-1CunOy superconducting thin films by rf magnetron sputtering method

Author(s):  
T. Yamane ◽  
S. Kishida ◽  
H. Tanaka ◽  
H. Yoshikawa
Shinku ◽  
2004 ◽  
Vol 47 (3) ◽  
pp. 194-196
Author(s):  
Naoki FUJIWARA ◽  
Takahiro ONISHI ◽  
Kouji KATSURAHARA ◽  
Satoru KISHIDA

1988 ◽  
Vol 38 (2) ◽  
pp. 233-236 ◽  
Author(s):  
J. Dérer ◽  
G. Illiťová ◽  
Š. Beňačka ◽  
A. Koller ◽  
V. Skácel ◽  
...  

1989 ◽  
Vol 72 (5) ◽  
pp. 17-26
Author(s):  
Kentaro Setsune ◽  
Takeshi Kamada ◽  
Kumiko Hirochi ◽  
Hideaki Adachi ◽  
Kiyotaka Wasa

2006 ◽  
Vol 47 ◽  
pp. 159-164
Author(s):  
T. Yamane ◽  
Satoru Kishida ◽  
H. Tanaka ◽  
Hideki Yoshikawa ◽  
Hiroya Imao

We deposited Bi2Sr2Ca1Cu2Oy (Bi-2212) superconducting thin films on MgO substrates with or without Al2O3 particles by the rf magnetron sputtering method. From the results, we found that optimum target-substrate distance, rf powers and substrate temperature for obtaining the Bi-2212 films on the MgO substrates were 5mm, 150W and 830°C, respectively. The Bi-2212 films were Bi-2212 single-phase and had the Tc of about 54K . The particle size and the distribution density of Al2O3 were controlled by annealing temperature. The Bi-2212/Al2O3/MgO film showed Bi-2212 single-phase, whereas did not show zero-resistance.


1989 ◽  
Vol 03 (10) ◽  
pp. 785-788
Author(s):  
Z. IVANOV ◽  
T. NURGALIEV ◽  
T. DONCHEV ◽  
A. CHERNAKOVA ◽  
B. TODOROV

High-Tc superconducting thin films were deposited on MgO (100) and SrTiO 3 (110) substrates by rf magnetron sputtering of Bi2Sr2Ca3Cu4O x target. Critical temperature Tc above 78 K were obtained after annealing the films for one hour at 850°C in oxygen atmosphere. The films showed good stability of Tc and resistivity within a period of 30 days.


1988 ◽  
Author(s):  
W. Y. Lee ◽  
J. Salem ◽  
V. Lee ◽  
C. T. Rettner ◽  
G. Lim ◽  
...  

Vacuum ◽  
1990 ◽  
Vol 41 (4-6) ◽  
pp. 864-866
Author(s):  
K Setsune ◽  
S Hayashi ◽  
H Adachi ◽  
K Hirochi ◽  
S Kohiki ◽  
...  

Shinku ◽  
2005 ◽  
Vol 48 (3) ◽  
pp. 181-183
Author(s):  
Takahiro ONISHI ◽  
Kenji SAITOU ◽  
Yukari OUCHI ◽  
Naoki FUJIWARA ◽  
Satoru KISHIDA

Shinku ◽  
1990 ◽  
Vol 33 (3) ◽  
pp. 110-112
Author(s):  
Hideaki HIGASHI ◽  
Satoru KISHIDA ◽  
Heizo TOKUTAKA ◽  
Katsumi NISHIMORI ◽  
Naganori ISHIHARA

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